Knowledge What is the Process of Sputter Coating? 5 Key Steps Explained
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Tech Team · Kintek Solution

Updated 3 months ago

What is the Process of Sputter Coating? 5 Key Steps Explained

Sputter coating is a physical vapor deposition (PVD) process used to apply a thin, functional coating on a substrate.

The process involves the ejection of material from a target surface due to bombardment by ions, creating a vapor cloud that condenses as a coating layer on the substrate.

This technique is widely used for decorative hard coatings and tribological coatings in various industries due to its smooth nature and high control of coating thicknesses.

5 Key Steps Explained

What is the Process of Sputter Coating? 5 Key Steps Explained

1. Preparation of the Chamber

The process begins by evacuating the chamber to remove almost every molecule, creating a clean environment.

The chamber is then backfilled with a process gas, such as argon, oxygen, or nitrogen, depending on the material to be deposited.

2. Initiation of the Sputtering Process

A negative electrical potential is applied to the target material, which is the magnetron cathode.

The chamber body acts as the positive anode or ground.

This setup creates a plasma environment in the chamber.

3. Ejection of Target Material

The high voltage applied to the target material causes a glow discharge, accelerating ions towards the target surface.

When these ions impact the target, they eject materials from the surface through a process called sputtering.

4. Deposition of Coating

The ejected target material forms a vapor cloud that moves away from the target towards the substrate.

As it reaches the substrate, it condenses, forming a thin coating layer.

This layer bonds strongly with the substrate at an atomic level, becoming a permanent part of it rather than just an applied coating.

5. Enhancements and Variations

In some cases, an additional reactive gas like nitrogen or acetylene is used, which reacts with the ejected material in a process known as reactive sputtering.

This method allows for a wide range of coatings, including oxide coatings.

Applications and Advantages

Decorative Hard Coatings

Sputter technology is advantageous for coatings such as Ti, Cr, Zr, and Carbon Nitrides due to its smooth nature and high durability.

Tribological Coatings

Widely used in the automotive market for coatings like CrN, Cr2N, and various combinations with Diamond Like Carbon (DLC) coatings, enhancing the performance and longevity of components.

High Control of Coating Thickness

Essential for producing optical coatings where precise thickness control is necessary.

Smooth Coatings

Unlike arc evaporation, sputter coatings do not produce droplets, resulting in a smoother finish.

Disadvantages

Slow Deposition Speed

Compared to evaporation techniques, sputter coating can be slower.

Lower Plasma Density

It typically has a lower plasma density compared to arc technology, which can affect the efficiency of the coating process.

Overall, sputter coating is a versatile and effective method for depositing thin films with high precision and quality, making it a crucial technology in various industrial applications.

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