Split Chamber CVD Tube Furnace with Vacuum Station Chemical Vapor Deposition System Equipment Machine

Introduction

The Split Chamber CVD Tube Furnace With Vacuum Station is a versatile and high-performance laboratory equipment designed for chemical vapor deposition (CVD) applications. It features a split furnace chamber that allows for easy access to reaction samples and rapid cooling. The furnace tube is made of high-temperature quartz and has a diameter of 60 mm. The system includes a 4-channel MFC mass flow meter with source gases of CH4, H2, O2, and N2, providing precise control over gas flow rates. The vacuum station features a 4L/S rotary vane vacuum pump, achieving a maximum vacuum pressure of 10 Pa. With its advanced features and capabilities, the Split Chamber CVD Tube Furnace With Vacuum Station is an ideal choice for various research and development applications in materials science, semiconductor processing, and other fields.

Detail&Parts

Applications

The Split Chamber CVD Tube Furnace With Vacuum Station CVD Machine is a versatile and advanced piece of equipment designed for a variety of applications in the fields of material science, semiconductor manufacturing, and research and development. This machine is particularly useful for processes that require precise control over temperature, gas flow, and vacuum levels, making it an essential tool for high-quality material synthesis and processing.

• Nanomaterial Synthesis: The furnace is ideal for the growth of nanowires, nanofilms, and other nanostructured materials, which are crucial in the development of advanced electronic and optoelectronic devices.
• Vacuum Coating: It is extensively used for the deposition of thin films on various substrates, including metal films, ceramic films, and composite films, which are essential for enhancing the properties of materials in applications such as optics and electronics.
• Battery Material Processing: The furnace is suitable for the drying and sintering of battery materials, which is a critical step in the production of high-performance batteries.
• Material Drying and Sintering: It is used in the high-temperature sintering of ceramics, refractory materials, and specialty materials, ensuring the consolidation and densification of these materials.
• Atmosphere and Vacuum Heat Treatment: The vertical tube furnace configuration allows for quenching, annealing, and tempering of small steel parts, as well as vertical CVD coating, making it a valuable asset in metallurgical processes.
• Research and Development: It is widely used in universities, research institutes, and industrial and mining enterprises for conducting high-temperature experiments, atmosphere sintering, reducing atmosphere, and CVD/CVI experiments, contributing to the advancement of material science and technology.

Features

The Split Chamber CVD Tube Furnace With Vacuum Station CVD Machine is a sophisticated piece of equipment designed for advanced chemical vapor deposition (CVD) processes. This furnace integrates cutting-edge technology to enhance the efficiency and quality of film deposition, making it ideal for research and industrial applications. Here are the key features and their benefits:

• High Film Deposition Rate: Utilizing radio frequency glow technology, this furnace significantly boosts the film deposition rate, reaching up to 10Å/S. This rapid deposition is crucial for high-throughput production and research, saving time and increasing productivity.
• Large Area Uniformity: With advanced multi-point RF feed technology and specialized gas path distribution, the furnace ensures film uniformity of up to 8%. This uniformity is essential for creating consistent and high-quality coatings across large substrates, enhancing the reliability of the materials produced.
• Consistent Deposition: The design incorporates advanced semiconductor industry concepts, resulting in a deviation of less than 2% between substrates. This high level of consistency is vital for applications requiring precise and repeatable results, such as in the production of electronic components.
• Stable Process Control: The equipment's high stability ensures the continuity and consistency of the CVD process. This reliability is critical for maintaining process integrity and reducing the risk of defects or failures during operation.
• Intelligent Control System: Patented by Bonage, the integrated control system includes a high-performance temperature control system that uses a closed-loop negative feedback mechanism. This system, combined with high-quality imported electrical components, enhances the overall performance and reliability of the equipment, making it virtually maintenance-free.
• Versatile Applications: Suitable for depositing various types of films, including metal, ceramic, and composite films, the furnace supports continuous growth processes and can be easily expanded with additional functions like plasma cleaning and etching. This versatility makes it a valuable asset for diverse research and production needs.

Principle

The Split Chamber CVD Tube Furnace With Vacuum Station CVD Machine is a high-temperature vacuum furnace used for chemical vapor deposition (CVD) processes. CVD is a process in which a thin film of material is deposited on a substrate by the chemical reaction of a gas or vapor. The Split Chamber CVD Tube Furnace With Vacuum Station CVD Machine uses a split furnace chamber to allow for easy access to the substrate during the CVD process. The vacuum station is used to create a vacuum in the furnace chamber, which helps to remove impurities and improve the quality of the deposited film.

Advantages

• Intuitive sample observation and rapid cooling: Split furnace chamber allows for direct observation of reaction samples and quick cooling.
• High temperature capability: Max working temperature of up to 1200℃ for versatile applications.
• Precise gas control: 4-channel MFC mass flow meter with CH4, H2, O2, and N2 sources ensures accurate and stable gas supply.
• Vacuum compatibility: Vacuum station with a 4L/S rotary vane vacuum pump achieves a maximum vacuum pressure of up to 10Pa, enabling various vacuum processes.
• High-speed heating and cooling: Furnace chamber sliding system facilitates rapid heating and cooling for efficient sample processing.
• Advanced temperature control: PID programmable temperature control with excellent accuracy, remote control, and centralized control capabilities.
• User-friendly interface: CTF Pro controller with a 7-inch TFT touch screen offers intuitive program setting and data analysis.
• Versatile vacuum setup: Stainless steel vacuum flange with adaptable ports accommodates different vacuum pump stations for customized vacuum environments.
• Energy efficiency: Water cooling system and gas afterflow design minimize energy consumption.
• Wide applicability: Suitable for CVD, diffusion, and other thermo-treatments under vacuum and atmosphere protection.

Safety Advantage

• Kindle Tech tube furnace owns over current protection and over temperature alarming function, furnace will turn off the power automatically
• Furnace build in thermal couple detecting function, furnace will stop heating and alarm will be on once broken or failure detected
• KT-CTF12 Pro support power failure restarting function,furnace will resume the furnace heating program when power is incoming after failure

Technical specifications

Standard Package

Optional Setup

• In tube gases detecting and monitoring,like H2, O2 and so on
• Independent furnace temperature monitoring and recording
• RS 485 communication port for PC remote control and data exporting
• Insert gases feeding flow rate control,like mass flowmeter and float flowmeter
• Touch screen temperature controller with versatile operator friendly functions
• High vacuum pump station setups, like vane vacuum pump,molecular pump,diffusion pump

Warnings

Operator safety is the top important issue! Please operate the equipment with cautions. Working with inflammable& explosive or toxic gases is very dangerous, operators must take all necessary precautions before starting the equipment. Working with positive pressure inside the reactors or chambers is dangerous, operator must fellow the safety procedures strictly. Extra caution must also be taken when operating with air-reactive materials, especially under vacuum. A leak can draw air into the apparatus and cause a violent reaction to occur.

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