Tube Furnace
Vertical Laboratory Tube Furnace
Item Number : KT-VTF
Price varies based on specs and customizations
- Max. temperature
- 1800℃
- Furnace tube diameter
- 50 / 60 / 80 / 100 mm
- Heating zone length
- 300 / 450 / 600 / 800 mm
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Introduction
Vertical tube furnaces are high-performance laboratory equipment used for precision high-temperature processing under controlled atmospheric conditions. They consist of a vertically oriented ceramic or quartz process tube enclosed within a heating chamber, a design that optimizes space and prevents tube sagging at extreme temperatures. These furnaces are commonly employed for specialized applications including heat treatment, gravity-assisted quenching, annealing, crystal growth, and chemical vapor deposition (CVD). With advanced features such as programmable PID controllers, vacuum sealing, and customized flanges for gas-phase reactions, vertical tube furnaces offer exceptional versatility and accuracy. Their ability to maintain high thermal uniformity and controlled atmospheres makes them essential tools in semiconductor research, materials science, and advanced industrial R&D.
Applications
Vertical tube furnaces are versatile heating devices with a wide range of applications in various industries and laboratory settings. They are particularly useful for processes that require precise temperature control and the ability to operate under vacuum or controlled gas atmospheres.
- Gas Quenching Tests: Vertical tube furnaces are commonly used for gas quenching tests, where samples are rapidly cooled from high temperatures into a quenching medium such as ice water or oil. This allows researchers to study material phase transitions and the effects of rapid cooling on material properties.
- Heat Treatment: Vertical tube furnaces are used for a variety of heat treatment processes, including annealing, tempering, and stress relieving. These processes can improve the mechanical properties of materials, such as their strength, hardness, and ductility.
- Chemical Vapor Deposition (CVD): Vertical tube furnaces are used for CVD processes, where a thin film is deposited on a substrate by chemical reactions in a gaseous environment. This technique is commonly used in the semiconductor industry to create electronic devices.
- Crystal Growth: Vertical tube furnaces are used for crystal growth, where crystals are grown from a molten or vapor phase. This technique is used to produce high-quality crystals for use in optics, electronics, and other applications.
- Materials Testing: Vertical tube furnaces are used for materials testing, such as thermal conductivity measurements, melting point determinations, and phase transitions. These tests provide valuable information about the properties of materials.
- Other Applications: Vertical tube furnaces are also used in various other applications, including:
- Sintering
- Brazing
- Calcination
- Ceramics
- Glassworking
- Laboratory research
- Powders processing
Detail&Parts
2. Electronic digital display panel: accurate temperature control, preset multi-stage heat treatment process.
3. Alumina polycrystalline fiber hearth: high temperature resistance, long use without deformation, no cracking.
Principle
Vertical tube furnaces operate on the principle of radiant heat transfer. The heating element, typically made of molybdenum disilicide (MoSi2) or silicon carbide (SiC), is located around the vertical tube, emitting infrared radiation that is absorbed by the sample inside. This radiation heats the sample uniformly, providing precise and efficient temperature control. The furnace's design allows for rapid heating and cooling rates, making it suitable for various applications, including material synthesis, heat treatment, and temperature measurements.
Advantages
- Vertical tube furnaces are versatile heating devices with a wide range of applications in various industries and laboratory settings. They are particularly useful for processes that require precise temperature control and the ability to operate under vacuum or controlled gas atmospheres.
- Quenching Tests: Vertical tube furnaces are commonly used for quenching tests, where samples are rapidly cooled from high temperatures into a quenching medium (such as gas, ice water, or oil). This allows researchers to study material phase transitions and the effects of rapid cooling on material properties.
- Heat Treatment: Vertical tube furnaces are used for a variety of heat treatment processes, including annealing, tempering, and stress relieving. These processes can improve the mechanical properties of materials, such as their strength, hardness, and ductility.
- Chemical Vapor Deposition (CVD): Vertical tube furnaces are used for CVD processes, where a thin film is deposited on a substrate by chemical reactions in a gaseous environment. This technique is commonly used in the semiconductor industry to create electronic devices.
- Crystal Growth: Vertical tube furnaces are ideal for crystal growth, particularly using the Bridgman method. Crystals are grown from a molten or vapor phase. This technique produces high-quality single crystals essential for optics, electronics, and semiconductor applications.
- Materials Testing: Vertical tube furnaces are used for materials testing, such as thermal conductivity measurements, melting point determinations, and phase transitions. These tests provide valuable information about the properties of materials.
- Other Applications: Vertical tube furnaces are also used for:
- Sintering
- Brazing
- Calcination
- Ceramics Firing
- Glass working
- Laboratory research
- Powders processing
- Fluidize Bed Experiments
Safety Advantage
- KINTEK tube furnace owns over current protection and over temperature alarming function, furnace will turn off the power automatically once over current detected
- Furnace build in thermal couple detecting function, furnace will stop heating and alarm will be on once thermal couple broken or failure detected
- VTF Pro support power failure restarting function,furnace will resume the furnace heating program when power is incoming after failure
Technical specifications
| Furnace model | KT-VTF | KT-VTF PRO |
|---|---|---|
| Temperature controller | Digital PID controller | Touch screen PID controller |
| Multi program preset | no | yes |
| Power failure restarting | no | yes |
| Max. temperature | 1800℃ | |
| Furnace tube material | High grade Quartz/ Al2O3 alumina | |
| Furnace tube diameter | 50 / 60 / 80 / 100 mm | |
| Heating zone length | 300 / 450 / 600 / 800 mm | |
| Vacuum sealing solution | SS 304 flange with solid copper seal ring | |
| Rated vacuum pressure | 0.001Pa/10E5 torr | |
| Chamber material | Japan Al2O3 alumina fiber | |
| Heating element | Cr2Al2Mo2 wire coil/SiC/MoSi2 | |
| Thermal couple | K /S/B type | |
| Temperature control accuracy | ±1℃ | |
| Electric power supply | AC110-220V,50/60HZ | |
| Other furnace tube size and heating zone length can be customized | ||
Standard Package
| No. | Description | Quantity |
|---|---|---|
| 1 | Furnace | 1 |
| 2 | Alumina tube | 1 |
| 3 | Vacuum flange | 2 |
| 4 | Tube thermal block | 2 |
| 5 | Tube thermal block hook | 1 |
| 6 | Heat resistant glove | 1 |
| 7 | Operation manual | 1 |
Optional Setup
- In tube gases detecting and monitoring,like H2, O2 and so on
- Independent furnace temperature monitoring and recording
- RS 485 communication port for PC remote control and data exporting
- Insert gases feeding flow rate control,like mass flowmeter and float flowmeter
- Touch screen temperature controller with versatile operator friendly functions
- High vacuum pump station setups, like vane vacuum pump,molecular pump,diffusion pump
Warnings
Operator safety is the top important issue! Please operate the equipment with cautions. Working with inflammable& explosive or toxic gases is very dangerous, operators must take all necessary precautions before starting the equipment. Working with positive pressure inside the reactors or chambers is dangerous, operator must fellow the safety procedures strictly. Extra caution must also be taken when operating with air-reactive materials, especially under vacuum. A leak can draw air into the apparatus and cause a violent reaction to occur.
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FAQ
What Is A Tube Furnace?
Laboratory tube furnace is one classic external heating high temperature tube furnace, also named hot wall heating furnace.
According to the different working temperature, furnace tube material usually can be transparent quartz tubes, high purity alumina ceramic tubes and high strength metal alloy tubes.
To meet different thermal researching purposes, tube furnace can be designed with multi heating zones, so as to have a flexible control of temperature gradient in the tube working chamber; furnace tube can work with a controlled atmosphere working environment or a high vacuum working environment.
What Is CVD Furnace?
Chemical vapor deposition (CVD) is a technology that uses various energy sources such as heating, plasma excitation or light radiation to chemically react gaseous or vapor chemical substances on the gas phase or gas-solid interface to form solid deposits in the reactor by means of chemical reaction.To put it simply, two or more gaseous raw materials are introduced into a reaction chamber, and then they react with each other to form a new material and deposit it on the substrate surface.
CVD furnace is one combined furnace system with high temperature tube furnace unit,gases control unit, and vacuum unit, it is widely used for experiment and production of composite material preparation, microelectronics process, semiconductor optoelectronic, solar energy utilization, optical fiber communication, superconductor technology, protective coating field.
How Does A Tube Furnace Work?
Tube furnace heating elements are placed surrounding the cylindrical cavity, furnace can only heat the samples in the cylindrical cavity through indirect thermal radiation, since furnace tube can prevent sample material from contacting with furnace heating elements and insulation materials, so tube furnace creates a clean isolated heat chamber and reduce risks of the sample material contaminating by the furnace.
How Does CVD Furnace Work?
CVD furnace system consists of high temperature tube furnace unit, reacting gas source precise control unit, vacuum pump station and corresponding assembling parts.
Vacuum pump is to remove the air from the reacting tube,and make sure there is no unwanted gases inside the reaction tube, after that the tube furnace will heat the reaction tube to a target temperature, then reacting gas source precise control unit can introduce different gases with a set ratio into the furnace tube for the chemical reaction, the chemical vapor deposition will be formed in the CVD furnace.
What Is A Rotary Tube Furnace?
What Is The Application For Tube Furnace?
Tubular furnace is mainly used in metallurgy, glass, heat treatment, lithium anode and cathode materials, new energy, abrasives and other industries, and is a professional equipment for measuring materials under certain temperature conditions.
Tube furnace features simple structure, easy operation, easy control and continuous production.
Tube furnace is also widely applied in the CVD (chemical vapor deposition) and plasma enhanced CVD systems.
Which Gas Is Used In CVD Process?
There are tremendous gas sources can be used in the CVD process, the common chemical reactions of CVD includes Pyrolysis, photolysis, reduction, oxidation, redox,so the gases involved in these chemical reactions can be used in the CVD process.
We take CVD Graphene growth for an example, the gases used in the CVD process will be CH4,H2,O2 and N2.
How Does A Rotary Tube Furnace Work?
How Many Different Types Tube Furnace?
Tube furnace can work with different mechanical functions smoothly, so there are many different types tube furnace variations for different experiment purposes, typical furnace furnaces are as below:
- Horizontal tube furnace
- Vertical tube furnace
- Split tube furnace
- Rotary tube furnace
- Tilting tube furnace
- Sliding tube furnace
- Fast heating and cooling tube furnace
- Continuous feeding and discharging tube furnace
What Is The Advantage Of CVD System?
- Wide range of films can be produced, metal film, nonmetal film and multi-component alloy film as required. At the same time, it can prepare high-quality crystals that are difficult to obtain by other methods, such as GaN, BP, etc.
- The film forming speed is fast, usually several microns per minute or even hundreds of microns per minute. It is possible to simultaneously deposit large quantities of coatings with uniform composition, which is incomparable to other film preparation methods, such as liquid phase epitaxy (LPE) and molecular beam epitaxy (MBE).
- The working conditions are carried out under normal pressure or low vacuum conditions, so the coating has good diffraction, and the workpieces with complex shapes can be uniformly coated, which is much superior to PVD.
- Due to the mutual diffusion of reaction gas, reaction product and substrate, a coating with good adhesion strength can be obtained, which is crucial for preparing surface strengthened films such as wear-resistant and anti-corrosion films.
- Some films grow at a temperature far lower than the melting point of the film material. Under the condition of low temperature growth, the reaction gas and reactor wall and impurities contained in them almost do not react, so a film with high purity and good crystallinity can be obtained.
- Chemical vapor deposition can obtain a smooth deposition surface. This is because compared with LPE, chemical vapor deposition (CVD) is carried out under high saturation, with high nucleation rate, high nucleation density, and uniform distribution on the whole plane, resulting in a macroscopic smooth surface. At the same time, in chemical vapor deposition, the average free path of molecules (atoms) is much larger than LPE, so the spatial distribution of molecules is more uniform, which is conducive to the formation of a smooth deposition surface.
- Low radiation damage, which is a necessary condition for manufacturing metal oxide semiconductors (MOS) and other devices
What Are The Advantages Of A Rotary Tube Furnace?
What Is The Function Of Rotary Tube Furnace?
What Are The Advantages Of Using A Tube Furnace?
What Does PECVD Stand For?
PECVD is a technology that uses plasma to activate reaction gas, promote chemical reaction on the surface of substrate or near surface space, and generate solid film. The basic principle of plasma chemical vapor deposition technology is that under the action of RF or DC electric field, the source gas is ionized to form a plasma, the low-temperature plasma is used as the energy source, an appropriate amount of reaction gas is introduced, and the plasma discharge is used to activate the reaction gas and realize chemical vapor deposition.
According to the method of generating plasma, it can be divided into RF plasma, DC plasma and microwave plasma CVD, etc...
What Are The Advantages Of Rotary Tube Furnace?
What Safety Precautions Should Be Taken When Using A Tube Furnace?
What Is The Difference Between CVD And PECVD?
The difference between PECVD and traditional CVD technology is that the plasma contains a large number of high-energy electrons, which can provide the activation energy required in the chemical vapor deposition process, thus changing the energy supply mode of the reaction system. Since the electron temperature in the plasma is as high as 10000K, the collision between electrons and gas molecules can promote the chemical bond breaking and recombination of the reaction gas molecules to generate more active chemical groups, while the whole reaction system maintains a lower temperature.
So compared to the CVD process, PECVD can carry out the same chemical vapor deposition process with a lower temperature.
4.9 / 5
Incredible precision for our CVD research. The 30-segment programmable controller is a game-changer. Worth every penny!
4.8 / 5
Arrived faster than expected! Setup was straightforward. The thermal uniformity is exceptional for crystal growth.
4.7 / 5
The build quality is outstanding. Feels incredibly durable. The safety features give our lab immense peace of mind.
5.0 / 5
A technological marvel. The vacuum sealing is flawless, and the heating rates are incredibly rapid. Highly advanced!
4.8 / 5
Perfect for our heat treatment processes. The vertical design prevents tube sagging beautifully. Superb value.
4.9 / 5
The corundum tube withstands extreme temperatures with ease. A reliable workhorse for daily materials testing.
4.7 / 5
The quenching capabilities are fantastic. The automated safety protocols are a brilliant addition. So impressed!
4.9 / 5
Integration with our PC for data export via RS485 is seamless. A truly smart furnace for modern labs.
4.8 / 5
Compact yet powerful. Saves so much bench space. The temperature control is remarkably accurate.
4.7 / 5
Excellent for sintering and brazing. The alumina fiber hearth shows no signs of wear after heavy use. Built to last.
5.0 / 5
The touch screen controller is so intuitive. Makes complex heat treatment programs a breeze to execute. Love it!
4.8 / 5
The over-temperature protection is a lifesaver. Allows us to run experiments overnight with total confidence.
4.9 / 5
Perfectly suited for Bridgman crystal growth. The vertical orientation is ideal. Exceeded all our expectations.
4.7 / 5
Fast delivery and easy installation. The furnace's performance in calcination processes is consistently top-notch.
4.8 / 5
The ability to handle high-vacuum setups is a huge advantage. A versatile and technologically advanced instrument.
4.9 / 5
The power failure restart function is incredibly useful. No data loss! A thoughtful and robust design.
4.8 / 5
Outstanding for powder processing and fluidized bed experiments. The temperature stability is truly impressive.
4.7 / 5
The build quality is outstanding. Feels incredibly durable. The safety features give our lab immense peace of mind.
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