Tube Furnace
Multi-zone Laboratory Tube Furnace
Item Number : KT-MTF
Price varies based on specs and customizations
- Max. temperature
- 1700 ℃
- Constant work temperature
- 1650 ℃
- Furnace tube diameter
- 30 / 40 / 60 / 80 / 100 / 150 / 230 mm
- Heating zone length
- 300 / 450 / 600 / 800 mm
- Heating zone quantity
- 1-10 zones
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Introduction
A Multi-Zone Tube Furnace is a versatile laboratory equipment designed for high-temperature applications. It features multiple independently controlled heating zones, allowing for precise temperature gradients or uniform heating. The furnace is typically equipped with high-purity quartz or alumina tubes for sample containment and heating.
This advanced system offers a wide temperature range (300-1600℃), precise temperature control, and efficient heat insulation. Its applications include sintering, coating, thermal decomposition, and chemical vapor deposition (CVD) processes under vacuum or inert gas environments. The multiple heating zones enable customized temperature profiles, enhancing the efficiency and accuracy of thermal testing and analysis.
Applications
Multi-Zone Tube Furnaces are widely used in various applications, including:
- Sintering
- Coating
- Thermal decomposition
- Quenching tests
- Temperature measurements
- Chemical vapor deposition(CVD)
- High-temperature heat treatment
- Metal materials
- Ceramic materials
- Nanomaterials
- Semiconductor materials
- Powder metallurgy
- New materials
- Petrochemical
- Aerospace
Features
The Multi-Zone Tube Furnace offers a range of advanced features designed to enhance the efficiency and accuracy of your laboratory processes:
- Precise Temperature Control: Independent control of each heating zone ensures precise temperature distribution and minimizes temperature gradients.
- High Temperature Capability: With a maximum temperature of 1700℃, this furnace is suitable for a wide range of high-temperature applications.
- Versatile Heating Zones: Available in 2, 3, or 5 heating zones, the furnace allows for customized temperature profiles and tailored heating requirements.
- Efficient Heat Insulation: Double furnace shell design with forced air circulation minimizes heat loss and maintains a low surface temperature.
- Easy Operation: PID programmable temperature control and a user-friendly touch screen simplify operation and monitoring.
- Remote Control: Remote control and centralized control capabilities enable convenient and efficient operation.
- High Vacuum Compatibility: Stainless steel vacuum flange with multiple ports ensures excellent sealing and high vacuum pressure for vacuum-based applications.
- Data Logging and Analysis: The TFT touch screen controller allows for easy program setting, history data analysis, and recipe storage.
Principle
The Multi Zone Tube Furnace works by heating a sample in a controlled environment. The furnace has multiple heating zones, each of which can be independently controlled to create a specific temperature gradient. This allows for precise control of the heating process and can be used for a variety of applications, such as annealing, sintering, and CVD. The furnace is also equipped with a vacuum pump to create a vacuum environment, which can be used to remove gases from the sample or to create a controlled atmosphere.
Advantages
- Precise temperature control: Each heating zone can be controlled independently, allowing for precise temperature gradients and uniform heating throughout the tube.
- High temperature capability: With a maximum temperature of 1700℃, the Multi-Zone Tube Furnace can handle demanding applications requiring high temperatures.
- Vacuum and inert gas compatibility: The furnace can be used under vacuum or flowing inert gas conditions, making it suitable for various processes such as quenching, sintering, and CVD.
- High purity materials: The furnace tube is made of high-purity quartz or alumina, ensuring minimal contamination and accurate temperature measurements.
- Efficient heat insulation: Double furnace shell design and forced air flow between the inner and outer shells minimize heat loss and maintain a low surface temperature.
- User-friendly interface: TFT touch screen controller with intuitive programming and data analysis capabilities simplifies operation and monitoring.
- Versatility: Suitable for various applications in research, development, and production environments, including material processing, temperature measurements, and testing.
Safety Advantage
- Kindle Tech tube furnace owns over current protection and over temperature alarming function, furnace will turn off the power automatically once over current detected
- Furnace build in thermal couple detecting function, furnace will stop heating and alarm will be on once thermal couple broken or failure detected
- TFM Pro support power failure restarting function,furnace will resume the furnace heating program when power is incoming after failure
Technical specifications
| Furnace model | KT-MTF | KT-MTF Pro |
| Temperature controller | Digital PID controller | Touch screen PID controller |
| Multi program preset | no | yes |
| Power failure restarting | no | yes |
| Max. temperature | 1700℃ | |
| Constant work temperature | 1650℃ | |
| Furnace tube material | High grade Quartz/ Al2O3 alumina | |
| Furnace tube diameter | 30 / 40 / 60 / 80 / 100 / 150 / 230 mm | |
| Heating zone length | 300 / 450 / 600 / 800 mm | |
| Heating zone quantity | 1-10 zones | |
| Vacuum sealing solution | SS 304 flange with O ring | |
| Rated vacuum pressure | 0.001Pa/10E5 torr | |
| Rated positive pressure | 0.02Mpa/150 torr | |
| Chamber material | Japan Al2O3 alumina fiber | |
| Heating element | Cr2Al2Mo2 wire coil/Silicon Carbide/Silicon Carbide | |
| Thermal couple | K /S/B type | |
| Temperature control accuracy | ±1℃ | |
| Temperature uniformity | ±5℃ | |
| Electric power supply | AC110-220V,50/60HZ | |
| Other Al2O3 alumina tube size and heating zone length can be customized | ||
Standard Package
| No. | Description | Quantity |
| 1 | Furnace | 1 |
| 2 | Alumina tube | 1 |
| 3 | Vacuum flange | 2 |
| 4 | Tube thermal block | 2 |
| 5 | Tube thermal block hook | 1 |
| 6 | Heat resistant glove | 1 |
| 7 | Operation manual | 1 |
Optional Setup
- In tube gases detecting and monitoring,like H2, O2 and so on
- Independent furnace temperature monitoring and recording
- RS 485 communication port for PC remote control and data exporting
- Insert gases feeding flow rate control,like mass flowmeter and float flowmeter
- Touch screen temperature controller with versatile operator friendly functions
- High vacuum pump station setups, like vane vacuum pump,molecular pump,diffusion pump
Warnings
Operator safety is the top important issue! Please operate the equipment with cautions. Working with inflammable& explosive or toxic gases is very dangerous, operators must take all necessary precautions before starting the equipment. Working with positive pressure inside the reactors or chambers is dangerous, operator must fellow the safety procedures strictly. Extra caution must also be taken when operating with air-reactive materials, especially under vacuum. A leak can draw air into the apparatus and cause a violent reaction to occur.
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FAQ
What Is A Tube Furnace?
Laboratory tube furnace is one classic external heating high temperature tube furnace, also named hot wall heating furnace.
According to the different working temperature, furnace tube material usually can be transparent quartz tubes, high purity alumina ceramic tubes and high strength metal alloy tubes.
To meet different thermal researching purposes, tube furnace can be designed with multi heating zones, so as to have a flexible control of temperature gradient in the tube working chamber; furnace tube can work with a controlled atmosphere working environment or a high vacuum working environment.
What Is CVD Furnace?
Chemical vapor deposition (CVD) is a technology that uses various energy sources such as heating, plasma excitation or light radiation to chemically react gaseous or vapor chemical substances on the gas phase or gas-solid interface to form solid deposits in the reactor by means of chemical reaction.To put it simply, two or more gaseous raw materials are introduced into a reaction chamber, and then they react with each other to form a new material and deposit it on the substrate surface.
CVD furnace is one combined furnace system with high temperature tube furnace unit,gases control unit, and vacuum unit, it is widely used for experiment and production of composite material preparation, microelectronics process, semiconductor optoelectronic, solar energy utilization, optical fiber communication, superconductor technology, protective coating field.
How Does A Tube Furnace Work?
Tube furnace heating elements are placed surrounding the cylindrical cavity, furnace can only heat the samples in the cylindrical cavity through indirect thermal radiation, since furnace tube can prevent sample material from contacting with furnace heating elements and insulation materials, so tube furnace creates a clean isolated heat chamber and reduce risks of the sample material contaminating by the furnace.
How Does CVD Furnace Work?
CVD furnace system consists of high temperature tube furnace unit, reacting gas source precise control unit, vacuum pump station and corresponding assembling parts.
Vacuum pump is to remove the air from the reacting tube,and make sure there is no unwanted gases inside the reaction tube, after that the tube furnace will heat the reaction tube to a target temperature, then reacting gas source precise control unit can introduce different gases with a set ratio into the furnace tube for the chemical reaction, the chemical vapor deposition will be formed in the CVD furnace.
What Is The Application For Tube Furnace?
Tubular furnace is mainly used in metallurgy, glass, heat treatment, lithium anode and cathode materials, new energy, abrasives and other industries, and is a professional equipment for measuring materials under certain temperature conditions.
Tube furnace features simple structure, easy operation, easy control and continuous production.
Tube furnace is also widely applied in the CVD (chemical vapor deposition) and plasma enhanced CVD systems.
Which Gas Is Used In CVD Process?
There are tremendous gas sources can be used in the CVD process, the common chemical reactions of CVD includes Pyrolysis, photolysis, reduction, oxidation, redox,so the gases involved in these chemical reactions can be used in the CVD process.
We take CVD Graphene growth for an example, the gases used in the CVD process will be CH4,H2,O2 and N2.
How Many Different Types Tube Furnace?
Tube furnace can work with different mechanical functions smoothly, so there are many different types tube furnace variations for different experiment purposes, typical furnace furnaces are as below:
- Horizontal tube furnace
- Vertical tube furnace
- Split tube furnace
- Rotary tube furnace
- Tilting tube furnace
- Sliding tube furnace
- Fast heating and cooling tube furnace
- Continuous feeding and discharging tube furnace
What Is The Advantage Of CVD System?
- Wide range of films can be produced, metal film, nonmetal film and multi-component alloy film as required. At the same time, it can prepare high-quality crystals that are difficult to obtain by other methods, such as GaN, BP, etc.
- The film forming speed is fast, usually several microns per minute or even hundreds of microns per minute. It is possible to simultaneously deposit large quantities of coatings with uniform composition, which is incomparable to other film preparation methods, such as liquid phase epitaxy (LPE) and molecular beam epitaxy (MBE).
- The working conditions are carried out under normal pressure or low vacuum conditions, so the coating has good diffraction, and the workpieces with complex shapes can be uniformly coated, which is much superior to PVD.
- Due to the mutual diffusion of reaction gas, reaction product and substrate, a coating with good adhesion strength can be obtained, which is crucial for preparing surface strengthened films such as wear-resistant and anti-corrosion films.
- Some films grow at a temperature far lower than the melting point of the film material. Under the condition of low temperature growth, the reaction gas and reactor wall and impurities contained in them almost do not react, so a film with high purity and good crystallinity can be obtained.
- Chemical vapor deposition can obtain a smooth deposition surface. This is because compared with LPE, chemical vapor deposition (CVD) is carried out under high saturation, with high nucleation rate, high nucleation density, and uniform distribution on the whole plane, resulting in a macroscopic smooth surface. At the same time, in chemical vapor deposition, the average free path of molecules (atoms) is much larger than LPE, so the spatial distribution of molecules is more uniform, which is conducive to the formation of a smooth deposition surface.
- Low radiation damage, which is a necessary condition for manufacturing metal oxide semiconductors (MOS) and other devices
What Are The Advantages Of Using A Tube Furnace?
What Does PECVD Stand For?
PECVD is a technology that uses plasma to activate reaction gas, promote chemical reaction on the surface of substrate or near surface space, and generate solid film. The basic principle of plasma chemical vapor deposition technology is that under the action of RF or DC electric field, the source gas is ionized to form a plasma, the low-temperature plasma is used as the energy source, an appropriate amount of reaction gas is introduced, and the plasma discharge is used to activate the reaction gas and realize chemical vapor deposition.
According to the method of generating plasma, it can be divided into RF plasma, DC plasma and microwave plasma CVD, etc...
What Safety Precautions Should Be Taken When Using A Tube Furnace?
What Is The Difference Between CVD And PECVD?
The difference between PECVD and traditional CVD technology is that the plasma contains a large number of high-energy electrons, which can provide the activation energy required in the chemical vapor deposition process, thus changing the energy supply mode of the reaction system. Since the electron temperature in the plasma is as high as 10000K, the collision between electrons and gas molecules can promote the chemical bond breaking and recombination of the reaction gas molecules to generate more active chemical groups, while the whole reaction system maintains a lower temperature.
So compared to the CVD process, PECVD can carry out the same chemical vapor deposition process with a lower temperature.
4.9 / 5
The independent zone control is a game-changer for our materials research. Unmatched precision and a surprisingly fast delivery!
4.8 / 5
Incredible value. The build quality and advanced features, like the touch screen controller, far exceed the price point. Highly recommended.
4.7 / 5
This furnace is a workhorse. The durable construction and safety features give us immense confidence during long, high-temperature runs.
4.9 / 5
Technological marvel. The ability to create precise temperature gradients has revolutionized our CVD processes. A brilliant piece of engineering.
4.8 / 5
Arrived ahead of schedule! Setup was straightforward, and the performance is consistently exceptional. A fantastic investment for our lab.
4.7 / 5
The vacuum compatibility and high-temperature range are perfect for our aerospace applications. Robust, reliable, and worth every penny.
4.9 / 5
The user-friendly interface makes complex programming simple. Data logging is a huge bonus. This furnace has accelerated our R&D significantly.
4.8 / 5
Impressively efficient insulation keeps the exterior cool, enhancing lab safety. A thoughtfully designed and technologically advanced system.
4.7 / 5
For nanomaterial synthesis, the precise multi-zone control is indispensable. The quality and durability are immediately apparent.
4.9 / 5
Outstanding performance. The furnace handles sintering and thermal decomposition with incredible consistency. Delivery was lightning-fast.
4.8 / 5
An absolute powerhouse. The combination of high-temperature capability and precise control offers incredible value for advanced research.
4.7 / 5
Built to last. The double-shell design and safety features provide peace of mind. A top-tier product that delivers on all promises.
4.9 / 5
The remote control capability is a fantastic modern touch. This furnace represents the pinnacle of laboratory technology and reliability.
4.8 / 5
Versatility is its middle name. From ceramics to semiconductors, it performs flawlessly. Exceptional quality and surprisingly quick shipping.
4.7 / 5
The precision temperature control across multiple zones has elevated our experimental accuracy. A durable and technologically superior instrument.
4.9 / 5
A masterpiece of engineering. The seamless integration of high vacuum and inert gas options makes it an invaluable asset for any serious lab.
4.8 / 5
Arrived ahead of schedule! Setup was straightforward, and the performance is consistently exceptional. A fantastic investment for our lab.
4.7 / 5
The vacuum compatibility and high-temperature range are perfect for our aerospace applications. Robust, reliable, and worth every penny.
4.9 / 5
The user-friendly interface makes complex programming simple. Data logging is a huge bonus. This furnace has accelerated our R&D significantly.
4.8 / 5
Impressively efficient insulation keeps the exterior cool, enhancing lab safety. A thoughtfully designed and technologically advanced system.
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