Thin Film Deposition Parts
Electron Beam Evaporation Coating Conductive Boron Nitride Crucible (BN Crucible)
Item Number : KES03
Price varies based on specs and customizations
- Material
- Boron nitride
- Specification
- 35-64.5mm*17-35mm
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Application
Conductive boron nitride crucibles are high-purity, smooth crucibles designed for electron beam evaporation coatings. It has excellent high temperature resistance and thermal cycle performance, and does not react with various metals and ceramic rare earths. The crucible remains intact even under rapid heating and cooling conditions. It has applications in alloy melting, rare earth and ceramic sintering, and electron beam evaporation coating. It is often used in thermal evaporation processes such as high-frequency induction heating, coating, electron beam evaporation coating, aluminum plating, and silicon plating.
The conductive boron nitride crucible has high purity, high finish, and excellent electron beam evaporation coating performance. They can increase evaporation rates, accelerate material switching, improve thermal stability and reduce power requirements, ultimately increasing productivity and cost efficiency.
Detail & Parts
Technical Specifications
| Outer diameter | 35mm | 40mm | 45mm | 50mm | 64.5mm |
| High | 17mm | 20mm | 22.5mm | 25mm | 35mm |
The crucibles we show are available in different sizes and custom sizes are available on request.
Advantage
- The film has good finish, high purity, less pollution and long service life.
- Excellent high temperature resistance, heat cycle resistance.
- Low thermal expansion, resists wetting by most molten metals.
- Heat resistance up to 2000℃, boron nitride does not react with aluminum and is not easy to volatilize.
- Increased evaporation rate; Increased evaporation rate reduces cycle time and increases overall yield.
- Fast material changeover; Conductive boron nitride crucibles facilitate fast material changeover, minimizing chamber downtime and increasing process efficiency.
- Enhanced Thermal Stability; These crucibles have increased thermal stability, reducing heat transfer from the crucible itself and ensuring consistent and controlled evaporation.
FAQ
What Are The Applications Of Boron Nitride Ceramic Parts?
What Are Thermal Evaporation Sources?
What Is Physical Vapor Deposition (PVD)?
What Are The Advantages Of Using Boron Nitride Ceramic Parts?
What Are The Main Types Of Thermal Evaporation Sources?
What Is Magnetron Sputtering?
What Is Sputtering Target?
What Considerations Should Be Made When Selecting Boron Nitride Ceramic Parts?
How Do Thermal Evaporation Sources Work?
Why Magnetron Sputtering?
How Are Sputtering Targets Made?
What Manufacturing Processes Are Used To Produce Boron Nitride Ceramic Parts?
What Are The Advantages Of Using Thermal Evaporation Sources?
What Are The Materials Used In Thin Film Deposition?
Thin film deposition commonly utilizes metals, oxides, and compounds as materials, each with its unique advantages and disadvantages. Metals are preferred for their durability and ease of deposition but are relatively expensive. Oxides are highly durable, can withstand high temperatures, and can be deposited at low temperatures, but can be brittle and challenging to work with. Compounds offer strength and durability, can be deposited at low temperatures and tailored to exhibit specific properties.
The selection of material for a thin film coating is dependent on the application requirements. Metals are ideal for thermal and electrical conduction, while oxides are effective in offering protection. Compounds can be tailored to suit specific needs. Ultimately, the best material for a particular project will depend on the specific needs of the application.
What Is Sputtering Target Used For?
What Applications Are Thermal Evaporation Sources Used For?
What Are The Methods To Achieve Optimal Thin Film Deposition?
To achieve thin films with desirable properties, high-quality sputtering targets and evaporation materials are essential. The quality of these materials can be influenced by various factors, such as purity, grain size, and surface condition.
The purity of sputtering targets or evaporation materials plays a crucial role, as impurities can cause defects in the resulting thin film. Grain size also affects the quality of the thin film, with larger grains leading to poor film properties. Additionally, the surface condition is crucial, since rough surfaces can result in defects in the film.
To attain the highest quality sputtering targets and evaporation materials, it is crucial to select materials that possess high purity, small grain size, and smooth surfaces.
Uses Of Thin Film Deposition
Zinc Oxide-Based Thin Films
ZnO thin films find applications in several industries such as thermal, optical, magnetic, and electrical, but their primary use is in coatings and semiconductor devices.
Thin-Film Resistors
Thin-film resistors are crucial for modern technology and are used in radio receivers, circuit boards, computers, radiofrequency devices, monitors, wireless routers, Bluetooth modules, and cell phone receivers.
Magnetic Thin Films
Magnetic thin films are used in electronics, data storage, radio-frequency identification, microwave devices, displays, circuit boards, and optoelectronics as key components.
Optical Thin Films
Optical coatings and optoelectronics are standard applications of optical thin films. Molecular beam epitaxy can produce optoelectronic thin-film devices (semiconductors), where epitaxial films are deposited one atom at a time onto the substrate.
Polymer Thin Films
Polymer thin films are used in memory chips, solar cells, and electronic devices. Chemical deposition techniques (CVD) offer precise control of polymer film coatings, including conformance and coating thickness.
Thin-Film Batteries
Thin-film batteries power electronic devices such as implantable medical devices, and the lithium-ion battery has advanced significantly thanks to the use of thin films.
Thin-Film Coatings
Thin-film coatings enhance the chemical and mechanical characteristics of target materials in various industries and technological fields. Anti-reflective coatings, anti-ultraviolet or anti-infrared coatings, anti-scratch coatings, and lens polarization are some common examples.
Thin-Film Solar Cells
Thin-film solar cells are essential to the solar energy industry, enabling the production of relatively cheap and clean electricity. Photovoltaic systems and thermal energy are the two main applicable technologies.
What Are Sputtering Targets For Electronics?
Factors And Parameters That Influence Deposition Of Thin Films
Deposition Rate:
The rate at which the film is produced, typically measured in thickness divided by time, is crucial for selecting a technology suitable for the application. Moderate deposition rates are sufficient for thin films, while quick deposition rates are necessary for thick films. It is important to strike a balance between speed and precise film thickness control.
Uniformity:
The consistency of the film across the substrate is known as uniformity, which usually refers to film thickness but can also relate to other properties such as the index of refraction. It is important to have a good understanding of the application to avoid under- or over-specifying uniformity.
Fill Capability:
Fill capability or step coverage refers to how well the deposition process covers the substrate's topography. The deposition method used (e.g., CVD, PVD, IBD, or ALD) has a significant impact on step coverage and fill.
Film Characteristics:
The characteristics of the film depend on the application's requirements, which can be categorized as photonic, optical, electronic, mechanical, or chemical. Most films must meet requirements in more than one category.
Process Temperature:
Film characteristics are significantly affected by process temperature, which may be limited by the application.
Damage:
Each deposition technology has the potential to damage the material being deposited upon, with smaller features being more susceptible to process damage. Pollution, UV radiation, and ion bombardment are among the potential sources of damage. It is crucial to understand the limitations of the materials and tools.
What Is The Lifetime Of A Sputtering Target?
4.9
out of
5
The boron nitride crucible delivered in 3 days, which is really fast! The quality is excellent and it fits perfectly in my electron beam evaporator.
4.7
out of
5
I'm very impressed with the performance of this crucible. It has increased the evaporation rate and reduced the power requirements in my electron beam evaporator.
4.8
out of
5
The conductive boron nitride crucible is a great choice for electron beam evaporation coating. It has a long service life and produces high-quality films.
4.6
out of
5
I've been using this crucible for several months now and I'm very happy with it. It's very durable and has helped me to improve the quality of my coatings.
4.9
out of
5
This crucible is a game-changer! It has significantly improved the efficiency of my electron beam evaporator and reduced my production costs.
4.7
out of
5
I highly recommend this crucible to anyone who is looking for a high-quality and durable option for electron beam evaporation coating.
4.8
out of
5
The conductive boron nitride crucible is an excellent choice for high-temperature applications. It has excellent thermal stability and resists wetting by most molten metals.
4.6
out of
5
I'm very satisfied with this crucible. It has helped me to improve the quality of my coatings and reduce my production costs.
4.9
out of
5
This crucible is a must-have for anyone who is serious about electron beam evaporation coating. It's a great value for the price.
4.7
out of
5
I'm very impressed with the performance of this crucible. It has exceeded my expectations and I highly recommend it.
4.8
out of
5
The conductive boron nitride crucible is a great choice for electron beam evaporation coating. It's easy to use and produces high-quality films.
4.6
out of
5
I've been using this crucible for a few weeks now and I'm very happy with it. It's very durable and has helped me to improve the quality of my coatings.
4.9
out of
5
This crucible is a game-changer! It has significantly improved the efficiency of my electron beam evaporator and reduced my production costs.
4.7
out of
5
I highly recommend this crucible to anyone who is looking for a high-quality and durable option for electron beam evaporation coating.
4.8
out of
5
The conductive boron nitride crucible is an excellent choice for high-temperature applications. It has excellent thermal stability and resists wetting by most molten metals.
4.6
out of
5
I'm very satisfied with this crucible. It has helped me to improve the quality of my coatings and reduce my production costs.
PDF - Electron Beam Evaporation Coating Conductive Boron Nitride Crucible (BN Crucible)
DownloadCatalog of Thin Film Deposition Parts
DownloadCatalog of Boron Nitride Ceramics
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DownloadCatalog of Thin Film Deposition Materials
DownloadCatalog of Sputtering Targets
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