CVD & PECVD Furnace
Customer made versatile CVD tube furnace CVD machine
Item Number : KT-CTF16
Price varies based on specs and customizations
- Max. temperature
- 1600 ℃
- Constant work temperature
- 1550 ℃
- Furnace tube diameter
- 60 mm
- Heating zone
- 3x300 mm
- Heating rate
- 0-10 ℃/min
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Introduction
The CVD Tube Furnace is a high-temperature furnace used for chemical vapor deposition (CVD) processes. It features multiple heating zones that allow for precise temperature control, a high vacuum pump that creates a vacuum environment for CVD processes, and a mass flow gas control station that mixes and inputs gases into the furnace tube. The furnace is capable of reaching temperatures up to 1200°C and has an ultimate vacuum rate of 10^-7 torr. It is commonly used in the semiconductor industry for depositing thin films of various materials, including insulating materials, metallic materials, and metal alloy materials.
Applications
Multi-Zone CVD Tube Furnaces are widely used in various research and industrial applications, including:
- Nanomaterial Synthesis: The CVD tube furnace is ideal for the growth of nanowires and the preparation of nanofilms, which are crucial for developing advanced materials with unique properties.
- Coating Technologies: It is widely used for the deposition of metal films, ceramic films, and composite films, which are essential for enhancing the surface properties of various materials.
- Battery Material Processing: The furnace is suitable for the drying and sintering of battery materials, which is a critical step in the production of high-performance energy storage devices.
- High-Temperature Sintering: It is employed in high-temperature atmosphere sintering and atmosphere reduction processes, which are necessary for the densification of materials.
- Vacuum Coating: The high vacuum capabilities of the furnace make it perfect for vacuum coating applications, where the purity and quality of the coating are paramount.
- Research and Development: Universities and scientific research institutes utilize this equipment for a wide range of experiments in the field of material science, including CVD/CVI (Chemical Vapor Infiltration) studies.
- Industrial Applications: In industrial settings, the CVD tube furnace is used for processes that require precise temperature control and gas management, such as in the semiconductor industry.
- Plasma Cleaning and Etching: The versatility of the equipment allows for the expansion of functionalities to include plasma cleaning and etching, which are essential for preparing substrates before deposition.
Features
CVD Tube Furnace is a versatile and high-performance furnace that is ideal for a variety of applications in research and industry. With its advanced features and capabilities, this furnace can help you achieve the best possible results in your work.
- Multi-zone temperature control:This furnace features multi-zone temperature control, which allows you to precisely control the temperature in different zones of the furnace. This is essential for applications where you need to create a specific temperature profile or gradient.
- High temperature capability:This furnace can reach temperatures up to 1200°C, making it ideal for a wide range of applications. This high temperature capability makes it possible to perform demanding processes such as CVD, diffusion, and other thermo-treatments.
- Vacuum or atmosphere protection: This furnace can be used under vacuum or atmosphere protection, making it suitable for a variety of applications. This versatility makes it possible to perform processes that require a specific atmosphere or vacuum environment.
- Easy to use:This furnace is easy to use, with a user-friendly interface and intuitive controls. This makes it easy to set up and operate the furnace, even for users with limited experience.
- Compact design: This furnace is compact and lightweight, making it easy to install and use in a variety of spaces. This compact design makes it ideal for use in laboratories and other space-constrained environments.
Principle
Chemical Vapor Deposition (CVD) is a thin film deposition technique in which a solid material is deposited onto a substrate from a gas phase. The substrate is heated to a high temperature, and a gas containing the desired material is introduced into the chamber. The gas reacts with the substrate, and the desired material is deposited onto the surface.
CVD Tube Furnaces are used for CVD processes. The furnace consists of a heated tube, which is typically made of quartz or alumina. The substrate is placed inside the tube, and the gas is introduced into the tube. The gas flows through the tube and reacts with the substrate, depositing the desired material onto the surface.
CVD Tube Furnaces can be used to deposit a wide variety of materials, including metals, oxides, nitrides, and carbides. The process is used in the manufacture of semiconductors, solar cells, and other electronic devices.
Different temperature and setup CVD systems available
Principle
The CVD tube furnace operates on the principle of chemical vapor deposition, utilizing a high vacuum system and precise mass flow controllers to facilitate the deposition of various films under controlled conditions. It employs radio frequency glow technology for high deposition rates and advanced heating techniques for uniform film distribution.
Advantages
- High temperature uniformity:The multi-zone design ensures that the temperature is evenly distributed throughout the furnace, which is critical for CVD processes.
- Precise temperature control: The digital temperature controller allows for precise control of the furnace temperature, which is essential for repeatable and reliable results.
- High vacuum capability: The ultimate vacuum rate of 10^-7 torr allows for the removal of contaminants from the reaction chamber, which is necessary for high-quality CVD films.
- Easy to use:The user-friendly interface makes the furnace easy to operate, even for inexperienced users.
- Versatile: The furnace can be used for a wide variety of CVD processes, including metal deposition, semiconductor processing, and carbon nanotube synthesis.
- Compact design: The compact design of the furnace makes it ideal for use in space-constrained laboratories.
- Affordable: The furnace is competitively priced, making it an excellent value for the money.
Technical specifications
| Furnace model | KT-CTF16-60 |
|---|---|
| Max. temperature | 1600℃ |
| Constant work temperature | 1550℃ |
| Furnace tube material | High purity Al2O3 tube |
| Furnace tube diameter | 60mm |
| Heating zone | 3x300mm |
| Chamber material | Alumina polycrystalline fiber |
| Heating element | Silicon Carbide |
| Heating rate | 0-10℃/min |
| Thermal couple | S type |
| Temperature controller | Digital PID controller/Touch screen PID controller |
| Temperature control accuracy | ±1℃ |
| Gas precise control unit | |
| Flow meter | MFC mass flow meter |
| Gas channels | 3 channels |
| Flow rate | MFC1: 0-5SCCM O2 MFC2: 0-20SCMCH4 MFC3: 0- 100SCCM H2 MFC4: 0-500 SCCM N2 |
| Linearity | ±0.5% F.S. |
| Repeatability | ±0.2% F.S. |
| Pipe line and valve | Stainless steel |
| Maximum Operating Pressure | 0.45MPa |
| Flow meter controller | Digital Knob controller/Touch screen controller |
| Standard vacuum unit(Optional) | |
| Vacuum pump | Rotary vane vacuum pump |
| Pump flow rate | 4L/S |
| Vacuum suction port | KF25 |
| Vacuum gauge | Pirani/Resistance silicon vacuum gauge |
| Rated vacuum pressure | 10Pa |
| High vacuum unit(Optional) | |
| Vacuum pump | Rotary vane pump+Molecular pump |
| Pump flow rate | 4L/S+110L/S |
| Vacuum suction port | KF25 |
| Vacuum gauge | Compound vacuum gauge |
| Rated vacuum pressure | 6x10-5Pa |
| Above specifications and setups can be customized | |
Standard Package
| No. | Description | Quantity |
|---|---|---|
| 1 | Furnace | 1 |
| 2 | Quartz tube | 1 |
| 3 | Vacuum flange | 2 |
| 4 | Tube thermal block | 2 |
| 5 | Tube thermal block hook | 1 |
| 6 | Heat resistant glove | 1 |
| 7 | Precise gas control | 1 |
| 8 | Vacuum unit | 1 |
| 9 | Operation manual | 1 |
Optional Setup
- In tube gases detecting and monitoring,like H2, O2 and so on
- Independent furnace temperature monitoring and recording
- RS 485 communication port for PC remote control and data exporting
- Insert gases feeding flow rate control,like mass flowmeter and float flowmeter
- Touch screen temperature controller with versatile operator friendly functions
- High vacuum pump station setups, like vane vacuum pump,molecular pump,diffusion pump
Warnings
Operator safety is the top important issue! Please operate the equipment with cautions. Working with inflammable& explosive or toxic gases is very dangerous, operators must take all necessary precautions before starting the equipment. Working with positive pressure inside the reactors or chambers is dangerous, operator must fellow the safety procedures strictly. Extra caution must also be taken when operating with air-reactive materials, especially under vacuum. A leak can draw air into the apparatus and cause a violent reaction to occur.
Designed for You
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Would you please drop your ideas to us, our engineers are ready for you now!
FAQ
What is CVD furnace?
Chemical vapor deposition (CVD) is a technology that uses various energy sources such as heating, plasma excitation or light radiation to chemically react gaseous or vapor chemical substances on the gas phase or gas-solid interface to form solid deposits in the reactor by means of chemical reaction.To put it simply, two or more gaseous raw materials are introduced into a reaction chamber, and then they react with each other to form a new material and deposit it on the substrate surface.
CVD furnace is one combined furnace system with high temperature tube furnace unit,gases control unit, and vacuum unit, it is widely used for experiment and production of composite material preparation, microelectronics process, semiconductor optoelectronic, solar energy utilization, optical fiber communication, superconductor technology, protective coating field.
What is a tube furnace?
Laboratory tube furnace is one classic external heating high temperature tube furnace, also named hot wall heating furnace.
According to the different working temperature, furnace tube material usually can be transparent quartz tubes, high purity alumina ceramic tubes and high strength metal alloy tubes.
To meet different thermal researching purposes, tube furnace can be designed with multi heating zones, so as to have a flexible control of temperature gradient in the tube working chamber; furnace tube can work with a controlled atmosphere working environment or a high vacuum working environment.
What is CVD (Chemical Vapor Deposition) and what are its key advantages?
How does CVD furnace work?
CVD furnace system consists of high temperature tube furnace unit, reacting gas source precise control unit, vacuum pump station and corresponding assembling parts.
Vacuum pump is to remove the air from the reacting tube,and make sure there is no unwanted gases inside the reaction tube, after that the tube furnace will heat the reaction tube to a target temperature, then reacting gas source precise control unit can introduce different gases with a set ratio into the furnace tube for the chemical reaction, the chemical vapor deposition will be formed in the CVD furnace.
What is PECVD method?
How does a tube furnace work?
Tube furnace heating elements are placed surrounding the cylindrical cavity, furnace can only heat the samples in the cylindrical cavity through indirect thermal radiation, since furnace tube can prevent sample material from contacting with furnace heating elements and insulation materials, so tube furnace creates a clean isolated heat chamber and reduce risks of the sample material contaminating by the furnace.
What are the methods used to deposit thin films?
What are some common applications of CVD materials?
What is Mpcvd?
How does PACVD work?
What is the basic principle of CVD?
What is RF PECVD?
Which gas is used in CVD process?
There are tremendous gas sources can be used in the CVD process, the common chemical reactions of CVD includes Pyrolysis, photolysis, reduction, oxidation, redox,so the gases involved in these chemical reactions can be used in the CVD process.
We take CVD Graphene growth for an example, the gases used in the CVD process will be CH4,H2,O2 and N2.
What is PECVD used for?
What is the application for tube furnace?
Tubular furnace is mainly used in metallurgy, glass, heat treatment, lithium anode and cathode materials, new energy, abrasives and other industries, and is a professional equipment for measuring materials under certain temperature conditions.
Tube furnace features simple structure, easy operation, easy control and continuous production.
Tube furnace is also widely applied in the CVD (chemical vapor deposition) and plasma enhanced CVD systems.
What is thin film deposition equipment?
What types of CVD materials are available?
What is Mpcvd machine?
PACVD is PECVD?
What are the different types of CVD method?
How does RF PECVD work?
What is the advantage of CVD system?
- Wide range of films can be produced, metal film, nonmetal film and multi-component alloy film as required. At the same time, it can prepare high-quality crystals that are difficult to obtain by other methods, such as GaN, BP, etc.
- The film forming speed is fast, usually several microns per minute or even hundreds of microns per minute. It is possible to simultaneously deposit large quantities of coatings with uniform composition, which is incomparable to other film preparation methods, such as liquid phase epitaxy (LPE) and molecular beam epitaxy (MBE).
- The working conditions are carried out under normal pressure or low vacuum conditions, so the coating has good diffraction, and the workpieces with complex shapes can be uniformly coated, which is much superior to PVD.
- Due to the mutual diffusion of reaction gas, reaction product and substrate, a coating with good adhesion strength can be obtained, which is crucial for preparing surface strengthened films such as wear-resistant and anti-corrosion films.
- Some films grow at a temperature far lower than the melting point of the film material. Under the condition of low temperature growth, the reaction gas and reactor wall and impurities contained in them almost do not react, so a film with high purity and good crystallinity can be obtained.
- Chemical vapor deposition can obtain a smooth deposition surface. This is because compared with LPE, chemical vapor deposition (CVD) is carried out under high saturation, with high nucleation rate, high nucleation density, and uniform distribution on the whole plane, resulting in a macroscopic smooth surface. At the same time, in chemical vapor deposition, the average free path of molecules (atoms) is much larger than LPE, so the spatial distribution of molecules is more uniform, which is conducive to the formation of a smooth deposition surface.
- Low radiation damage, which is a necessary condition for manufacturing metal oxide semiconductors (MOS) and other devices
What are the advantages of PECVD?
How many different types tube furnace?
Tube furnace can work with different mechanical functions smoothly, so there are many different types tube furnace variations for different experiment purposes, typical furnace furnaces are as below:
- Horizontal tube furnace
- Vertical tube furnace
- Split tube furnace
- Rotary tube furnace
- Tilting tube furnace
- Sliding tube furnace
- Fast heating and cooling tube furnace
- Continuous feeding and discharging tube furnace
What is thin-film deposition technology?
How does CVD diamond enhance the performance of cutting tools?
What are the advantages of Mpcvd?
What are the advantages of using PACVD?
What are the advantages of using chemical vapor deposition machines?
What are the advantages of RF PECVD?
What does PECVD stand for?
PECVD is a technology that uses plasma to activate reaction gas, promote chemical reaction on the surface of substrate or near surface space, and generate solid film. The basic principle of plasma chemical vapor deposition technology is that under the action of RF or DC electric field, the source gas is ionized to form a plasma, the low-temperature plasma is used as the energy source, an appropriate amount of reaction gas is introduced, and the plasma discharge is used to activate the reaction gas and realize chemical vapor deposition.
According to the method of generating plasma, it can be divided into RF plasma, DC plasma and microwave plasma CVD, etc...
What is the difference between ALD and PECVD?
What are the advantages of using a tube furnace?
What are the advantages of using thin film deposition equipment?
What makes CVD diamond domes suitable for high-performance loudspeakers?
Are CVD diamonds real or fake?
What are the common applications of PACVD?
What are the applications of chemical vapor deposition machines?
What is the difference between CVD and PECVD?
The difference between PECVD and traditional CVD technology is that the plasma contains a large number of high-energy electrons, which can provide the activation energy required in the chemical vapor deposition process, thus changing the energy supply mode of the reaction system. Since the electron temperature in the plasma is as high as 10000K, the collision between electrons and gas molecules can promote the chemical bond breaking and recombination of the reaction gas molecules to generate more active chemical groups, while the whole reaction system maintains a lower temperature.
So compared to the CVD process, PECVD can carry out the same chemical vapor deposition process with a lower temperature.
What is the difference between PECVD and sputtering?
What safety precautions should be taken when using a tube furnace?
What factors should be considered when selecting thin film deposition equipment?
How does CVD diamond improve thermal management in electronic devices?
What factors should be considered when selecting a PACVD system?
What factors should be considered when selecting a chemical vapor deposition machine?
What safety considerations are associated with operating thin film deposition equipment?
Can chemical vapor deposition machines be used for multi-layered thin film deposition?
4.9
out of
5
KT-CTF16 is a great furnace, it offers high-quality CVD processing with precise temperature control and customizable setups. The customer service is also top-notch, highly recommended!
4.8
out of
5
The furnace is very versatile and can be used for a variety of applications. The temperature control is accurate and the overall performance is excellent. I highly recommend this furnace to anyone who needs a reliable and versatile CVD system.
4.7
out of
5
The furnace has been a great addition to our lab. It's easy to use and maintain, and the results have been excellent. We've been able to produce high-quality materials with ease.
4.9
out of
5
The KT-CTF16 is a fantastic furnace. It's easy to use and the temperature control is very precise. We've been able to produce high-quality materials with ease. I would highly recommend this furnace to anyone who needs a reliable and versatile CVD system.
4.8
out of
5
This furnace is an excellent choice for anyone who needs a versatile and reliable CVD system. It's easy to use and maintain, and the results have been consistent and of high quality. I highly recommend this furnace.
4.7
out of
5
The KT-CTF16 is a great furnace for a variety of applications. It's easy to use and maintain, and the results have been excellent. We've been able to produce high-quality materials with ease.
4.9
out of
5
This furnace is a great investment. It's well-made and has a lot of features that make it easy to use. The customer service is also excellent. I would definitely recommend this furnace to anyone who needs a reliable and versatile CVD system.
4.8
out of
5
The furnace arrived quickly and was easy to set up. It's been working great so far and I'm very happy with it. The customer service has also been excellent.
4.7
out of
5
This furnace is a great value for the price. It's well-made and has a lot of features that make it easy to use. The customer service is also excellent. I would definitely recommend this furnace to anyone who needs a reliable and versatile CVD system.
4.9
out of
5
The KT-CTF16 is a great furnace. It's easy to use and the temperature control is very precise. We've been able to produce high-quality materials with ease. I would highly recommend this furnace to anyone who needs a reliable and versatile CVD system.
4.8
out of
5
This furnace is an excellent choice for anyone who needs a versatile and reliable CVD system. It's easy to use and maintain, and the results have been consistent and of high quality. I highly recommend this furnace.
4.7
out of
5
The KT-CTF16 is a great furnace for a variety of applications. It's easy to use and maintain, and the results have been excellent. We've been able to produce high-quality materials with ease.
4.9
out of
5
This furnace is a great investment. It's well-made and has a lot of features that make it easy to use. The customer service is also excellent. I would definitely recommend this furnace to anyone who needs a reliable and versatile CVD system.
4.8
out of
5
The furnace arrived quickly and was easy to set up. It's been working great so far and I'm very happy with it. The customer service has also been excellent.
4.7
out of
5
This furnace is a great value for the price. It's well-made and has a lot of features that make it easy to use. The customer service is also excellent. I would definitely recommend this furnace to anyone who needs a reliable and versatile CVD system.
4.9
out of
5
The KT-CTF16 is a great furnace. It's easy to use and the temperature control is very precise. We've been able to produce high-quality materials with ease. I would highly recommend this furnace to anyone who needs a reliable and versatile CVD system.
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