Assay Equipment Accessories & Consumables
High Purity Laboratory Gas Purifier for Inert Atmosphere and Ultra Clean Process Gases
Item Number : KT-JH
Price varies based on specs and customizations
- Outlet Impurity Levels
- O2 ≤ 0.05 ppm, H2O ≤ 0.1 ppm
- Nominal Flow Rate
- 10 – 100 L/min
- Operating Gas Pressure
- 0.3 – 0.8 MPa
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Product Overview


This high-purity gas purification system is engineered to eliminate trace impurities from inert and process gases, delivering ultra-clean environments essential for sensitive laboratory research and pilot-scale manufacturing. By utilizing advanced multi-stage catalytic deoxygenation and molecular sieve adsorption columns, the equipment consistently reduces moisture (H2O) and oxygen (O2) contamination levels to below 0.1 parts per million (ppm). Its robust design provides an uncompromising solution for facilities demanding reliable, stable, and cost-effective on-demand pure gas generation without dependence on high-grade bottled specialty cylinders.
Designed specifically for demanding research and production environments, the unit integrates seamlessly with high-temperature tube furnaces, controlled atmosphere muffle furnaces, chemical vapor deposition (CVD/PECVD) reactors, glove box containment systems, and additive manufacturing systems. Target sectors include semiconductor fabrication, lithium-ion battery research, advanced optoelectronics, precision metallurgy, and catalyst characterization laboratories. Across these fields, preventing unwanted oxidation, nitridation, or atmospheric moisture degradation is critical to experimental reproducibility and production yield.
Engineered with an emphasis on continuous operational resilience, the system incorporates fully automated dual-column regeneration capabilities, industrial-grade pneumatic valve arrays, and high-precision monitoring instrumentation. The heavy-duty stainless-steel fluid handling architecture ensures leak-tight integrity even under elevated operating pressures. By maintaining continuous filtration and regeneration without interrupting downstream gas delivery, this equipment gives researchers and process engineers absolute confidence in long-term atmospheric control during prolonged thermal treatments and analytical evaluations.
Key Features
- Sub-PPM Deep Gas Purification: Incorporates catalytic getter technology and synthetic molecular sieves to achieve simultaneous deoxygenation and dehydration, reliably lowering both oxygen and moisture levels to less than 0.1 ppm (<100 ppb) across continuous operational cycles.
- Continuous Dual-Column Cyclic Operation: Features twin adsorption columns configured for alternating purification and regeneration modes, ensuring uninterrupted downstream delivery of ultra-pure gas during lengthy high-temperature thermal runs.
- Automated Thermal Regeneration: Equipped with integrated high-efficiency heating jackets and programmable micro-purge controls that fully regenerate saturated adsorbent beds automatically without requiring disassembly or manual catalyst replacement.
- All-Metal Ultra-High-Vacuum (UHV) Plumbing: Constructed with electro-polished 316L stainless steel tubing, orbital-welded joints, and metal-gasket face seal fittings (VCR/compression) to guarantee helium leak rates below 1×10⁻⁹ mbar·L/s.
- Real-Time Dew Point and Oxygen Monitoring: Integrates high-precision electrochemical trace oxygen sensors and ceramic dew point transmitters, providing continuous digital verification of gas quality directly on the central touchscreen display.
- Intelligent PLC Control with Intuitive HMI: Employs an industrial programmable logic controller coupled to a full-color human-machine interface, offering automated pressure regulation, one-touch start/stop routines, fault diagnostics, and automated safety interlocks.
- Overpressure and Flow Safety Interlocks: Designed with multi-tier fail-safe mechanisms including automatic pneumatic shutoff valves, mechanical overpressure relief valves, and audible-visual threshold alarms to prevent downstream contamination or system over-pressurization.
- Versatile Feed Gas Compatibility: Capable of purifying a wide spectrum of technical and carrier gases, including pure argon, nitrogen, helium, and forming gases, transforming standard industrial-grade cylinders into research-grade supply lines.
Applications
| Application | Description | Key Benefit |
|---|---|---|
| Semiconductor & Thin Film Epitaxy | Delivers ultra-pure argon or nitrogen carrier gas directly into CVD, PECVD, and ALD chambers during wafer processing. | Prevents substrate oxidation, minimizes pinhole defects, and ensures high film uniformity across delicate atomic layers. |
| Inert Atmosphere Thermal Processing | Purifies shield gas streams for tube furnaces, vacuum atmosphere furnaces, and dental sintering units processing reactive alloys. | Eliminates surface scaling and decarburization on titanium, zirconium, and refractory superalloys during high-temperature runs. |
| Lithium & Solid-State Battery R&D | Conditions protective atmospheres within glove boxes, pouch cell assembly lines, and electrolyte formulation stations. | Safeguards moisture-sensitive lithium metal anodes and solid electrolyte chemistries from catastrophic moisture degradation. |
| Optical Fiber & Photovoltaic Manufacturing | Purifies process atmosphere during preform drawing, silicon ingoting, and wafer passivated contact layer deposition. | Prevents hydroxyl (OH) absorption bands in silica glass and preserves carrier lifetimes in high-efficiency solar cells. |
| Additive Manufacturing & 3D Printing | Recirculates and refines inert shielding gases inside selective laser melting (SLM) and electron beam melting (EBM) build chambers. | Maintains exceptionally low oxygen levels to prevent spatter, porosity, and embrittlement in reactive metal printing. |
| Analytical Instrumental Carrier Gas Supply | Provides ultra-stable, moisture-free carrier streams for gas chromatography (GC-MS), optical emission spectrometry (OES), and TGA. | Lowers baseline noise, prevents column bleed, extends analytical detector lifespans, and enhances quantitative reproducibility. |
| Catalysis & Nanomaterials Synthesis | Delivers clean reaction atmospheres during catalyst reduction, calcination, and carbon nanotube (CNT) high-pressure synthesis. | Eliminates competitive poisoning of active catalyst sites caused by residual oxygen and organic moisture impurities. |
Technical Specifications
| Specification Parameter | KT-JH-10 | KT-JH-30 | KT-JH-60 | KT-JH-100 |
|---|---|---|---|---|
| Item Number | KT-JH-10 | KT-JH-30 | KT-JH-60 | KT-JH-100 |
| Purified Gas Compatibility | Ar, N2, He, Kr, Ne, H2 | Ar, N2, He, Kr, Ne, H2 | Ar, N2, He, Kr, Ne, H2 | Ar, N2, He, Kr, Ne, H2 |
| Nominal Flow Rate | 10 L/min (0.6 m³/h) | 30 L/min (1.8 m³/h) | 60 L/min (3.6 m³/h) | 100 L/min (6.0 m³/h) |
| Inlet Gas Purity Requirement | ≥ 99.99% (Technical Grade) | ≥ 99.99% (Technical Grade) | ≥ 99.99% (Technical Grade) | ≥ 99.99% (Technical Grade) |
| Outlet Impurity Level (O2) | ≤ 0.05 ppm (≤ 50 ppb) | ≤ 0.05 ppm (≤ 50 ppb) | ≤ 0.05 ppm (≤ 50 ppb) | ≤ 0.05 ppm (≤ 50 ppb) |
| Outlet Impurity Level (H2O) | ≤ 0.1 ppm (Dew point ≤ -90°C) | ≤ 0.1 ppm (Dew point ≤ -90°C) | ≤ 0.1 ppm (Dew point ≤ -90°C) | ≤ 0.1 ppm (Dew point ≤ -90°C) |
| Outlet Particle Filtration | 0.003 μm particulate filter | 0.003 μm particulate filter | 0.003 μm particulate filter | 0.003 μm particulate filter |
| Operating Gas Pressure | 0.3 – 0.8 MPa (3 – 8 bar) | 0.3 – 0.8 MPa (3 – 8 bar) | 0.3 – 0.8 MPa (3 – 8 bar) | 0.3 – 0.8 MPa (3 – 8 bar) |
| Maximum Pressure Tolerance | 1.2 MPa (12 bar) | 1.2 MPa (12 bar) | 1.2 MPa (12 bar) | 1.2 MPa (12 bar) |
| Purification Architecture | Dual-column automatic cyclic | Dual-column automatic cyclic | Dual-column automatic cyclic | Dual-column automatic cyclic |
| Regeneration Mechanism | Built-in electric thermal sweep | Built-in electric thermal sweep | Built-in electric thermal sweep | Built-in electric thermal sweep |
| Regeneration Gas Consumption | 3–5% of nominal flow | 3–5% of nominal flow | 3–5% of nominal flow | 3–5% of nominal flow |
| Wetted Piping Material | 316L Stainless Steel (EP) | 316L Stainless Steel (EP) | 316L Stainless Steel (EP) | 316L Stainless Steel (EP) |
| Helium Leak Rate | < 1.0 × 10⁻⁹ mbar·L/s | < 1.0 × 10⁻⁹ mbar·L/s | < 1.0 × 10⁻⁹ mbar·L/s | < 1.0 × 10⁻⁹ mbar·L/s |
| Inlet / Outlet Connection | 1/4 inch Swagelok / VCR | 3/8 inch Swagelok / VCR | 1/2 inch Swagelok / VCR | 1/2 inch Swagelok / VCR |
| Control Interface | 7-inch color LCD touch HMI | 7-inch color LCD touch HMI | 10-inch color LCD touch HMI | 10-inch color LCD touch HMI |
| Electrical Power Supply | 220V AC, 50/60 Hz, 1.5 kW | 220V AC, 50/60 Hz, 2.5 kW | 220V AC, 50/60 Hz, 4.0 kW | 380V 3-Phase, 50/60 Hz, 6.0 kW |
| Enclosure Dimensions (W×D×H) | 600 × 650 × 1350 mm | 700 × 750 × 1500 mm | 850 × 850 × 1700 mm | 1050 × 950 × 1850 mm |
Why Choose This Product
- Substantial Operating Cost Reduction: Transitioning from expensive bottled ultra-high-purity (UHP 99.9999%) specialty gases to on-demand generation from standard industrial grade (99.99%) cylinders yields rapid return on investment and permanently lowers operational overhead.
- Precision Engineering and Certified Reliability: Manufactured under stringent ISO quality management protocols, each assembly undergoes complete mass-spectrometer helium leak checks, high-pressure decay testing, and multi-point chromatographic purity verification prior to dispatch.
- Uninterrupted Research Continuity: The dual-tower automated regeneration cycle eliminates system downtime, guaranteeing an uninterrupted flow of purified inert gas during mission-critical furnace operations, long-dwell sintering, and sensitive thin-film cycles.
- Comprehensive Process Safety Interlocks: Equipped with multi-layered hardware and software interlocks—including automatic emergency line isolation, dynamic backpressure regulation, and thermal overload protection—ensuring safe, unattended continuous operation in modern industrial laboratories.
- Modular Scalability and Custom Integration: System configurations can be tailored to match specific facility floor plans, pipe network dimensions, flow capacities, and gas purity monitoring requirements with comprehensive engineering support from our technical specialists.
Contact our engineering team today to receive a personalized technical consultation, review application compatibility, or obtain a detailed commercial quotation tailored to your facility requirements.
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Product Datasheet
High Purity Laboratory Gas Purifier for Inert Atmosphere and Ultra Clean Process Gases
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