Argon is a popular choice for sputtering due to several key reasons.
4 Key Reasons Why Argon is Used in Sputtering
High Sputtering Rate
Argon has a high sputtering rate.
This is because it is a rare gas with a high atomic mass.
A high atomic mass means that when ionized and accelerated towards the target, argon transfers significant momentum upon impact.
This leads to efficient ejection of target atoms.
Inert Nature
Argon is chemically inert.
This means it does not readily react with other elements.
Its inert nature minimizes the risk of unwanted chemical reactions between the sputtering gas and the target material or the growing film.
This ensures that the deposited film maintains the desired chemical composition and properties.
Low Price and Availability
Argon is relatively inexpensive compared to other rare gases like krypton and xenon.
Its widespread availability and low cost make it a practical choice for industrial and laboratory applications.
This economic factor is significant, especially in large-scale manufacturing processes where the cost of materials can significantly impact the overall production cost.
Pure Gas Availability
Argon is available in high purity.
High purity is essential to prevent impurities from affecting the quality of the deposited film.
Impurities can degrade the film's properties, such as its electrical conductivity or optical transparency.
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