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Hydraulic Lab Press is widely used in material researching labs,pharmacy,catalytic reaction,ceramics, electronic industries, it is one high efficient equipment for the sample preparing, due to its small footprint, it easy to carry and move, can work inside the vacuum glove box for processing under vacuum environment.
12-24T model machine output sample can meet requirement of infrared spectrometer.
24-40T model machine output sample can meet requirement of fluorescence spectrometer.
Item Number : PMS
Electric Lab Cold Isostatic Press (CIP) 12T / 20T / 40T / 60T
Item Number : PCIE
Assemble Square Lab Press Mold
Item Number : PMAS
Assemble Lab Cylindrical Press Mold
Item Number : PMAC
Lab Internal Rubber Mixer /Rubber Kneader Machine
Item Number : RPM-07
Lab Blown Film Extrusion Three layer co-extrusion film blowing machine
Item Number : RPM-05
Item Number : KT-BF
Small vacuum tungsten wire sintering furnace
Item Number : KT-VTW
Vacuum pressure sintering furnace
Item Number : KT-VPS
Manual Lab Pellet Press For Vacuum Box
Item Number : PCVM
Item Number : KT-VTP
Split manual heated lab pellet press 30T / 40T
Item Number : PCSM
Integrated manual heated lab pellet press 120mm / 180mm / 200mm / 300mm
Item Number : PCY
Vacuum sealed continuous working rotary tube furnace
Item Number : KT-CRTF
Split chamber CVD tube furnace with vacuum station CVD machine
Item Number : KT-CTF12
Item Number : KT-VHP
Hydraulic Heated Lab Pellet Press 24T / 30T / 60T
Item Number : PCH
lab pellet press for vacuum box
Item Number : PCV
Lab pellet press machine for glove box
Item Number : PCG
Split electric laboratory pellet press 40T / 65T / 100T / 150T / 200T
Item Number : PCES
Automatic Lab Pellet Press Machine 20T / 30T / 40T / 60T / 100T
Item Number : PCEA
Electric Hydraulic Pellet Press for XRF & KBR 20T / 30T / 40T / 60T
Item Number : PCPE
Hydraulic Diaphragm Lab Filter Press
Item Number : KH-01
Manual Lab Hydraulic Pellet Press 12T / 15T / 24T / 30T / 40T
Item Number : PCMP
Item Number : PCKBR
Item Number : PMID
We have the best Lab Press solutions to meet your laboratory needs. Whether you require standard solutions or bespoke designs, our extensive portfolio ensures we can meet almost any customer requirement. Our laboratory presses are ideal for R&D work, testing, short production runs, and educational purposes. They offer undeniable precision and durability, providing long-lasting and consistent results.
Laboratory Hydraulic press is widely used in:
Laboratory Hydraulic press can work inside the vacuum glove box for processing under vacuum environment It is a versatile tool that can be used for a variety of tasks, from pressing samples to measuring pressures.
Lab presses usually offer a handful of options with various ranges of temperature, pressure and platen sizes along with customization in order to meet particular processes..
In a laboratory environment, space is often limited, so the press must be designed to fit into the available space. The press must also be designed to be easy to use and easy to clean. The safety of the operator must be taken into account, as well as the safety of the equipment.
Kindle Tech have summarized some of these conditions for you to consider how to choose a laboratory press .
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An overview of various sample preparation methods for infrared spectral analysis.
An overview of the principles, sample requirements, and preparation methods for in situ infrared spectroscopy.
An in-depth analysis of the key factors influencing the adhesion of films prepared via magnetron sputtering technology.
Discusses the phenomenon of target poisoning in magnetron sputtering, its causes, effects, and preventive measures.
This article discusses how different power supplies affect the morphology of sputtered film layers, focusing on DC, PDC, and RF power supplies.
This article discusses the causes and solutions for severe ablation in the center region of ceramic targets during magnetron sputtering.
An in-depth guide on the definition, measurement methods, influencing factors, and equipment used for assessing peel strength of sputtered film layers.
Discusses methods to ensure film thickness tolerance in magnetron sputtering coating for optimal material performance.
An in-depth look at the pros and cons of electron beam evaporation coating and its various applications in industries.
An in-depth look at the principles, types, gas applications, and practical uses of PVD coating processes.
An in-depth exploration of thin film system design principles, technological considerations, and practical applications in various fields.
Analyzing factors causing no film deposition despite glow in magnetron sputtering.
Discusses the key factors influencing the uniformity of thin film deposition in magnetron sputtering, including equipment parameters, sputtering power, gas pressure, magnetic field configuration, substrate properties, and more.
Guidelines on choosing the right vacuum coating materials based on application, material properties, deposition methods, economy, substrate compatibility, and safety.
Explores reasons why rhenium targets struggle to glow during magnetron sputtering and offers optimization suggestions.
Key parameters influencing the sputtering effect in magnetron sputtering, including air pressure, power, target distance, substrate type, and more.
Guidelines and precautions for preparing PZT film layers using magnetron sputtering.
Overview of bias power supply types in magnetron sputtering and their roles in improving film adhesion and density.
This article explains the distinctions and applications of DC, MF, and RF sputtering techniques in thin film preparation.
Explains why target material sparks during magnetron sputtering and offers solutions to prevent it.
