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KinTek sample preparation equipment includes sample crushing,milling, as while as while sieving equipment, hydraulic press equipment includes manual press, electric press, isostatic press, hot press and press filtering machine.
KinTek supplies a broad range of high-temperature furnaces, including lab, pilot production, and industrial production furnaces, with a temperature range of up to 3000 ℃. One of KinTek's advantages is the ability to create custom-made furnaces tailored to specific functions, such as different heating methods and speeds, extra high and dynamic vacuums, controlled atmospheres and gas circuits, automated mechanical structures, and software and hardware development.
KinTek offers a range of lab consumables and materials, including evaporation materials, targets, metals, electrochemistry parts, as well as powders, pellets, wires, strips, foils, plates, and more.
KinTek bio-chem equipment comprises rotary evaporators, glass and stainless steel reactors, distillation systems, circulating heaters and chillers, as well as vacuum equipment.
Infrared heating quantitative flat plate mold
Item Number : PMHD
Cylindrical Lab electric heating Press Mold
Item Number : PMH
Warm iostatic press for solid state battery research
Item Number : PCIH
Electric Split Lab cold Isostatic Press (CIP) 65T / 100T / 150T / 200T
Item Number : PCESI
Automatic Lab Cold Isostatic Press (CIP) 300MPA-400MPA-500MPA
Item Number : PCIA
Electric Lab Cold Isostatic Press (CIP) 12T / 20T / 40T / 60T
Item Number : PCIE
Manual Cold Isostatic Pellet Press (CIP) 12T / 20T / 40T / 60T
Item Number : PCIM
Assemble Lab Cylindrical Press Mold
Item Number : PMAC
Assemble Square Lab Press Mold
Item Number : PMAS
XRF & KBR plastic ring lab Powder Pellet Pressing Mold
Item Number : PMXP
XRF Boric Acid lab Powder Pellet Pressing Mold
Item Number : PMXB
XRF & KBR steel ring lab Powder Pellet Pressing Mold
Item Number : PMXS
Warm Isostatic Press (WIP) Workstation 300Mpa
Item Number : PCIW
Automatic Lab XRF & KBR Pellet Press 30T / 40T / 60T
Item Number : PMXA
Electric rotary kiln pyrolysis furnace plant pyrolysis machine electric rotary calciner
Item Number : KT-RKTF
Vacuum induction melting furnace Arc Melting Furnace
Item Number : KT-VI
Continuous working electric heating pyrolysis furnace plant
Item Number : KT-RFTF
Mesh belt controlled atmosphere furnace
Item Number : KT-MB
Electric activated carbon regeneration furnace
Item Number : KT-CRF
1700℃ Controlled atmosphere furnace
Item Number : KT-17A
Cylindrical Resonator MPCVD Diamond Machine for lab diamond growth
Item Number : KTWB315
Cold isostatic press for small workpiece production 400Mpa
Item Number : PCIS
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An overview of various coating methods like CVD, PVD, and Epitaxy for growing single crystal films.
Explore the diverse methods of CVD, from plasma-enhanced to ultra-high vacuum, and their applications in semiconductor and material science.
A comprehensive exploration of CVD technology, its principles, characteristics, classifications, new advancements, and applications in various fields.
An overview of CVD technology and the role of electronic specialty gases in semiconductor fabrication.
Detailed analysis of the passivation layer thin film deposition methods in TOPCon cells, including PVD and CVD technologies.
Detailed instructions for preparing samples for NMR, MS, Chromatography, IR, UV, ICP, Thermogravimetric, XRD, TEM, SEM, and other instruments.
This article discusses the powder compression method in XRF spectral analysis, focusing on sample preparation techniques and equipment.
Detailed steps and requirements for preparing samples for X-ray diffraction experiments.
Detailed guide on preparing and handling solid, liquid, and gas samples for infrared spectroscopy.
Detailed guide on TEM sample prep, covering cleaning, grinding, polishing, fixation, and covering techniques.
An overview of various sample preparation methods for infrared spectral analysis.
An overview of the principles, sample requirements, and preparation methods for in situ infrared spectroscopy.
This article explores the preparation methods and growth mechanisms of diamond thin films using Chemical Vapor Deposition (CVD), highlighting the challenges and potential applications.
Discusses the use of cultivated diamonds in semiconductors, heat dissipation, and advanced manufacturing.
Explores the unique properties of CVD diamonds, their preparation methods, and diverse applications in various fields.
This article discusses the applications of MPCVD single crystal diamond in semiconductor and optical display fields, highlighting its superior properties and potential impact on various industries.
This article discusses the advancements and challenges in preparing large-size single-crystal diamonds using microwave plasma chemical vapor deposition (MPCVD) techniques.
An in-depth analysis of the key factors influencing the adhesion of films prepared via magnetron sputtering technology.
Discusses the phenomenon of target poisoning in magnetron sputtering, its causes, effects, and preventive measures.
This article discusses how different power supplies affect the morphology of sputtered film layers, focusing on DC, PDC, and RF power supplies.