CVD & PECVD Furnace
Chemical Vapor Deposition CVD Equipment System Chamber Slide PECVD Tube Furnace with Liquid Gasifier PECVD Machine
Item Number : KT-PE12
Price varies based on specs and customizations
- Max. temperature
- 1200 ℃
- Constant work temperature
- 1100 ℃
- Furnace tube diameter
- 60 mm
- Heating zone length
- 1x450 mm
- Heating rate
- 0-20 ℃/min
- Sliding distance
- 600mm
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Introduction
The Slide PECVD Tube Furnace With Liquid Gasifier PECVD Machine is a versatile and high-performance system designed for a wide range of thin film deposition applications. It features a 500W RF plasma source, slide-out furnace, precise gas flow control, and a vacuum station. The system offers advantages such as automatic plasma matching, high-speed heating and cooling, programmable temperature control, and a user-friendly interface. It is widely used in research and production environments for depositing thin films in various industries, including electronics, semiconductors, and optics.
Applications
Slide PECVD Tube Furnace With Liquid Gasifier PECVD Machine finds its applications in:
- Chemical Vapor Deposition (CVD)
- Plasma Enhanced Chemical Vapor Deposition (PECVD)
- Thin film deposition
- Solar cell fabrication
- Semiconductor processing
- Nanotechnology
- Materials science
- Research and development
Different temperature and setup CVD systems available
Principle
The Slide PECVD Tube Furnace With Liquid Gasifier PECVD Machine employs low-temperature plasma to generate a glow discharge in the process chamber's cathode (sample tray). The glow discharge (or another heat source) raises the sample's temperature to a predetermined level. Then, controlled amounts of process gas are introduced, undergoing chemical and plasma reactions to form a solid film on the sample's surface.
Features
The Slide PECVD Tube Furnace With Liquid Gasifier PECVD Machine offers numerous benefits to users:
- Enhanced power generation for solar cell wafers: The innovative graphite boat structure significantly improves the power output of solar cells.
- Elimination of color difference in tubular PECVD cells: This equipment effectively addresses the issue of color variation in tubular PECVD cells.
- Wide output power range (5-500W): The RF plasma automatic matching source provides a versatile range of output power, ensuring optimal performance for various applications.
- High-speed heating and cooling: The furnace chamber sliding system enables rapid heating and cooling, reducing processing time. Auxiliary forced air circulation further accelerates the cooling rate.
- Automated sliding movement: The optional sliding movement feature allows for automatic operation, enhancing efficiency and reducing manual intervention.
- Precise temperature control: PID programmable temperature control ensures accurate temperature regulation, supporting remote and centralized control for added convenience.
- High-accuracy MFC mass flowmeter control: The MFC mass flowmeter precisely controls source gases, ensuring a stable and consistent gas supply.
- Versatile vacuum station: The stainless steel vacuum flange with multiple adapting ports accommodates various vacuum pump station configurations, ensuring a high vacuum degree.
- User-friendly interface: The CTF Pro 7-inch TFT touch screen controller simplifies program setting and allows for easy analysis of historical data.
Advantages
- RF plasma automatic matching source, wide 5-500W output power range stable output
- Furnace chamber sliding system for high speed heating and short time cooling, auxiliary fast cooling and automatic sliding movement are available
- PID programmable temperature control,excellent control accuracy and support remote control and centralized control
- High accuracy MFC mass flowmeter control, source gases premixing and stable gas supply speed
- Stainless steel vacuum flange with various adapting port to meet different vacuum pump station setup, good sealing and high vacuum degree
- CTF Pro applies one 7 inches TFT touch screen controller, more friendly program setting and history data analysis
Safety Advantage
- Kindle Tech tube furnace owns over current protection and over temperature alarming function, furnace will turn off the power automatically
- Furnace build in thermal couple detecting function, furnace will stop heating and alarm will be on once broken or failure detected
- PE Pro support power failure restarting function,furnace will resume the furnace heating program when power is incoming after failure
Technical specifications
| Furnace model | KT-PE12-60 |
| Max. temperature | 1200℃ |
| Constant work temperature | 1100℃ |
| Furnace tube material | High purity quartz |
| Furnace tube diameter | 60mm |
| Heating zone length | 1x450mm |
| Chamber material | Japan alumina fiber |
| Heating element | Cr2Al2Mo2 wire coil |
| Heating rate | 0-20℃/min |
| Thermal couple | Build in K type |
| Temperature controller | Digital PID controller/Touch screen PID controller |
| Temperature control accuracy | ±1℃ |
| Sliding distance | 600mm |
| RF Plasma unit | |
| Output Power | 5 -500W adjustable with ± 1% stability |
| RF frequency | 13.56 MHz ±0.005% stability |
| Reflection Power | 350W max. |
| Matching | Automatic |
| Noise | <50 dB |
| Cooling | Air cooling. |
| Gas precise control unit | |
| Flow meter | MFC mass flow meter |
| Gas channels | 4 channels |
| Flow rate | MFC1: 0-5SCCM O2 MFC2: 0-20SCMCH4 MFC3: 0- 100SCCM H2 MFC4: 0-500 SCCM N2 |
| Linearity | ±0.5% F.S. |
| Repeatability | ±0.2% F.S. |
| Pipe line and valve | Stainless steel |
| Maximum Operating Pressure | 0.45MPa |
| Flow meter controller | Digital Knob controller/Touch screen controller |
| Standard vacuum unit(Optional) | |
| Vacuum pump | Rotary vane vacuum pump |
| Pump flow rate | 4L/S |
| Vacuum suction port | KF25 |
| Vacuum gauge | Pirani/Resistance silicon vacuum gauge |
| Rated vacuum pressure | 10Pa |
| High vacuum unit(Optional) | |
| Vacuum pump | Rotary vane pump+Molecular pump |
| Pump flow rate | 4L/S+110L/S |
| Vacuum suction port | KF25 |
| Vacuum gauge | Compound vacuum gauge |
| Rated vacuum pressure | 6x10-4Pa |
| Above specifications and setups can be customized | |
Standard Package
| No. | Description | Quantity |
| 1 | Furnace | 1 |
| 2 | Quartz tube | 1 |
| 3 | Vacuum flange | 2 |
| 4 | Tube thermal block | 2 |
| 5 | Tube thermal block hook | 1 |
| 6 | Heat resistant glove | 1 |
| 7 | RF plasma source | 1 |
| 8 | Precise gas control | 1 |
| 9 | Vacuum unit | 1 |
| 10 | Operation manual | 1 |
Optional Setup
- In tube gases detecting and monitoring,like H2, O2 and so on
- Independent furnace temperature monitoring and recording
- RS 485 communication port for PC remote control and data exporting
- Insert gases feeding flow rate control,like mass flowmeter and float flowmeter
- Touch screen temperature controller with versatile operator friendly functions
- High vacuum pump station setups, like vane vacuum pump,molecular pump,diffusion pump
Warnings
Operator safety is the top important issue! Please operate the equipment with cautions. Working with inflammable& explosive or toxic gases is very dangerous, operators must take all necessary precautions before starting the equipment. Working with positive pressure inside the reactors or chambers is dangerous, operator must fellow the safety procedures strictly. Extra caution must also be taken when operating with air-reactive materials, especially under vacuum. A leak can draw air into the apparatus and cause a violent reaction to occur.
Designed for You
KinTek provide deep custom made service and equipment to worldwide customers, our specialized teamwork and rich experienced engineers are capable to undertake the custom tailoring hardware and software equipment requirements, and help our customer to build up the exclusive and personalized equipment and solution!
Would you please drop your ideas to us, our engineers are ready for you now!
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FAQ
What Is PECVD Method?
What Is Mpcvd?
What Is PECVD Used For?
What Is Mpcvd Machine?
What Are The Advantages Of PECVD?
What Are The Advantages Of Mpcvd?
What Is The Difference Between ALD And PECVD?
Are CVD Diamonds Real Or Fake?
What Is The Difference Between PECVD And Sputtering?
4.9 / 5
The speed of this system is phenomenal! High-speed heating and cooling has drastically cut our research time. A game-changer for our lab.
4.8 / 5
Incredible value for such advanced tech. The precise gas flow control and RF plasma source deliver production-grade results in our R&D.
4.9 / 5
The build quality is exceptional. The stainless steel vacuum flange and safety features give us complete peace of mind during long runs.
4.7 / 5
A workhorse! The automated sliding movement and robust construction suggest this machine will be a cornerstone of our work for years.
4.9 / 5
The technological leap is real. The automatic plasma matching and touch screen interface make complex depositions surprisingly straightforward.
4.8 / 5
Arrived faster than expected and set up was a breeze. The user-friendly interface had us running experiments on day one.
4.7 / 5
Outstanding performance for the price. The consistent film quality we achieve on solar cells is directly attributable to this machine's precision.
4.9 / 5
The durability is impressive. It handles continuous operation in our semiconductor processing line without a hiccup. A truly reliable investment.
4.8 / 5
A marvel of engineering. The slide-out furnace for fast cooling is a brilliant feature that boosts our lab's overall efficiency significantly.
4.9 / 5
Top-tier advancement. The ability to eliminate color difference in our PECVD cells has elevated the quality of our entire product line.
4.7 / 5
Speed and quality in one package. The rapid processing time doesn't compromise the exceptional thin film results. Highly recommended.
4.8 / 5
Worth every penny. The versatility for nanotechnology and materials science research is unmatched by any other system we've used.
4.9 / 5
The attention to detail in safety and control is superb. The power failure restart function alone has saved us countless hours of work.
4.8 / 5
Seamless integration into our workflow. The remote control capabilities and data export make analysis and reporting incredibly efficient.
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