Thin Film Deposition Parts

Electron Beam Evaporation Graphite Crucible

Name: Electron Beam Evaporation Graphite Crucible
Brand: Kintek Solution
SKU: KMS02
Rating: 4.75 (18 reviews)

Item Number : KMS02

Price varies based on specs and customizations

Material: Graphite
Specification: Ф35-65*17-30mm
cover: optional

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Applications

Electron beam evaporation graphite crucible is a technology that uses electron beams to create flexible and rough graphite films. Its key parameters include carbon source supply, electron beam irradiation energy, applied voltage, evaporation temperature, and evaporation time. The applied voltage modulates the adhesion between the graphite layer and the bottom layer of the crucible. To ensure a flat graphite layer, the flow rate and particle size of the carbon source feed should be controlled to achieve uniform deposition and evaporation.

In the field of power electronics, electron beam evaporation graphite crucible technology is widely used. It involves depositing a carbon source material using an electron beam to form a thin film of graphite. The graphite crucible manufactured by this process has low resistance, low corona and high yield strength. It is widely used in heat dissipation, withstand voltage manufacturing and testing of electronic equipment.

Detail & Parts

Electron beam evaporation graphite crucible details

Electron beam evaporation graphite crucible details 2

Electron beam evaporation graphite crucible details

Waterproof graphite crucible with lid detail 1 — Waterproof graphite crucible with lid

Waterproof graphite crucible with lid detail 2 — Waterproof graphite crucible with lid

Waterproof graphite crucible with lid detail 3 — Waterproof graphite crucible with lid

Waterproof graphite crucible with lid detail 4 — Waterproof graphite crucible with lid

Technical specifications

Graphite Crucible Dimensions

35*17mm

35*22mm

40*20mm

42.5*19.5mm

45*22.5mm

50*25mm

65*30mm

The crucibles we show are available in different sizes and custom sizes are available on request.

Advantage

Preparation accuracy: Electron beam evaporation technology can precisely control the deposition process, resulting in high-precision and consistent graphite crucibles.
Thermal shock resistance: Graphite films formed by electron beam evaporation have excellent thermal shock resistance and are suitable for applications with rapid temperature changes.
Wear resistance: Electron beam evaporated graphite crucible has good wear resistance, making it durable and able to withstand harsh conditions.
Chemical Resistance: These crucibles are resistant to acids, alkalis and chemical contamination, ensuring their reliability and longevity in chemically aggressive environments.
Flexibility and roughness: The graphite film formed by this technique has a certain degree of flexibility and roughness, making it effective for various applications.

In conclusion, e-beam evaporated graphite crucibles have precise preparation, thermal shock resistance, abrasion resistance, chemical resistance, flexibility and roughness. They are widely used in power electronics, molecular binding testing, laser technology, batteries, high voltage capacitors and medical device applications.

FAQ

What are thermal evaporation sources?

Thermal evaporation sources are devices used in thermal evaporation systems to deposit thin films onto substrates. They work by heating a material (evaporant) to high temperatures, causing it to evaporate and then condense onto a substrate, forming a thin film.

What is a graphitization furnace?

A graphitization furnace is a specialized piece of equipment used to convert carbonaceous materials, such as petroleum coke or coal tar pitch, into graphite through high-temperature processing in an inert atmosphere. This process typically involves temperatures ranging from 2500 to 3000 degrees Celsius.

Comparison of Electron Beam Evaporation Graphite Crucible Technology and Traditional Technology.

Although the electron beam evaporation graphite crucible technology is more costly than traditional hot pressing, it has higher precision and is more suitable for the manufacture of complex graphite crucibles. Compared with conventional carbon source evaporation, electron beam evaporation achieves uniform carbon source distribution and smooth carbon surface, improving material performance and reliability. The technology offers a simpler, more energy-efficient method for device fabrication in fields such as power electronics, and significantly improves device reliability.

How are high-purity graphite crucibles made?

High-purity graphite crucibles are typically manufactured through a process called isostatic pressing. In this method, graphite powder is placed in a rubber mold, and then subjected to high pressure from all directions. This pressure compacts the graphite particles into a dense and uniform crucible shape. The crucible is then heated to a high temperature to remove any impurities and improve its purity.

What are the main types of thermal evaporation sources?

The main types of thermal evaporation sources include resistive evaporation sources, electron-beam evaporation sources, and flash evaporation sources. Each type uses different methods to heat the evaporant, such as resistive heating, electron beam heating, or direct contact with a hot surface.

What are the main applications of graphitization furnaces?

Graphitization furnaces are crucial in industries such as metallurgy, electronics, and aerospace. They produce high-quality graphite products like electrodes, crucibles, and structural components, which are essential for various high-temperature applications.

What is RF PECVD?

RF PECVD stands for radio-frequency plasma-enhanced chemical vapor deposition, which is a technique used to prepare polycrystalline films on a substrate by using glow discharge plasma to influence the process while low pressure chemical vapor deposition is taking place. The RF PECVD method is well established for standard silicon-integrated-circuit technology, where typically flat wafers are used as the substrates. This method is advantageous due to the possibility of low-cost film fabrication and high efficiency of deposition. Materials can also be deposited as graded-refractive-index films or as a stack of nano-films each with different properties.

What is sputtering target?

A sputtering target is a material used in the process of sputter deposition, which involves breaking up the target material into tiny particles that form a spray and coat a substrate, such as a silicon wafer. Sputtering targets are typically metallic elements or alloys, although some ceramic targets are available. They come in a variety of sizes and shapes, with some manufacturers creating segmented targets for larger sputtering equipment. Sputtering targets have a wide range of applications in fields such as microelectronics, thin film solar cells, optoelectronics, and decorative coatings due to their ability to deposit thin films with high precision and uniformity.

What are the common applications of high-purity graphite crucibles?

High-purity graphite crucibles have a wide range of applications in industries such as metallurgy, foundries, and laboratories. They are commonly used for melting and casting non-ferrous metals, including aluminum, copper, and precious metals. High-purity graphite crucibles are also utilized in the production of alloys and high-temperature ceramics. They are essential in processes such as chemical analysis, spectroscopy, and sample preparation in laboratories. Additionally, these crucibles find applications in the semiconductor industry for the melting and growing of silicon and other semiconductor materials.

How do thermal evaporation sources work?

Thermal evaporation sources work by passing electrical current through a resistive material, which heats up to high temperatures. This heat is transferred to the evaporant, causing it to melt and vaporize. The vapor then travels through a vacuum chamber and condenses onto a substrate, forming a thin film.

What are the different types of graphitization furnaces?

There are several types of graphitization furnaces, including Horizontal High Temperature Graphitization Furnaces, Large Vertical Graphitization Furnaces, Continuous Graphitization Furnaces, Negative Material Graphitization Furnaces, Vertical High Temperature Graphitization Furnaces, Ultra-high Temperature Graphitization Furnaces, IGBT Experimental Graphitization Furnaces, High Thermal Conductivity Film Graphitization Furnaces, Bottom Discharge Graphitization Furnaces for Carbon Materials, and 2200°C Graphite Vacuum Furnaces.

How does RF PECVD work?

RF PECVD works by creating a plasma in a vacuum chamber. The precursor gas is introduced into the chamber, and radio frequency power is applied to create an electric field. This electric field results in the ionization of the precursor gas, forming a plasma. The plasma contains reactive species that can chemically react with the substrate surface, leading to the deposition of a thin film. The RF power also helps to control the energy of the plasma, allowing for better control over film properties such as composition, uniformity, and adhesion. The process parameters, such as gas flow rates, pressure, and RF power, can be adjusted to optimize the film deposition process.

How are sputtering targets made?

Sputtering targets are made using a variety of manufacturing processes depending on the properties of the target material and its application. These include vacuum melting and rolling, hot-pressed, special press-sintered process, vacuum hot-pressed, and forged methods. Most sputtering target materials can be fabricated into a wide range of shapes and sizes, with circular or rectangular shapes being the most common. Targets are usually made from metallic elements or alloys, but ceramic targets can also be used. Compound sputtering targets are also available, made from a variety of compounds including oxides, nitrides, borides, sulphides, selenides, tellurides, carbides, crystalline, and composite mixtures.

What factors should be considered when selecting high-purity graphite crucibles?

When selecting high-purity graphite crucibles, several factors should be considered. Firstly, the size and capacity of the crucible should align with the intended application and the amount of material to be melted or processed. The crucible's thermal conductivity, thermal shock resistance, and chemical compatibility should be evaluated to ensure they meet the specific process requirements. It is important to select crucibles made from high-quality graphite material with high purity levels to minimize contamination and ensure excellent performance. The crucible's design and construction should also be considered, such as the presence of handles or pouring spouts for easy handling. Additionally, it is advisable to consult with manufacturers or experts in the field to ensure the selection of the most suitable high-purity graphite crucibles for specific applications.

What are the common materials used for evaporating crucibles?

Evaporating crucibles are commonly made from materials such as tungsten, tantalum, molybdenum, graphite, or ceramic compounds. These materials have high melting points and good thermal conductivity, making them suitable for the high-temperature conditions required during evaporation. The choice of crucible material depends on factors such as the evaporant material, desired film properties, and process parameters.

What are the advantages of using thermal evaporation sources?

The advantages of thermal evaporation sources include high deposition rates, good directionality, excellent uniformity, and compatibility with various materials. They are also relatively simple and affordable, making them suitable for a wide range of applications in thin film deposition.

How does a graphitization furnace work?

A graphitization furnace works by subjecting carbonaceous materials to extremely high temperatures, typically between 2500 to 3000 degrees Celsius, in an inert atmosphere. This process rearranges the carbon atoms in the material, converting it into graphite, which has unique properties such as high thermal conductivity, low thermal expansion, and chemical inertness.

What are the advantages of RF PECVD?

RF PECVD offers several advantages for thin film deposition. Firstly, it allows for the deposition of high-quality films with excellent control over film properties such as thickness, composition, and uniformity. The use of a plasma enhances the reactivity of the process, enabling the deposition of films at lower temperatures compared to traditional thermal CVD methods. RF PECVD also offers better step coverage, allowing for the deposition of films in high aspect ratio structures. Another advantage is the ability to deposit a wide range of materials, including silicon nitride, silicon dioxide, amorphous silicon, and various other thin film materials. The process is highly scalable and can be easily integrated into existing manufacturing processes. Additionally, RF PECVD is a relatively cost-effective method compared to other thin film deposition techniques.

What is sputtering target used for?

Sputtering targets are used in a process called sputtering to deposit thin films of a material onto a substrate using ions to bombard the target. These targets have a wide range of applications in various fields, including microelectronics, thin film solar cells, optoelectronics, and decorative coatings. They allow for the deposition of thin films of materials onto a variety of substrates with high precision and uniformity, making them an ideal tool for producing precision products. Sputtering targets come in various shapes and sizes and can be specialized to meet the specific requirements of the application.

What are the advantages of using evaporating crucibles?

Evaporating crucibles offer several advantages in thin film deposition processes. They provide a controlled environment for the evaporation of materials, allowing for precise control over film thickness and uniformity. Crucibles can withstand high temperatures and provide efficient heat transfer, ensuring consistent evaporation rates. They are available in various sizes and shapes to accommodate different evaporation systems and substrate configurations. Evaporating crucibles also allow for the deposition of a wide range of materials, including metals, semiconductors, and ceramics. They can be easily loaded and unloaded, facilitating quick material changes or process adjustments. Overall, evaporating crucibles are essential tools in thin film deposition techniques, offering versatility, reliability, and reproducibility.

What applications are thermal evaporation sources used for?

Thermal evaporation sources are used in various applications such as the production of optical coatings, semiconductor devices, and various types of thin films. They are particularly useful in industries that require precise control over the deposition of materials onto substrates.

What are the advantages of using a graphitization furnace?

The advantages of using a graphitization furnace include the production of high-quality graphite with excellent thermal conductivity, low thermal expansion, and chemical inertness. These properties make graphite ideal for a wide range of high-temperature applications in industries like metallurgy, electronics, and aerospace.

What are sputtering targets for electronics?

Sputtering targets for electronics are thin discs or sheets of materials such as aluminum, copper, and titanium that are used to deposit thin films onto silicon wafers to create electronic devices like transistors, diodes, and integrated circuits. These targets are used in a process called sputtering, in which atoms of the target material are physically ejected from the surface and deposited onto a substrate by bombarding the target with ions. Sputtering targets for electronics are essential in the production of microelectronics and typically require high precision and uniformity to ensure quality devices.

How should evaporating crucibles be handled and maintained?

Evaporating crucibles should be handled and maintained with care to ensure their longevity and performance. Crucibles should be cleaned thoroughly before each use to remove any residual material from previous depositions. Avoid using abrasive materials that could damage the crucible's surface. During loading and unloading, handle crucibles with clean gloves or specialized tools to prevent contamination. When not in use, store crucibles in a dry and clean environment to avoid corrosion or degradation. Regular inspection of crucibles for cracks, defects, or signs of wear is important to prevent unexpected failures during the evaporation process. Follow the manufacturer's recommendations for any specific maintenance procedures, such as annealing or surface treatment, to prolong the crucible's lifespan.

What is the lifetime of a sputtering target?

The lifetime of a sputtering target depends on factors such as the material composition, purity, and the specific application it is being used for. Generally, targets can last for several hundred to a few thousand hours of sputtering, but this can vary widely depending on the specific conditions of each run. Proper handling and maintenance can also extend the lifetime of a target. In addition, the use of rotary sputtering targets can increase runtimes and reduce the occurrence of defects, making them a more cost-effective option for high volume processes.

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4.8

out of

5

Speedy shipping and well-packaged. The crucible is of remarkable quality.

Wendell Craine

4.7

out of

5

Excellent value for the price. Highly recommend this crucible for lab use.

Zaynah McGee

4.9

out of

5

Impeccable quality and construction. Meets all our lab requirements.

Lucian Macias

4.6

out of

5

Durable and long-lasting. Withstands high temperatures and rigorous use.

Akeem Dyer

4.8

out of

5

Cutting-edge technology. The crucible's performance is outstanding.

Ayanna Christensen

4.7

out of

5

Highly recommend. The crucible's features are impressive.

Joelle Mccall

4.9

out of

5

Meticulously crafted. The crucible is a testament to precision engineering.

Mikel Joseph

4.6

out of

5

Sturdy and resilient. Withstands demanding lab conditions effortlessly.

Abdul Hooper

4.8

out of

5

State-of-the-art technology. The crucible's capabilities are remarkable.

Aniya Durham

4.7

out of

5

Great value for money. The crucible's performance exceeds expectations.

Leonel Henderson

4.9

out of

5

Unparalleled quality. The crucible is a game-changer in our lab.

Mireille Mckinney

4.6

out of

5

Durable and reliable. The crucible withstands rigorous use remarkably.

Aric Mcmahon

4.8

out of

5

Cutting-edge technology. The crucible's capabilities are astounding.

Amina Hampton

4.7

out of

5

Excellent value for the price. The crucible's performance is impressive.

Janiya Haney

4.9

out of

5

Meticulously crafted. The crucible's precision is remarkable.

Dominique Matthews

4.6

out of

5

Sturdy and resilient. Withstands demanding lab conditions effortlessly.

Davion Mcintyre

4.8

out of

5

State-of-the-art technology. The crucible's capabilities are remarkable.

Ayanna Christensen

4.7

out of

5

Great value for money. The crucible's performance exceeds expectations.

Joelle Mccall

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Hot Tags

high purity graphite crucible evaporation crucible thermal evaporation sources graphitization furnace rf pecvd sputtering targets

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Electron Beam Evaporation Graphite Crucible

Shipping:

Applications

Detail & Parts

Technical specifications

Advantage

FAQ

What are thermal evaporation sources?

What is a graphitization furnace?

Comparison of Electron Beam Evaporation Graphite Crucible Technology and Traditional Technology.

How are high-purity graphite crucibles made?

What are the main types of thermal evaporation sources?

What are the main applications of graphitization furnaces?

What is RF PECVD?

What is sputtering target?

What are the common applications of high-purity graphite crucibles?

How do thermal evaporation sources work?

What are the different types of graphitization furnaces?

How does RF PECVD work?

How are sputtering targets made?

What factors should be considered when selecting high-purity graphite crucibles?

What are the common materials used for evaporating crucibles?

What are the advantages of using thermal evaporation sources?

How does a graphitization furnace work?

What are the advantages of RF PECVD?

What is sputtering target used for?

What are the advantages of using evaporating crucibles?

What applications are thermal evaporation sources used for?

What are the advantages of using a graphitization furnace?

What are sputtering targets for electronics?

How should evaporating crucibles be handled and maintained?

What is the lifetime of a sputtering target?

PDF - Electron Beam Evaporation Graphite Crucible

Catalog of Thin Film Deposition Parts

Catalog of High Purity Graphite Crucible

Catalog of Evaporation Crucible

Catalog of Thermal Evaporation Sources

Catalog of Graphitization Furnace

Catalog of Rf Pecvd

Catalog of Sputtering Targets

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A Comparative Study of Evaporation and Sputtering Techniques in Thin Film Deposition

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Understanding Electrodeposition with Electrochemical Electrodes

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