CVD materials
CVD Diamond coating
Item Number : cvdm-05
Price varies based on specs and customizations
- Thickness:
- <50μm
- Thickness after polishing:
- <30μm
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Introduction
Chemical vapor deposition (CVD) diamond coating is a process for depositing a thin film of diamond onto a substrate. The process involves the deposition of a carbon-containing gas onto a heated substrate in the presence of a hydrogen-containing gas. The carbon atoms in the gas are ionized and accelerated towards the substrate, where they react with the hydrogen atoms to form diamond.
CVD diamond coatings have a number of advantages over natural diamond, including their low friction coefficient, excellent wear resistance, thermal stability, good uniformity, and good adhesion. These properties make CVD diamond coatings ideal for a wide range of applications, including cutting tools, wire drawing dies, acoustic devices, and friction and wear applications.
CVD diamond coatings are typically deposited on a variety of substrates, including silicon, carbide, and metal. The thickness of the coating can be controlled by varying the deposition time and temperature. CVD diamond coatings can be grown with a variety of surface structures, including smooth, faceted, and textured. The surface structure of the coating can be tailored to optimize the film for a given application.
Applications
CVD diamond coating application has a wide range of applications due to its exceptional properties such as low friction coefficient, excellent wear resistance, good thermal stability, uniformity, and adhesion. Some of the main application areas include:
- Diamond thin film coated SiC for sealing applications in harsh environments.
- Diamond thin film coated deep-cavity cemented carbide wire drawing dies with circular cross-section cavities.
- Diamond thin film coated deep-cavity cemented carbide wire drawing dies with irregular-shaped cavities.
- Diamond thin film coated silicon wafer for acoustic applications (high-frequency (GHz) surface acoustic wave (SAW) devices).
- Diamond thin film coatings for friction and wear applications.
Features
The CVD Diamond coating feature offers a range of benefits and features that make it a valuable choice for various applications:
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Low friction coefficient: This feature reduces friction and wear, leading to improved performance and longer lifespan of tools and components.
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Excellent wear resistance: The diamond coating provides exceptional resistance to wear and abrasion, making it suitable for applications where durability is critical.
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Excellent thermal stability: The coating exhibits high thermal stability, enabling it to withstand extreme temperatures without compromising its properties.
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Good uniformity: The CVD process ensures uniform coating thickness and consistency, resulting in reliable and predictable performance.
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Good adhesion: The diamond coating adheres strongly to the substrate, ensuring a durable and long-lasting bond.
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Wide range of surface structures: The CVD process allows for the growth of various surface structures, such as thin and smooth surfaces, thicker films, and faceted surfaces, enabling optimization for specific applications.
Principle
Chemical vapor deposition (CVD) diamond coating is a process in which a diamond film is deposited on a substrate by the chemical reaction of a hydrocarbon gas with atomic hydrogen. The atomic hydrogen is generated by a plasma, which is created by an electric arc or a microwave discharge. The diamond film grows on the substrate by the deposition of carbon atoms from the hydrocarbon gas onto the substrate surface. The properties of the diamond film, such as its thickness, grain size, and surface morphology, can be controlled by varying the process parameters, such as the gas composition, pressure, temperature, and substrate bias.
Advantages
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Low friction coefficient, significantly reducing friction and wear during use.
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Excellent wear resistance, extending the service life of tools and components.
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Excellent thermal stability, maintaining performance even in high-temperature environments.
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Good uniformity, ensuring consistent coating thickness and properties across the surface.
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Good adhesion, providing a strong bond between the coating and the substrate.
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Ability to grow a wide range of surface structures, optimizing the film for specific applications.
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Can be used on various substrates, including metals, ceramics, and polymers.
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Chemically inert, making it resistant to corrosion and chemical attack.
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Biocompatible, making it suitable for medical and biological applications.
Specifications
| Vickers hardness: | 8000-10000mm2 |
| Young's Modulus: | 1000-1100GPa |
| Friction Coefficient: | 0.05-0.1 |
| Thickness: | <50μm |
| Thickness after polishing: | <30μm |
FAQ
What Is CVD Furnace?
Chemical vapor deposition (CVD) is a technology that uses various energy sources such as heating, plasma excitation or light radiation to chemically react gaseous or vapor chemical substances on the gas phase or gas-solid interface to form solid deposits in the reactor by means of chemical reaction.To put it simply, two or more gaseous raw materials are introduced into a reaction chamber, and then they react with each other to form a new material and deposit it on the substrate surface.
CVD furnace is one combined furnace system with high temperature tube furnace unit,gases control unit, and vacuum unit, it is widely used for experiment and production of composite material preparation, microelectronics process, semiconductor optoelectronic, solar energy utilization, optical fiber communication, superconductor technology, protective coating field.
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How Does CVD Furnace Work?
CVD furnace system consists of high temperature tube furnace unit, reacting gas source precise control unit, vacuum pump station and corresponding assembling parts.
Vacuum pump is to remove the air from the reacting tube,and make sure there is no unwanted gases inside the reaction tube, after that the tube furnace will heat the reaction tube to a target temperature, then reacting gas source precise control unit can introduce different gases with a set ratio into the furnace tube for the chemical reaction, the chemical vapor deposition will be formed in the CVD furnace.
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What Is PECVD Method?
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Which Gas Is Used In CVD Process?
There are tremendous gas sources can be used in the CVD process, the common chemical reactions of CVD includes Pyrolysis, photolysis, reduction, oxidation, redox,so the gases involved in these chemical reactions can be used in the CVD process.
We take CVD Graphene growth for an example, the gases used in the CVD process will be CH4,H2,O2 and N2.
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PACVD Is PECVD?
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What Is PECVD Used For?
What Are The Advantages Of CVD Diamond Coating?
What Are The Advantages Of Using CVD Diamond Machines?
What Is The Advantage Of CVD System?
- Wide range of films can be produced, metal film, nonmetal film and multi-component alloy film as required. At the same time, it can prepare high-quality crystals that are difficult to obtain by other methods, such as GaN, BP, etc.
- The film forming speed is fast, usually several microns per minute or even hundreds of microns per minute. It is possible to simultaneously deposit large quantities of coatings with uniform composition, which is incomparable to other film preparation methods, such as liquid phase epitaxy (LPE) and molecular beam epitaxy (MBE).
- The working conditions are carried out under normal pressure or low vacuum conditions, so the coating has good diffraction, and the workpieces with complex shapes can be uniformly coated, which is much superior to PVD.
- Due to the mutual diffusion of reaction gas, reaction product and substrate, a coating with good adhesion strength can be obtained, which is crucial for preparing surface strengthened films such as wear-resistant and anti-corrosion films.
- Some films grow at a temperature far lower than the melting point of the film material. Under the condition of low temperature growth, the reaction gas and reactor wall and impurities contained in them almost do not react, so a film with high purity and good crystallinity can be obtained.
- Chemical vapor deposition can obtain a smooth deposition surface. This is because compared with LPE, chemical vapor deposition (CVD) is carried out under high saturation, with high nucleation rate, high nucleation density, and uniform distribution on the whole plane, resulting in a macroscopic smooth surface. At the same time, in chemical vapor deposition, the average free path of molecules (atoms) is much larger than LPE, so the spatial distribution of molecules is more uniform, which is conducive to the formation of a smooth deposition surface.
- Low radiation damage, which is a necessary condition for manufacturing metal oxide semiconductors (MOS) and other devices
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What Are The Materials Used In Thin Film Deposition?
Thin film deposition commonly utilizes metals, oxides, and compounds as materials, each with its unique advantages and disadvantages. Metals are preferred for their durability and ease of deposition but are relatively expensive. Oxides are highly durable, can withstand high temperatures, and can be deposited at low temperatures, but can be brittle and challenging to work with. Compounds offer strength and durability, can be deposited at low temperatures and tailored to exhibit specific properties.
The selection of material for a thin film coating is dependent on the application requirements. Metals are ideal for thermal and electrical conduction, while oxides are effective in offering protection. Compounds can be tailored to suit specific needs. Ultimately, the best material for a particular project will depend on the specific needs of the application.
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What Does PECVD Stand For?
PECVD is a technology that uses plasma to activate reaction gas, promote chemical reaction on the surface of substrate or near surface space, and generate solid film. The basic principle of plasma chemical vapor deposition technology is that under the action of RF or DC electric field, the source gas is ionized to form a plasma, the low-temperature plasma is used as the energy source, an appropriate amount of reaction gas is introduced, and the plasma discharge is used to activate the reaction gas and realize chemical vapor deposition.
According to the method of generating plasma, it can be divided into RF plasma, DC plasma and microwave plasma CVD, etc...
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What Are The Methods To Achieve Optimal Thin Film Deposition?
To achieve thin films with desirable properties, high-quality sputtering targets and evaporation materials are essential. The quality of these materials can be influenced by various factors, such as purity, grain size, and surface condition.
The purity of sputtering targets or evaporation materials plays a crucial role, as impurities can cause defects in the resulting thin film. Grain size also affects the quality of the thin film, with larger grains leading to poor film properties. Additionally, the surface condition is crucial, since rough surfaces can result in defects in the film.
To attain the highest quality sputtering targets and evaporation materials, it is crucial to select materials that possess high purity, small grain size, and smooth surfaces.
Uses Of Thin Film Deposition
Zinc Oxide-Based Thin Films
ZnO thin films find applications in several industries such as thermal, optical, magnetic, and electrical, but their primary use is in coatings and semiconductor devices.
Thin-Film Resistors
Thin-film resistors are crucial for modern technology and are used in radio receivers, circuit boards, computers, radiofrequency devices, monitors, wireless routers, Bluetooth modules, and cell phone receivers.
Magnetic Thin Films
Magnetic thin films are used in electronics, data storage, radio-frequency identification, microwave devices, displays, circuit boards, and optoelectronics as key components.
Optical Thin Films
Optical coatings and optoelectronics are standard applications of optical thin films. Molecular beam epitaxy can produce optoelectronic thin-film devices (semiconductors), where epitaxial films are deposited one atom at a time onto the substrate.
Polymer Thin Films
Polymer thin films are used in memory chips, solar cells, and electronic devices. Chemical deposition techniques (CVD) offer precise control of polymer film coatings, including conformance and coating thickness.
Thin-Film Batteries
Thin-film batteries power electronic devices such as implantable medical devices, and the lithium-ion battery has advanced significantly thanks to the use of thin films.
Thin-Film Coatings
Thin-film coatings enhance the chemical and mechanical characteristics of target materials in various industries and technological fields. Anti-reflective coatings, anti-ultraviolet or anti-infrared coatings, anti-scratch coatings, and lens polarization are some common examples.
Thin-Film Solar Cells
Thin-film solar cells are essential to the solar energy industry, enabling the production of relatively cheap and clean electricity. Photovoltaic systems and thermal energy are the two main applicable technologies.
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What Is The Difference Between CVD And PECVD?
The difference between PECVD and traditional CVD technology is that the plasma contains a large number of high-energy electrons, which can provide the activation energy required in the chemical vapor deposition process, thus changing the energy supply mode of the reaction system. Since the electron temperature in the plasma is as high as 10000K, the collision between electrons and gas molecules can promote the chemical bond breaking and recombination of the reaction gas molecules to generate more active chemical groups, while the whole reaction system maintains a lower temperature.
So compared to the CVD process, PECVD can carry out the same chemical vapor deposition process with a lower temperature.
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Factors And Parameters That Influence Deposition Of Thin Films
Deposition Rate:
The rate at which the film is produced, typically measured in thickness divided by time, is crucial for selecting a technology suitable for the application. Moderate deposition rates are sufficient for thin films, while quick deposition rates are necessary for thick films. It is important to strike a balance between speed and precise film thickness control.
Uniformity:
The consistency of the film across the substrate is known as uniformity, which usually refers to film thickness but can also relate to other properties such as the index of refraction. It is important to have a good understanding of the application to avoid under- or over-specifying uniformity.
Fill Capability:
Fill capability or step coverage refers to how well the deposition process covers the substrate's topography. The deposition method used (e.g., CVD, PVD, IBD, or ALD) has a significant impact on step coverage and fill.
Film Characteristics:
The characteristics of the film depend on the application's requirements, which can be categorized as photonic, optical, electronic, mechanical, or chemical. Most films must meet requirements in more than one category.
Process Temperature:
Film characteristics are significantly affected by process temperature, which may be limited by the application.
Damage:
Each deposition technology has the potential to damage the material being deposited upon, with smaller features being more susceptible to process damage. Pollution, UV radiation, and ion bombardment are among the potential sources of damage. It is crucial to understand the limitations of the materials and tools.
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4.9
out of
5
The CVD Diamond coating has been a game-changer for our laboratory. Its durability and precision have significantly improved our research outcomes.
4.8
out of
5
We were skeptical at first, but the CVD Diamond coating has exceeded our expectations. Its versatility and cost-effectiveness make it an excellent investment.
4.7
out of
5
The CVD Diamond coating has revolutionized our micro-grinding applications. Its fine-grained structure and sharp edges ensure exceptional precision and surface finish.
4.9
out of
5
The CVD Diamond coating's low friction coefficient and wear resistance have drastically reduced maintenance costs and downtime in our laboratory.
4.8
out of
5
The CVD Diamond coating's thermal stability has been a lifesaver in our high-temperature applications. It has significantly reduced tool wear and improved our productivity.
4.7
out of
5
The CVD Diamond coating has opened up new possibilities for our research. Its ability to coat complex geometries has enabled us to create tools with unparalleled precision.
4.9
out of
5
The CVD Diamond coating's uniform thickness and consistency ensure reliable performance and predictable results in our laboratory.
4.8
out of
5
The CVD Diamond coating's strong adhesion to the substrate has eliminated delamination issues and extended the lifespan of our tools.
4.7
out of
5
The CVD Diamond coating's biocompatibility has made it an indispensable tool in our biomedical research.
4.9
out of
5
The CVD Diamond coating's ability to withstand extreme conditions has made it a valuable asset in our harsh environment applications.
4.8
out of
5
The CVD Diamond coating's low friction coefficient has significantly improved the efficiency and accuracy of our cutting operations.
4.7
out of
5
The CVD Diamond coating's excellent wear resistance has reduced tool wear and maintenance costs, saving us time and money.
4.9
out of
5
The CVD Diamond coating's versatility has enabled us to use it in a wide range of applications, from micro-machining to medical devices.
4.8
out of
5
The CVD Diamond coating's high thermal stability has improved the performance and longevity of our tools in high-temperature environments.
4.7
out of
5
The CVD Diamond coating's good adhesion has ensured a strong and durable bond between the coating and the substrate.
4.9
out of
5
The CVD Diamond coating's ability to grow a wide range of surface structures has allowed us to tailor the coating to our specific application needs.
4.8
out of
5
The CVD Diamond coating's chemically inert nature has made it resistant to corrosion and chemical attack, extending its lifespan.
4.7
out of
5
The CVD Diamond coating's biocompatibility has opened up new possibilities for our biomedical research.
4.9
out of
5
The CVD Diamond coating's excellent wear resistance has reduced maintenance costs and downtime, improving our productivity.
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