Products Thermal Equipment MPCVD Bell-jar Resonator MPCVD Diamond Machine for lab and diamond growth
Bell-jar Resonator MPCVD Diamond Machine for lab and diamond growth

MPCVD

Bell-jar Resonator MPCVD Diamond Machine for lab and diamond growth

Item Number : KTMP315

Price varies based on specs and customizations


Microwave Power
Microwave frequency 2450±15MHZ
Output power
1~10 KW continuously adjustable
Microwave leakage
≤2MW/cm2
Output wave guide interface
WR340, 430 with FD-340, 430 standard flange
Sample holder
Diameter of sample table≥70mm, effective use area≥64 mm
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MPCVD means Microwave Plasma Chemical Vapor Deposition. It grows quality diamond films in labs using carbon gas and microwave plasma.

MPCVD System

MPCVD is a system for depositing thin films onto a substrate using a vacuum chamber, microwave generator, and gas delivery system. A plasma is generated inside the chamber by a magnetron or klystron generating microwaves at 2.45 GHz. The gas delivery system has MFCs calibrated in sccm to control gas flow. The substrate temperature is controlled by the plasma and measured by a thermocouple. The plasma heats the substrate and the temperature is monitored during deposition.

Applications

MPCVD shows promise for producing large, high-quality diamonds at a low cost. 

Diamond's unique properties, such as hardness, stiffness, high thermal conductivity, low thermal expansion, radiation-hardness, and chemical inertness, make it a valuable material. However, the high cost, limited size, and difficulty controlling impurities of natural and synthetic high-pressure, high-temperature diamonds have limited their applications.

MPCVD is the primary equipment for growing diamond gemstones and films, which can be either monocrystal or poly-crystalline. The semi-conductor industry uses diamond film growth extensively for large-size diamond substrates, as well as the diamond cutting or drilling tools industry. 

Compared to the HPHT method for lab-grown diamonds, the microwave CVD method is advantageous for large-sized diamond growth at a lower cost, making it an ideal solution for semi-conductor diamonds, optics diamond growth, and the large jewelry diamond market.

KINTEK MPCVD machines
KINTEK MPCVD machines
New model MPCVD diamond machine
New model KINTEK MPCVD diamond machine
New model MPCVD diamond machine
New model KINTEK MPCVD diamond machine
Rough diamonds grown by MPCVD
Rough diamonds grown by KINTEK MPCVD diamond machine
In KinTek MPCVD Machine, diamonds are growing
In KinTek MPCVD Machine, diamonds are growing
In KinTek MPCVD Machine, diamonds are growing
In KinTek MPCVD Machine, diamonds are growing
In KinTek MPCVD Machine, diamonds are growing
In KinTek MPCVD Machine, diamonds are growing
In KinTek MPCVD Machine, diamonds are growing
In KinTek MPCVD Machine, diamonds are growing
In KinTek MPCVD Machine, diamonds are growing
In KinTek MPCVD Machine, diamonds are growing
Rough diamond grown by KINTEK MPCVD machine
Rough diamond grown by KINTEK MPCVD machine
Rough diamond grown by KINTEK MPCVD machine
Rough diamond grown by KINTEK MPCVD machine
Rough diamond grown by KINTEK MPCVD machine
Rough diamond grown by KINTEK MPCVD machine
MPCVD grown diamonds after polishing
MPCVD grown diamonds after polishing
Polycrystalline by KinTek MPCVD
Polycrystalline by KinTek MPCVD

Advantages of MPCVD

MPCVD is a diamond synthesis method with advantages over HFCVD and DC-PJ CVD. It avoids contamination and allows for multiple gases. It offers smooth microwave power adjustment and stable temperature control, avoiding seed crystal loss. MPCVD is promising for industrial applications due to a large, stable plasma area.

MPCVD produces purer diamonds using less energy than HPHT. It also enables production of larger diamonds.

Advantages of Our MPCVD System

We have been deeply involved in the industry for many years, and as a result, we have a vast customer base who trust and use our equipment. Our MPCVD equipment has been running steadily for over 40,000 hours, demonstrating exceptional stability, reliability, repeatability, and cost-effectiveness. More advantages of our MPCVD system include:

  • 3 inches substrate growing area, max. batch load up to 45 pieces diamonds
  • 1-10Kw adjustable output microwave power for less electricity consumption
  • Rich experienced researching team with frontier diamond growing recipe support
  • Exclusive technical support program for Zero diamond growing experience team

By leveraging our accumulated advanced technology, we have implemented multiple rounds of upgrades and improvements to our MPCVD system, resulting in significantly improved efficiency and reduced equipment costs. As a result, our MPCVD equipment is at the forefront of technological advancements and offered at a competitive price. Welcome to consult with us.

KinTek MPCVD Simulation
KinTek MPCVD Simulation

Working Processing

The MPCVD machine controls the flow of each gas path and cavity pressure while introducing reactant gases (such as CH4, H2, Ar, O2, N2, etc.) into the cavity under specific pressure. After stabilizing the airflow, the 6KW solid-state microwave generator generates microwaves that are then introduced into the cavity through the waveguide.

The reaction gas transforms into a plasma state under the microwave field, forming a plasma ball that hovers above the diamond substrate. The high temperature of the plasma heats the substrate to a specific temperature. Excess heat produced in the cavity is dissipated by the water cooling unit.

To ensure optimal growth conditions during the MPCVD single crystal diamond growth process, we adjust factors such as power, gas source composition, and cavity pressure. Furthermore, since the plasma ball doesn't contact the cavity wall, the diamond growth process is free from impurities, thereby enhancing the diamond's quality.

Detail & Parts

Microwave system

Microwave system

Reaction chamber

Reaction chamber

Gas flow system

Gas flow system

Vacuum and sensor system

Vacuum and sensor system

Technical specifications

Microwave system
  • Microwave frequency 2450±15MHZ,
  • Output power 1~10 KW continuously adjustable
  • Microwave output power stability: <±1%
  • Microwave leakage ≤2MW/cm2
  • Output wave guide interface: WR340, 430 with FD-340, 430 standard flange
  • Cooling water flow: 6-12L/min
  • System standing wave coefficient: VSWR ≤ 1.5
  • Microwave manual 3 pin adjuster, excitation cavity, high-power load
  • Input power supply: 380VAC/50Hz ± 10%, three-phase
Reaction chamber
  • Vacuum leakage rate<5 × 10-9 Pa .m3/s
  • The limit pressure is less than 0.7 Pa(Standard setup with Pirani vacuum gauge)
  • The pressure rise of chamber shall not exceed 50Pa after 12 hours of pressure maintaining
  • Working mode of reaction chamber: TM021 or TM023 mode
  • Cavity type: Butterfly resonant cavity, with maximum bearing power of 10KW, made of 304 stainless steel, with water-cooled inter-layer, and high purity quartz plate sealing method.
  • Air intake mode: Top annular uniform air intake
  • Vacuum sealing: The bottom connection of the main chamber and the injection door are sealed with rubber rings, the vacuum pump and bellows are sealed with KF, the quartz plate is sealed with a metal C-ring, and the rest are sealed with CF
  • Observation and temperature measurement window: 4 observation ports 
  • Sample load port in front of chamber
  • Stable discharge within the pressure range of 0.7KPa~30KPa (the power pressure shall be matched)
Sample holder
  • Diameter of sample table≥70mm, effective use area≥64 mm
  • Base plate platform water-cooled sandwich structure
  • Sample holder can be lifted and lowered evenly electrically in the cavity
Gas flow system
  • All metal welding air disk
  • Welding or VCR joints shall be used for all internal gas circuits of the equipment.
  • 5 channels MFC flow meter, H2/CH4/O2/N/Ar. H2: 1000 sccm ;CH4:100 sccm; O2: 2 sccm; N2: 2 sccm; Ar: 10 sccm
  • Working press 0.05-0.3MPa, accuracy ±2%
  • Independent Pneumatic valve control for each channel flow meter
Cooling system
  • 3 lines water cooling, real-time monitoring of temperature and flow.
  • The system cooling water flow is ≤ 50L/min
  • The cooling water pressure is<4KG, and the inlet water temperature is 20-25 ℃.
Temperature sensor
  • The external infrared thermometer has a temperature range of 300-1400 ℃
  • Temperature control accuracy < 2 ℃ or 2%
Control system
  • Siemens smart 200 PLC and touch screen control are adopted.
  • The system has a variety of programs, which can realize the automatic balance of growth temperature, accurate control of growth air pressure, automatic temperature rise, automatic temperature drop and other functions.
  • The stable operation of the equipment and comprehensive protection of the equipment can be achieved through the monitoring of water flow, temperature, pressure and other parameters, and the reliability and safety of the operation can be guaranteed through functional interlocking.
Optional function
  • Center monitoring system
  • Substrate basing power

Warnings

Operator safety is the top important issue! Please operate the equipment with cautions. Working with inflammable& explosive or toxic gases is very dangerous, operators must take all necessary precautions before starting the equipment. Working with positive pressure inside the reactors or chambers is dangerous, operator must fellow the safety procedures strictly. Extra caution must also be taken when operating with air-reactive materials, especially under vacuum. A leak can draw air into the apparatus and cause a violent reaction to occur.

Designed for You

KinTek provide deep custom made service and equipment to worldwide customers, our specialized teamwork and rich experienced engineers are capable to undertake the custom tailoring hardware and software equipment requirements, and help our customer to build up the exclusive and personalized equipment and solution!

Would you please drop your ideas to us, our engineers are ready for you now!

FAQ

What Is Mpcvd?

MPCVD stands for Microwave Plasma Chemical Vapor Deposition and it is a process of depositing thin films onto a surface. It uses a vacuum chamber, microwave generator, and gas delivery system to create a plasma made up of reacting chemicals and necessary catalysts. MPCVD is heavily used in the ANFF network to deposit layers of diamond using methane and hydrogen to grow new diamond on a diamond-seeded substrate. It is a promising technology for producing low-cost, high-quality large diamonds and is extensively used in the semiconductor and diamond cutting industry.

What Is CVD Diamond Machine?

A CVD diamond machine is a device used to produce synthetic diamonds through a process called Chemical Vapor Deposition (CVD). This process involves the precipitation of chemical vapors to create a diamond, which has properties that are equivalent to natural diamonds. CVD diamond machines including filament-assisted thermal CVD, plasma-enhanced CVD, and combustion-flame assisted CVD etc. The resulting CVD diamonds are useful in the cutting tools industry due to their high hardness and long-lasting tool life, making them an important and cost-effective tool for cutting non-ferrous materials.

What Is Mpcvd Machine?

The MPCVD (Microwave Plasma Chemical Vapor Deposition) machine is a laboratory equipment used to grow high-quality diamond films. It uses a carbon-containing gas and a microwave plasma to create a plasma ball above the diamond substrate, which heats it to a specific temperature. The plasma ball doesn't contact the cavity wall, making the diamond growth process free from impurities and enhancing the diamond's quality. The MPCVD system consists of a vacuum chamber, a microwave generator, and a gas delivery system that controls the flow of gas into the chamber.

How Does A CVD Diamond Machine Work?

CVD diamond machines work by introducing a mixture of gases, typically methane and hydrogen, into a vacuum chamber. The gases are then activated using a variety of techniques such as microwave plasma or hot filament, which breaks down the molecules and releases carbon atoms. These carbon atoms then settle on the substrate, building up layer by layer to form a synthetic diamond.

What Are The Advantages Of Mpcvd?

MPCVD has several advantages over other methods of diamond production, such as higher purity, less energy consumption, and the ability to produce larger diamonds.

What Are The Advantages Of Using CVD Diamond Machines?

CVD diamond machines offer several advantages over other methods of diamond production. Firstly, they allow for the creation of high-quality, near-flawless diamonds with precise control over their shape, size, and clarity. These machines also enable the production of diamonds with specific properties, such as color or electrical conductivity, by introducing appropriate dopant gases during the deposition process. Additionally, CVD diamond machines are more environmentally friendly compared to traditional diamond mining, as they minimize the social and environmental impacts associated with diamond extraction.

Are CVD Diamonds Real Or Fake?

CVD diamonds are real diamonds and not fake. They are grown in a laboratory through a process called Chemical Vapor Deposition (CVD). Unlike natural diamonds that are mined from under the earth's surface, CVD diamonds are created using advanced technology in labs. These diamonds are 100% carbon and are the purest form of diamonds known as Type IIa diamonds. They have the same optical, thermal, physical, and chemical properties as natural diamonds. The only difference is that CVD diamonds are created in a lab and not mined from the earth.

What Considerations Should Be Made When Selecting A CVD Diamond Machine?

When selecting a CVD diamond machine, several factors should be considered. Firstly, the size and capacity of the machine should align with the intended production requirements. The deposition chamber size should accommodate the desired substrate dimensions and allow for scalability. The control and automation capabilities of the machine should also be assessed to ensure ease of operation and reproducibility. Additionally, the machine's heating and activation methods should be evaluated for efficiency and uniformity of diamond growth. It is also important to consider the availability of technical support, maintenance services, and the overall cost of ownership. Consulting with manufacturers and experts in the field can help in selecting the most suitable CVD diamond machine for specific production needs.

What Are The Common Applications Of Diamonds Produced By CVD Diamond Machines?

Diamonds produced by CVD diamond machines have a wide range of applications. They are commonly used in jewelry, as they offer the same beauty and durability as natural diamonds. CVD diamonds are also highly valued in industrial applications, such as cutting tools, abrasives, and heat sinks, due to their exceptional hardness and thermal conductivity. They are used in the electronics industry for high-performance electronic devices, such as high-power transistors and radiation detectors. CVD diamonds are also finding applications in the medical field, including surgical tools, optical components, and as coatings for implants due to their biocompatibility.
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The durability of the equipment is remarkable. It's built to withstand the rigors of daily use in a lab setting and shows no signs of wear or tear.

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