Sputtering is a process that involves the use of a specific gas to create thin films or coatings on a substrate.
5 Key Points to Know About the Process Gas for Sputtering
1. The Most Common Process Gas is Argon
Argon is typically the gas of choice for sputtering.
2. Argon is Introduced into a Vacuum Chamber
In a vacuum chamber, argon becomes ionized and forms a plasma.
3. Ions in the Plasma are Accelerated Towards the Target Material
These ions dislocate atoms or molecules from the target material.
4. Dislocated Particles Form a Vapor Stream
This vapor stream deposits onto a substrate, creating a thin film or coating.
5. The Choice of Gas Can Vary
Other gases like neon, krypton, xenon, oxygen, and nitrogen can also be used depending on the specific requirements of the sputtering process.
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