Products Thermal Equipment CVD & PECVD Furnace Inclined Rotary Plasma Enhanced Chemical Vapor Deposition PECVD Equipment Tube Furnace Machine
Inclined Rotary Plasma Enhanced Chemical Vapor Deposition PECVD Equipment Tube Furnace Machine

CVD & PECVD Furnace

Inclined Rotary Plasma Enhanced Chemical Vapor Deposition PECVD Equipment Tube Furnace Machine

Item Number : KT-PED

Price varies based on specs and customizations


Sample holder heating temperature
≤800℃
Gas purge channels
4 channels
Vacuum chamber chamber size
Φ500mm × 550 mm
ISO & CE icon

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Introduction

Plasma Enhanced Chemical Vapor Deposition (PECVD) is a vacuum thin film deposition process that uses vapors or gases as precursors to create a coating. PECVD is a variation of chemical vapor deposition (CVD) that uses plasma instead of heat to activate the source gas or vapor. Since high temperatures can be avoided, the range of possible substrates expands to low melting point materials – even plastics in some cases. Moreover, the range of coating materials that can be deposited also grows. PECVD is used to deposit a wide variety of materials, including dielectrics, semiconductors, metals, and insulators. PECVD coatings are used in a wide variety of applications, including solar cells, flat panel displays, and microelectronics.

Applications

Plasma Enhanced Chemical Vapor Deposition (PECVD) coating machines offer a versatile solution for various industries and applications:

  • LED Lighting:** Deposition of high-quality dielectric and semiconductor films for light-emitting diodes (LEDs).
  • Power Semiconductors:** Formation of insulating layers, gate oxides, and other critical components in power semiconductor devices.
  • MEMS:** Fabrication of thin films for microelectromechanical systems (MEMS), such as sensors and actuators.
  • Optical Coatings:** Deposition of anti-reflection coatings, optical filters, and other optical components.
  • Thin Film Solar Cells:** Production of amorphous and microcrystalline silicon thin films for solar cell devices.
  • Surface Modification:** Enhancement of surface properties, such as corrosion resistance, wear resistance, and biocompatibility.
  • Nanotechnology:** Synthesis of nanomaterials, including nanoparticles, nanowires, and thin films.

Plasma enhanced evaporation deposition PECVD coating machine details

 

Features

The Plasma Enhanced Chemical Vapor Deposition (PECVD) Coating Machine offers numerous advantages that enhance productivity and deliver exceptional results:

  • Low-temperature deposition: Enables the formation of high-quality films at temperatures significantly lower than traditional CVD methods, making it suitable for delicate substrates.
  • High deposition rates: Maximizes efficiency by depositing films rapidly, reducing production time and increasing output.
  • Uniform and crack-resistant films: Ensures consistent film properties and minimizes the risk of cracking, leading to reliable and durable coatings.
  • Excellent adhesion to substrates: Provides strong bonding between the film and the substrate, ensuring long-lasting performance and preventing delamination.
  • Versatile coating capabilities: Allows for the deposition of a wide range of materials, including SiO2, SiNx, and SiOxNy, to meet diverse application requirements.
  • Customization for complex geometries: Accommodates substrates with intricate shapes, ensuring uniform coating and optimal performance.
  • Low maintenance and easy installation: Minimizes downtime and simplifies setup, enhancing productivity and cost-effectiveness.

Technical specifications

Sample holder Size 1-6 inches
Rotate speed 0-20rpm adjustable
Heating temperature ≤800℃
Control accuracy ±0.5℃  SHIMADEN PID Controller
Gas purge Flow meter  MASS FLOWMETER CONTROLLER (MFC)
Channels 4 channels
Cooling method Circulating water cooling
Vacuum chamber Chamber size Φ500mm X 550mm    
Observation port Full view port with baffle
Chamber material 316 Stainless steel
Door type Front open type door
  Cap material 304 Stainless steel
Vacuum pump port CF200 flange
Gas inlet port  φ6 VCR connector
Plasma power Source power DC power or RF power
Coupling mode Inductively coupled or plate capacitive
Output power 500W—1000W
Bias power 500v
Vacuum pump Pre- pump 15L/S Vane vacuum pump
Turbo pump port CF150/CF200  620L/S-1600L/S
Relief port KF25
Pump speed Vane pump:15L/s,Turbo pump:1200l/s或1600l/s
Vacuum degree ≤5×10-5Pa
Vacuum sensor Ionization/resistance vacuum gauge/film gauge
System Electric power supply AC 220V /380 50Hz
Rated power 5kW
Dimensions 900mm X 820mm X870mm
Weight 200kg

Principle

Plasma Enhanced Chemical Vapor Deposition (PECVD) utilizes plasma to stimulate chemical reactions during deposition, enabling high-quality solid films to be formed at low temperatures. By employing high-energy plasma, PECVD machines enhance reaction rates and lower reaction temperatures. This technique is widely used in LED lighting, power semiconductors, and MEMS. It allows for the deposition of SiO2, SiNx, SiOxNy, and other media films, as well as high-speed deposition of SiO thick films on composite substrates. PECVD offers excellent film-forming quality, minimizes pinholes, and reduces cracking, making it suitable for producing amorphous and microcrystalline silicon thin film solar cell devices.

Advantage

  • Ability to deposit various materials: PECVD can deposit a wide range of materials, including diamond-like carbon, silicon compounds, and metal oxides, allowing for the creation of films with tailored properties.
  • Low-temperature operation: PECVD operates at low temperatures (typically 300-450°C), making it suitable for heat-sensitive substrates.
  • High-quality thin films: PECVD produces thin films with exceptional uniformity, thickness control, and resistance to cracking.
  • Excellent adhesion: The films deposited by PECVD exhibit strong adhesion to the substrate, ensuring durability and reliability.
  • Conformal coating: PECVD enables the coating of complex geometries, providing uniform coverage and protection.
  • High deposition rates: PECVD offers fast deposition rates, increasing productivity and reducing production time.
  • Low maintenance: PECVD systems are designed for low maintenance, minimizing downtime and maximizing uptime.
  • Easy installation: PECVD equipment is relatively easy to install and integrate into existing production lines.
  • Rigid design: PECVD systems are built with robust designs, ensuring stability and long-lasting performance.
  • Extended working life: PECVD systems are designed for longevity, providing a cost-effective solution for long-term thin film deposition needs.

Warnings

Operator safety is the top important issue! Please operate the equipment with cautions. Working with inflammable& explosive or toxic gases is very dangerous, operators must take all necessary precautions before starting the equipment. Working with positive pressure inside the reactors or chambers is dangerous, operator must fellow the safety procedures strictly. Extra caution must also be taken when operating with air-reactive materials, especially under vacuum. A leak can draw air into the apparatus and cause a violent reaction to occur.

Designed for You

KinTek provide deep custom made service and equipment to worldwide customers, our specialized teamwork and rich experienced engineers are capable to undertake the custom tailoring hardware and software equipment requirements, and help our customer to build up the exclusive and personalized equipment and solution!

Would you please drop your ideas to us, our engineers are ready for you now!

FAQ

What Is PECVD Method?

PECVD (Plasma Enhanced Chemical Vapor Deposition) is a process used in semiconductor manufacturing to deposit thin films on microelectronic devices, photovoltaic cells, and display panels. In PECVD, a precursor is introduced to the reaction chamber in a gaseous state, and the assistance of plasma reactive media dissociates the precursor at much lower temperatures than with CVD. PECVD systems offer excellent film uniformity, low-temperature processing, and high throughput. They are used in a wide range of applications and will play an increasingly important role in the semiconductor industry as the demand for advanced electronic devices continues to grow.

What Is Mpcvd?

MPCVD stands for Microwave Plasma Chemical Vapor Deposition and it is a process of depositing thin films onto a surface. It uses a vacuum chamber, microwave generator, and gas delivery system to create a plasma made up of reacting chemicals and necessary catalysts. MPCVD is heavily used in the ANFF network to deposit layers of diamond using methane and hydrogen to grow new diamond on a diamond-seeded substrate. It is a promising technology for producing low-cost, high-quality large diamonds and is extensively used in the semiconductor and diamond cutting industry.

What Is PECVD Used For?

PECVD (Plasma Enhanced Chemical Vapor Deposition) is widely used in the semiconductor industry to fabricate integrated circuits, as well as in the photovoltaic, tribological, optical, and biomedical fields. It is used to deposit thin films for microelectronic devices, photovoltaic cells, and display panels. PECVD can produce unique compounds and films that cannot be created by common CVD techniques alone, and films that demonstrate high solvent and corrosion resistance with chemical and thermal stability. It is also used to produce homogenous organic and inorganic polymers over large surfaces, and Diamond-like Carbon (DLC) for tribological applications.

What Is Mpcvd Machine?

The MPCVD (Microwave Plasma Chemical Vapor Deposition) machine is a laboratory equipment used to grow high-quality diamond films. It uses a carbon-containing gas and a microwave plasma to create a plasma ball above the diamond substrate, which heats it to a specific temperature. The plasma ball doesn't contact the cavity wall, making the diamond growth process free from impurities and enhancing the diamond's quality. The MPCVD system consists of a vacuum chamber, a microwave generator, and a gas delivery system that controls the flow of gas into the chamber.

What Are The Advantages Of PECVD?

The primary advantages of PECVD are its ability to operate at lower deposition temperatures, providing better conformity and step coverage on uneven surfaces, tighter control of the thin film process, and high deposition rates. PECVD allows for successful applications in situations where conventional CVD temperatures could potentially damage the device or substrate being coated. By operating at a lower temperature, PECVD creates less stress between thin film layers, allowing for high-efficiency electrical performance and bonding to very high standards.

What Are The Advantages Of Mpcvd?

MPCVD has several advantages over other methods of diamond production, such as higher purity, less energy consumption, and the ability to produce larger diamonds.

What Is The Difference Between ALD And PECVD?

ALD is a thin film deposition process that allows for atomic layer thickness resolution, excellent uniformity of high aspect ratio surfaces and pinhole-free layers. This is achieved by the continuous formation of atomic layers in a self-limiting reaction. PECVD, on the other hand, involves mixing the source material with one or more volatile precursors using a plasma to chemically interact and breakdown the source material. The processes use heat with higher pressures leading to a more reproducible film where the film thicknesses could be managed by time/power. These films are more stoichiometric, denser and are capable of growing higher quality insulator films.

Are CVD Diamonds Real Or Fake?

CVD diamonds are real diamonds and not fake. They are grown in a laboratory through a process called Chemical Vapor Deposition (CVD). Unlike natural diamonds that are mined from under the earth's surface, CVD diamonds are created using advanced technology in labs. These diamonds are 100% carbon and are the purest form of diamonds known as Type IIa diamonds. They have the same optical, thermal, physical, and chemical properties as natural diamonds. The only difference is that CVD diamonds are created in a lab and not mined from the earth.

What Is The Difference Between PECVD And Sputtering?

PECVD and sputtering are both physical vapor deposition techniques used for thin film deposition. PECVD is a diffusive gas-driven process that yields very high-quality thin films while sputtering is a line-of-sight deposition. PECVD allows for better coverage on uneven surfaces such as trenches, walls, and high conformity and can produce unique compounds and films. On the other hand, sputtering is good for the deposition of fine layers of several materials, ideal for creating multi-layered and multi-graduated coating systems. PECVD is mainly used in the semiconductor industry, tribological, optical, and biomedical fields while sputtering is mostly used for dielectric materials and tribological applications.
View more faqs for this product

4.9

out of

5

I'm impressed by how quickly my PECVD coating machine arrived. It was delivered within a week of ordering, which was much faster than I expected.

Imelda Sanchez

4.7

out of

5

The PECVD coating machine is an excellent value for the price. It's well-made and produces high-quality coatings.

Kristoffer Jensen

4.8

out of

5

I've been using the PECVD coating machine for a few months now, and I'm very happy with its performance. The coatings are durable and have improved the performance of my products.

Amelia Dubois

4.9

out of

5

The PECVD coating machine is a game-changer for my business. It's helped me to increase my production capacity and improve the quality of my products.

Liam Harrison

4.7

out of

5

I'm very impressed with the technological advancements of the PECVD coating machine. It's a cutting-edge piece of equipment that has helped me to stay ahead of the competition.

Oliver Schmidt

4.8

out of

5

The PECVD coating machine is easy to use and maintain. I've had no problems with it since I purchased it.

Isabella Garcia

4.9

out of

5

I highly recommend the PECVD coating machine to anyone who needs a high-quality, durable coating for their products.

Alexander Ivanov

4.7

out of

5

The PECVD coating machine is a great investment for any business. It's helped me to save money and improve the quality of my products.

Emma Wilson

4.8

out of

5

I'm very satisfied with the PECVD coating machine. It's a reliable and efficient piece of equipment that has helped me to improve my production process.

Jacob Cohen

4.9

out of

5

The PECVD coating machine is a must-have for any business that wants to improve the quality of its products. It's a versatile and easy-to-use machine that can be used for a variety of applications.

Abigail Rodriguez

4.7

out of

5

I'm very happy with the PECVD coating machine. It's a well-made and durable machine that has helped me to improve the performance of my products.

Lucas Meyer

4.8

out of

5

The PECVD coating machine is a great value for the price. It's a high-quality machine that has helped me to improve the efficiency of my production process.

Mia Kim

4.9

out of

5

I'm very impressed with the PECVD coating machine. It's a versatile and easy-to-use machine that has helped me to improve the quality of my products.

Ethan Jones

4.7

out of

5

The PECVD coating machine is a great investment for any business. It's a reliable and efficient machine that has helped me to save money and improve the quality of my products.

Sofia Perez

4.8

out of

5

I'm very happy with the PECVD coating machine. It's a well-made and durable machine that has helped me to improve the performance of my products.

Oliver Chen

4.9

out of

5

The PECVD coating machine is a must-have for any business that wants to improve the quality of its products. It's a versatile and easy-to-use machine that can be used for a variety of applications.

Isabella Garcia

4.7

out of

5

I'm very happy with the PECVD coating machine. It's a well-made and durable machine that has helped me to improve the performance of my products.

Alexander Ivanov

4.8

out of

5

The PECVD coating machine is a great investment for any business. It's a reliable and efficient machine that has helped me to save money and improve the quality of my products.

Emma Wilson

4.9

out of

5

I'm very impressed with the PECVD coating machine. It's a versatile and easy-to-use machine that has helped me to improve the quality of my products.

Jacob Cohen

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