The current of sputtering ions in a sputtering process is a crucial factor that determines the efficiency and quality of the deposition process.
What is the Current of Sputtering Ions? (Explained in 4 Key Points)
1. DC Diode Sputtering
In DC diode sputtering, a DC voltage of 500 - 1000 V is applied.
This voltage ignites an argon low-pressure plasma between a target and a substrate.
Positive argon ions are then accelerated towards the target due to this voltage.
This acceleration causes atoms to be ejected from the target and deposited onto the substrate.
2. RF Sputtering
In RF sputtering, an alternating current with frequencies around 14 MHz is used.
This method allows for the sputtering of insulating materials.
The electrons can be accelerated to oscillate with the RF.
The heavier ions react only to the average voltage generated in the RF system.
The ions are affected by the self-bias voltage (VDC) that accelerates them to the target.
This self-bias voltage approaches the equivalent voltage applied during DC sputtering.
3. Relationship Between Voltage and Current
The current of sputtering ions is directly related to the voltage applied.
In DC diode sputtering, the current is determined by the 500 - 1000 V DC voltage.
In RF sputtering, the current is determined by the self-bias voltage (VDC) that accelerates the ions to the target.
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