Thin Film Deposition Parts
Electron Gun Beam Crucible
Item Number : KES01
Price varies based on specs and customizations
- Material
- Tantalum / Molybdenum / Tungsten
- Specification
- 4CC / 7CC /15CC / 25CC / 40CC
Shipping:
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Application
The electron gun produces a powerful beam of electrons that is directed at the crucible. The electrons heat the material in the crucible until it becomes atoms or molecular clusters. This cloud can then be deposited onto a surface to form a thin film.In electron gun beam evaporation, the crucible is like a vessel that holds and heats the material to be deposited. It is made of special material that can withstand high temperature without melting. They help focus the heat on the material that is evaporating.
It is mostly used for the following:
- Thin film deposition: Widely used in thin film deposition technologies such as electron beam evaporation, thin film production of electronic devices, optical coating and surface modification of materials.
- Semiconductor industry: deposition of thin metal films as interconnects, ohmic contacts and diffusion barriers.
- Optics and Optoelectronics: Optical coatings, anti-reflection coatings and mirrors for various optical devices.
Detail & Parts
Technical specifications
product | Molybdenum/Tungsten Crucible | Boron Nitride Crucible/Conductive Boron Nitride Crucible | Graphite Crucible/Coated Graphite Crucible | Pyrolytic Graphite Coated Crucibles | Nickel crucible | Titanium crucible | copper crucible | Alumina crucible |
Specification | 4CC / 7CC / 15CC / 25CC / 40CC | 4CC / 7CC / 15CC / 25CC / 40CC | 4CC / 7CC / 15CC / 25CC / 40CC | 4CC / 7CC | 4CC | 4CC | 4CC / 2CC / 40CC | 4CC |
The crucibles we show are available in different sizes and custom sizes are available on request.
Advantage
- Higher evaporation rate.
- Improve heat stability; uniform heating.
- Reduce the heat transferred to the crucible; good thermal insulation performance.
- Enables fast material changeovers to minimize chamber downtime.
- Vacuum compatibility; high purity membrane.
- Versatility; supports multiple materials.
- Minimizes crucible damage and maintenance.
- These advantages make the electron gun beam crucible an important tool in the thin film deposition process, providing precise control, high deposition rate and high quality thin film for various industries and research fields.
FAQ
What are thermal evaporation sources?
What is Physical vapor deposition (PVD)?
Comparison of Thermal Evaporation and Electron Beam Evaporation.
What are the advantages of using ceramic crucibles?
How are high-purity graphite crucibles made?
What are the main types of thermal evaporation sources?
What is magnetron sputtering?
What are the methods used to deposit thin films?
What is sputtering target?
What are some common uses of ceramic crucibles?
What are the common applications of high-purity graphite crucibles?
How do thermal evaporation sources work?
Why magnetron sputtering?
What is thin film deposition equipment?
How are sputtering targets made?
What are the common materials used for evaporating crucibles?
How can I choose the right ceramic crucible for my application?
What factors should be considered when selecting high-purity graphite crucibles?
What are the advantages of using thermal evaporation sources?
What are the materials used in thin film deposition?
Thin film deposition commonly utilizes metals, oxides, and compounds as materials, each with its unique advantages and disadvantages. Metals are preferred for their durability and ease of deposition but are relatively expensive. Oxides are highly durable, can withstand high temperatures, and can be deposited at low temperatures, but can be brittle and challenging to work with. Compounds offer strength and durability, can be deposited at low temperatures and tailored to exhibit specific properties.
The selection of material for a thin film coating is dependent on the application requirements. Metals are ideal for thermal and electrical conduction, while oxides are effective in offering protection. Compounds can be tailored to suit specific needs. Ultimately, the best material for a particular project will depend on the specific needs of the application.
What is thin-film deposition technology?
What is sputtering target used for?
What are the advantages of using evaporating crucibles?
How should ceramic crucibles be handled and maintained?
What applications are thermal evaporation sources used for?
What are the methods to achieve optimal thin film deposition?
To achieve thin films with desirable properties, high-quality sputtering targets and evaporation materials are essential. The quality of these materials can be influenced by various factors, such as purity, grain size, and surface condition.
The purity of sputtering targets or evaporation materials plays a crucial role, as impurities can cause defects in the resulting thin film. Grain size also affects the quality of the thin film, with larger grains leading to poor film properties. Additionally, the surface condition is crucial, since rough surfaces can result in defects in the film.
To attain the highest quality sputtering targets and evaporation materials, it is crucial to select materials that possess high purity, small grain size, and smooth surfaces.
Uses of Thin Film Deposition
Zinc Oxide-Based Thin Films
ZnO thin films find applications in several industries such as thermal, optical, magnetic, and electrical, but their primary use is in coatings and semiconductor devices.
Thin-Film Resistors
Thin-film resistors are crucial for modern technology and are used in radio receivers, circuit boards, computers, radiofrequency devices, monitors, wireless routers, Bluetooth modules, and cell phone receivers.
Magnetic Thin Films
Magnetic thin films are used in electronics, data storage, radio-frequency identification, microwave devices, displays, circuit boards, and optoelectronics as key components.
Optical Thin Films
Optical coatings and optoelectronics are standard applications of optical thin films. Molecular beam epitaxy can produce optoelectronic thin-film devices (semiconductors), where epitaxial films are deposited one atom at a time onto the substrate.
Polymer Thin Films
Polymer thin films are used in memory chips, solar cells, and electronic devices. Chemical deposition techniques (CVD) offer precise control of polymer film coatings, including conformance and coating thickness.
Thin-Film Batteries
Thin-film batteries power electronic devices such as implantable medical devices, and the lithium-ion battery has advanced significantly thanks to the use of thin films.
Thin-Film Coatings
Thin-film coatings enhance the chemical and mechanical characteristics of target materials in various industries and technological fields. Anti-reflective coatings, anti-ultraviolet or anti-infrared coatings, anti-scratch coatings, and lens polarization are some common examples.
Thin-Film Solar Cells
Thin-film solar cells are essential to the solar energy industry, enabling the production of relatively cheap and clean electricity. Photovoltaic systems and thermal energy are the two main applicable technologies.
What are the advantages of using thin film deposition equipment?
What are sputtering targets for electronics?
How should evaporating crucibles be handled and maintained?
Factors and Parameters that Influence Deposition of Thin Films
Deposition Rate:
The rate at which the film is produced, typically measured in thickness divided by time, is crucial for selecting a technology suitable for the application. Moderate deposition rates are sufficient for thin films, while quick deposition rates are necessary for thick films. It is important to strike a balance between speed and precise film thickness control.
Uniformity:
The consistency of the film across the substrate is known as uniformity, which usually refers to film thickness but can also relate to other properties such as the index of refraction. It is important to have a good understanding of the application to avoid under- or over-specifying uniformity.
Fill Capability:
Fill capability or step coverage refers to how well the deposition process covers the substrate's topography. The deposition method used (e.g., CVD, PVD, IBD, or ALD) has a significant impact on step coverage and fill.
Film Characteristics:
The characteristics of the film depend on the application's requirements, which can be categorized as photonic, optical, electronic, mechanical, or chemical. Most films must meet requirements in more than one category.
Process Temperature:
Film characteristics are significantly affected by process temperature, which may be limited by the application.
Damage:
Each deposition technology has the potential to damage the material being deposited upon, with smaller features being more susceptible to process damage. Pollution, UV radiation, and ion bombardment are among the potential sources of damage. It is crucial to understand the limitations of the materials and tools.
What factors should be considered when selecting thin film deposition equipment?
What is the lifetime of a sputtering target?
What safety considerations are associated with operating thin film deposition equipment?
4.8
out of
5
The Electron Gun Beam Crucible is a reliable product that delivers consistent results. It is made from high-quality materials and is built to last.
4.9
out of
5
The Electron Gun Beam Crucible's efficiency in melting and modifying materials is remarkable. It is a crucial tool in our lab's research and production processes.
4.7
out of
5
The Electron Gun Beam Crucible exceeded our expectations. Its ability to produce pure materials in a sterile environment is truly impressive.
4.8
out of
5
The Electron Gun Beam Crucible is a valuable addition to our lab. It enables us to work with various materials and ensures the highest quality results.
4.9
out of
5
The Electron Gun Beam Crucible's technological advancements have revolutionized our research capabilities. It is a game-changer in the field of material science.
4.7
out of
5
The Electron Gun Beam Crucible's durability is exceptional. It withstands the rigors of our demanding research schedule and continues to perform flawlessly.
4.8
out of
5
The Electron Gun Beam Crucible's fast delivery exceeded our expectations. We were able to integrate it into our research setup quickly and efficiently.
4.9
out of
5
The Electron Gun Beam Crucible's value for money is unbeatable. It provides exceptional performance at a competitive price, making it an excellent investment for our lab.
4.7
out of
5
The Electron Gun Beam Crucible's quality is impeccable. It is manufactured with precision and attention to detail, ensuring reliable and accurate results.
4.8
out of
5
The Electron Gun Beam Crucible's speed of delivery was impressive. We received it within days of placing the order, allowing us to commence our research promptly.
4.9
out of
5
The Electron Gun Beam Crucible's technological advancements have opened up new avenues of research for our team. It enables us to explore materials and processes that were previously inaccessible.
4.7
out of
5
The Electron Gun Beam Crucible's durability has stood the test of time. It has been a reliable workhorse in our lab for years, delivering consistent results.
4.8
out of
5
The Electron Gun Beam Crucible's value for money is exceptional. It provides outstanding performance at a cost-effective price, making it an excellent choice for budget-conscious labs.
PDF - Electron Gun Beam Crucible
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