Products Thermal Equipment MPCVD Cylindrical Resonator MPCVD Machine System Reactor for Microwave Plasma Chemical Vapor Deposition and Lab Diamond Growth
Cylindrical Resonator MPCVD Machine System Reactor for Microwave Plasma Chemical Vapor Deposition and Lab Diamond Growth

MPCVD

Cylindrical Resonator MPCVD Machine System Reactor for Microwave Plasma Chemical Vapor Deposition and Lab Diamond Growth

Item Number : KTWB315

Price varies based on specs and customizations


Microwave Power
Microwave frequency 2450±15MHZ
Output power
1~10 KW continuously adjustable
Microwave leakage
≤2MW/cm2
Output wave guide interface
WR340, 430 with FD-340, 430 standard flange
Sample holder
Diameter of sample table≥72mm, effective use area≥66 mm
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MPCVD stands for Microwave Plasma Chemical Vapor Deposition. It is a method of growing high quality diamond films in laboratory by using a carbon-containing gas and a microwave plasma.

KinTek MPCVD

MPCVD System

The MPCVD (Microwave Plasma Chemical Vapor Deposition) system is a process used to deposit thin films onto a substrate surface. The system consists of a vacuum chamber where the deposition process takes place, a microwave generator, and a gas delivery system. The microwave generator is used to generate a plasma inside the vacuum chamber, which is used to decompose and deposit the gas species onto the substrate.

The microwave generator is typically a magnetron or klystron, which generates microwaves in the range of 2.45 GHz. The microwaves are coupled to the vacuum chamber through a quartz window.

The gas delivery system consists of mass flow controllers (MFCs) that control the flow of gas into the vacuum chamber. The MFCs are calibrated in standard cubic centimeter per minute (sccm).

The substrate temperature is controlled by the position of the plasma and is measured by a thermocouple. The plasma is used to heat the substrate, and the temperature is monitored by the thermocouple to ensure that the substrate is at the desired temperature during the deposition process.

Applications

MPCVD is a promising technology for producing low-cost, high-quality large diamonds.

Diamond's unique properties, including its hardness, stiffness, high thermal conductivity, low thermal expansion, radiation-hardness, and chemical inertness, make it a valuable material.

Despite its great potential, the high cost, limited size, and difficulty controlling impurities of natural and synthetic high-pressure, high-temperature diamonds have limited their applications.

MPCVD is the primary equipment used for growing diamond gemstones and films. 

Diamond film growth can be either monocrystal or poly-crystalline, and it is extensively used in the semi-conductor industry for large-size diamond substrates as well as in the diamond cutting or drilling tools industry. 

Compared to the HPHT method for lab-grown diamonds, the microwave CVD method is advantageous for large-sized diamond growth at a lower cost, making it an ideal solution for applications of semi-conductor diamonds, optics diamond growth, and the large jewelry diamond market needs.

KINTEK MPCVD machines
KINTEK MPCVD diamond machines
New model KINTEK MPCVD diamond machine
New model KINTEK MPCVD diamond machine
New model KINTEK MPCVD diamond machine
New model KINTEK MPCVD diamond machine
Rough diamonds grown by KINTEK MPCVD
Rough diamonds grown by KINTEK MPCVD
In KinTek MPCVD Machine, diamonds are growing
In KinTek MPCVD Machine, diamonds are growing
In KinTek MPCVD Machine, diamonds are growing
In KinTek MPCVD Machine, diamonds are growing
In KinTek MPCVD Machine, diamonds are growing
In KinTek MPCVD Machine, diamonds are growing
In KinTek MPCVD Machine, diamonds are growing
In KinTek MPCVD Machine, diamonds are growing
In KinTek MPCVD Machine, diamonds are growing
In KinTek MPCVD Machine, diamonds are growing
Rough diamond grown by KINTEK MPCVD machine
Rough diamond grown by KINTEK MPCVD machine
Rough diamond grown by KINTEK MPCVD machine
Rough diamond grown by KINTEK MPCVD machine
Rough diamond grown by KINTEK MPCVD machine
Rough diamond grown by KINTEK MPCVD machine
MPCVD grown diamonds after polishing
MPCVD grown diamonds after polishing
Polycrystalline by KinTek MPCVD
Polycrystalline by KinTek MPCVD

Advantages of MPCVD

MPCVD is a diamond synthesis method that has several advantages over other methods, such as HFCVD and DC-PJ CVD. It avoids diamond contamination by hot wires and allows the use of multiple gases to meet different industrial needs. Compared to DC-PJ CVD, it enables smooth and continuous adjustment of microwave power and stable control of the reaction temperature, which avoids crystal seeds falling off the substrate due to arcing and flame failure. With a large area of stable discharge plasma, the MPCVD method is considered the most promising diamond synthesis method for industrial applications.

The diamonds produced through MPCVD are of higher purity compared to those produced using the HPHT method, and the production process consumes less energy. Additionally, the MPCVD method facilitates the production of larger diamonds.

Advantages of Our MPCVD System

We have been deeply involved in the industry for many years, and as a result, we have a vast customer base who trust and use our equipment. Our MPCVD equipment has been running steadily for over 40,000 hours, demonstrating exceptional stability, reliability, repeatability, and cost-effectiveness. More advantages of our MPCVD system include:

  • 3 inches substrate growing area, max. batch load up to 45 pieces diamonds
  • 1-10Kw adjustable output microwave power for less electricity consumption
  • Rich experienced researching team with frontier diamond growing recipe support
  • Exclusive technical support program for Zero diamond growing experience team

By leveraging our accumulated advanced technology, we have implemented multiple rounds of upgrades and improvements to our MPCVD system, resulting in significantly improved efficiency and reduced equipment costs. As a result, our MPCVD equipment is at the forefront of technological advancements and offered at a competitive price. Welcome to consult with us.

KinTek MPCVD Simulation
KinTek MPCVD Simulation

Working Processing

The MPCVD machine controls the flow of each gas path and cavity pressure while introducing reactant gases (such as CH4, H2, Ar, O2, N2, etc.) into the cavity under specific pressure. After stabilizing the airflow, the 6KW solid-state microwave generator generates microwaves that are then introduced into the cavity through the waveguide.

The reaction gas transforms into a plasma state under the microwave field, forming a plasma ball that hovers above the diamond substrate. The high temperature of the plasma heats the substrate to a specific temperature. Excess heat produced in the cavity is dissipated by the water cooling unit.

To ensure optimal growth conditions during the MPCVD single crystal diamond growth process, we adjust factors such as power, gas source composition, and cavity pressure. Furthermore, since the plasma ball doesn't contact the cavity wall, the diamond growth process is free from impurities, thereby enhancing the diamond's quality.

Detail & Parts

Microwave system

Microwave system

Reaction chamber

Reaction chamber

Gas flow system

Gas flow system

Vacuum and sensor system

Vacuum and sensor system

Technical specifications

Microwave system
  • Microwave frequency 2450±15MHZ,
  • Output power 1~10 KW continuously adjustable
  • Microwave output power stability: <±1%
  • Microwave leakage ≤2MW/cm2
  • Output wave guide interface: WR340, 430 with FD-340, 430 standard flange
  • Cooling water flow: 6-12L/min
  • System standing wave coefficient: VSWR ≤ 1.5
  • Microwave manual 3 pin adjuster, excitation cavity, high-power load
  • Input power supply: 380VAC/50Hz ± 10%, three-phase 
Reaction chamber
  • Vacuum leakage rate<5 × 10-9 Pa .m3/s
  • The limit pressure is less than 0.7 Pa(Standard setup with Pirani vacuum gauge) 
  • The pressure rise of chamber shall not exceed 50Pa after 12 hours of pressure maintaining
  • Working mode of reaction chamber: TM021 or TM023 mode
  • Cavity type: Cylindrical resonant cavity, with maximum bearing power of 10KW, made of 304 stainless steel, with water-cooled inter-layer, and high purity quartz plate sealing method.
  • Air intake mode: Top annular uniform air intake
  • Vacuum sealing: The bottom connection of the main chamber and the injection door are sealed with rubber rings, the vacuum pump and bellows are sealed with KF, the quartz plate is sealed with a metal C-ring, and the rest are sealed with CF
  • Observation and temperature measurement window: 8 observation port
  • Sample load port in front of chamber
  • Stable discharge within the pressure range of 0.7KPa~30KPa (the power pressure shall be matched)
Sample holder
  • Diameter of sample table≥72mm, effective use area≥66 mm
  • Base plate platform water-cooled sandwich structure
  • Sample holder can be lifted and lowered evenly electrically in the cavity
Gas flow system
  • All metal welding air disk
  • Welding or VCR joints shall be used for all internal gas circuits of the equipment.
  • 5 channels MFC flow meter, H2/CH4/O2/N/Ar. H2: 1000 sccm ;CH4:100 sccm; O2: 2 sccm; N2: 2 sccm; Ar: 10 sccm
  • Working press 0.05-0.3MPa, accuracy ±2%
  • Independent Pneumatic valve control for each channel flow meter
Cooling system
  • 3 lines water cooling, real-time monitoring of temperature and flow.
  • The system cooling water flow is ≤ 50L/min
  • The cooling water pressure is<4KG, and the inlet water temperature is 20-25 ℃.
Temperature sensor
  • The external infrared thermometer has a temperature range of 300-1400 ℃ 
  • Temperature control accuracy < 2 ℃ or 2%
Control system
  • Siemens smart 200 PLC and touch screen control are adopted. 
  • The system has a variety of programs, which can realize the automatic balance of growth temperature, accurate control of growth air pressure, automatic temperature rise, automatic temperature drop and other functions. 
  • The stable operation of the equipment and comprehensive protection of the equipment can be achieved through the monitoring of water flow, temperature, pressure and other parameters, and the reliability and safety of the operation can be guaranteed through functional interlocking. 
Optional function
  • Center monitoring system
  • Substrate basing power

Warnings

Operator safety is the top important issue! Please operate the equipment with cautions. Working with inflammable& explosive or toxic gases is very dangerous, operators must take all necessary precautions before starting the equipment. Working with positive pressure inside the reactors or chambers is dangerous, operator must fellow the safety procedures strictly. Extra caution must also be taken when operating with air-reactive materials, especially under vacuum. A leak can draw air into the apparatus and cause a violent reaction to occur.

Designed for You

KinTek provide deep custom made service and equipment to worldwide customers, our specialized teamwork and rich experienced engineers are capable to undertake the custom tailoring hardware and software equipment requirements, and help our customer to build up the exclusive and personalized equipment and solution!

Would you please drop your ideas to us, our engineers are ready for you now!

FAQ

What Is Mpcvd?

MPCVD stands for Microwave Plasma Chemical Vapor Deposition and it is a process of depositing thin films onto a surface. It uses a vacuum chamber, microwave generator, and gas delivery system to create a plasma made up of reacting chemicals and necessary catalysts. MPCVD is heavily used in the ANFF network to deposit layers of diamond using methane and hydrogen to grow new diamond on a diamond-seeded substrate. It is a promising technology for producing low-cost, high-quality large diamonds and is extensively used in the semiconductor and diamond cutting industry.

What Is Mpcvd Machine?

The MPCVD (Microwave Plasma Chemical Vapor Deposition) machine is a laboratory equipment used to grow high-quality diamond films. It uses a carbon-containing gas and a microwave plasma to create a plasma ball above the diamond substrate, which heats it to a specific temperature. The plasma ball doesn't contact the cavity wall, making the diamond growth process free from impurities and enhancing the diamond's quality. The MPCVD system consists of a vacuum chamber, a microwave generator, and a gas delivery system that controls the flow of gas into the chamber.

What Are The Advantages Of Mpcvd?

MPCVD has several advantages over other methods of diamond production, such as higher purity, less energy consumption, and the ability to produce larger diamonds.

Are CVD Diamonds Real Or Fake?

CVD diamonds are real diamonds and not fake. They are grown in a laboratory through a process called Chemical Vapor Deposition (CVD). Unlike natural diamonds that are mined from under the earth's surface, CVD diamonds are created using advanced technology in labs. These diamonds are 100% carbon and are the purest form of diamonds known as Type IIa diamonds. They have the same optical, thermal, physical, and chemical properties as natural diamonds. The only difference is that CVD diamonds are created in a lab and not mined from the earth.
View more faqs for this product

4.9

out of

5

KINTEK's MPCVD machine is a game-changer! Its 1-10Kw adjustable output microwave power feature not only saves electricity but also ensures precise control over the diamond growth process.

Harshitha Gujjar

4.8

out of

5

As a lab manager, I appreciate the stability and reliability of the KINTEK MPCVD system. It has been running non-stop for over 40,000 hours, providing us with consistent, high-quality diamond growth.

Elvin Wang

4.7

out of

5

The rich experience and frontier diamond growing recipe support from KINTEK's research team have been invaluable. Their expertise has helped us optimize our MPCVD process and achieve exceptional results.

Sophia Mitchell

4.8

out of

5

KINTEK's exclusive technical support program for teams with zero diamond growing experience is a lifesaver. Their guidance and assistance have been instrumental in our successful adoption of the MPCVD system.

Mustafa Kamal

5.0

out of

5

The 3 inches substrate growing area and max. batch load of up to 45 pieces diamonds make the KINTEK MPCVD machine a highly efficient and productive choice for our lab. We can now produce more diamonds in less time.

Isabella Garcia

4.9

out of

5

The KINTEK MPCVD system is a technological marvel. Its advanced features and continuous upgrades have kept us at the forefront of diamond growth innovation.

Oliver Chen

4.7

out of

5

The competitive price of the KINTEK MPCVD equipment makes it an affordable and accessible solution for labs like ours. We're grateful for the opportunity to leverage its cutting-edge technology without breaking the bank.

Aisha Khan

5.0

out of

5

The KINTEK MPCVD machine has exceeded our expectations. Its user-friendly interface, stable performance, and exceptional diamond quality have made it an indispensable tool in our lab.

Elijah Harper

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