Products Lab Consumables & Materials Lab Materials High Purity Vanadium Oxide (V2O3) Sputtering Target / Powder / Wire / Block / Granule
High Purity Vanadium Oxide (V2O3) Sputtering Target / Powder / Wire / Block / Granule

Lab Materials

High Purity Vanadium Oxide (V2O3) Sputtering Target / Powder / Wire / Block / Granule

Item Number : LM-V2O3

Price varies based on specs and customizations


Chemical Formula
V2O3
Purity
4N
Shape
ISO & CE icon

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At reasonable prices, we offer Vanadium Oxide (V2O3) materials for laboratory use. Our expertise is in producing and customizing Vanadium Oxide (V2O3) materials of varying purities, shapes, and sizes to meet your specific needs.

We offer a diverse selection of specifications and sizes for various types of sputtering targets (circular, square, tubular, irregular), coating materials, cylinders, cones, particles, foils, powders, 3D printing powders, nanometer powders, wire rods, ingots, and blocks, among others.

Details

Vanadium Oxide (V2O3) Sputtering Target
Vanadium Oxide (V2O3) Sputtering Target

About Vanadium Oxide (V2O3)

Vanadium(III) Oxide (Vanadium Sesquioxide) is a form of vanadium oxide that is suitable for various applications in glass, optics, and ceramics. While oxide compounds are generally not conductive to electricity, certain perovskite structured oxides are electronically conductive and are used in the cathode of solid oxide fuel cells and oxygen generation systems.

Oxide compounds typically contain at least one oxygen anion and one metallic cation. They are insoluble in aqueous solutions and highly stable, making them useful in a range of applications from producing clay bowls to advanced electronics and lightweight structural components in aerospace and electrochemical systems such as fuel cells, in which they exhibit ionic conductivity.

Metal oxide compounds are basic anhydrides and can react with acids and strong reducing agents in redox reactions. Vanadium Oxide is generally available in most volumes, and high-purity, submicron, and nanopowder forms may also be considered.

Ingredient Quality Control

Raw material composition analysis
Through the use of equipment such as ICP and GDMS, the content of metal impurities is detected and analyzed to ensure that it meets the purity standard;

Non-metallic impurities are detected by equipment such as carbon and sulfur analyzers, nitrogen and oxygen analyzers.
Metallographic flaw detection analysis
The target material is inspected using flaw detection equipment to ensure that there are no defects or shrinkage holes inside the product;

Through metallographic testing, the internal grain structure of the target material is analyzed to ensure that the grains are fine and dense.
Appearance and dimension inspection
Product dimensions are measured using micrometers and precision calipers to ensure compliance with drawings;

The surface finish and cleanliness of the product are measured using a surface cleanliness meter.

Conventional Sputtering Target Sizes

Preparation process
hot isostatic pressing, vacuum melting, etc.
Sputtering target shape
plane sputtering target, multi-arc sputtering target, step sputtering target, special-shaped sputtering target
Round sputtering target size
Diameter: 25.4mm / 50mm / 50.8mm / 60mm / 76.2mm / 80mm / 100mm / 101.6mm / 152.4mm
Thickness: 3mm / 4mm / 5mm / 6mm / 6.35mm
Size can be customized.
Square sputtering target size
50×50×3mm / 100×100×4mm / 300×300×5mm, size can be customized

Available Metal Forms

Metal Forms Details

We manufacture almost all the metals listed on the periodic table in a wide range of forms and purities, as well as standard sizes and dimensions. We can also produce custom-made products to meet specific customer requirements, such as size, shape, surface area, composition, and more. The following list provides a sample of the forms we offer, but it is not exhaustive. If you need laboratory consumables, please contact us directly to request a quote.

  • Flat/Planar Forms: Board, Film, Foil, Microfoil, Microleaf, Paper, Plate, Ribbon, Sheet, Strip, Tape, Wafer
  • Preformed Shapes: Anodes, Balls, Bands, Bars, Boats, Bolts, Briquettes, Cathodes, Circles, Coils, Crucibles, Crystals, Cubes, Cups, Cylinders, Discs, Electrodes, Fibers, Filaments, Flanges, Grids, Lenses, Mandrels, Nuts, Parts, Prisms, Pucks, Rings, Rods, Shapes, Shields, Sleeves, Springs, Squares, Sputtering Targets, Sticks, Tubes, Washers, Windows, Wires
  • Microsizes: Beads, Bits, Capsules, Chips, Coins, Dust, Flakes, Grains, Granules, Micropowder, Needles, Particles, Pebbles, Pellets, Pins, Pills, Powder, Shavings, Shot, Slugs, Spheres, Tablets
  • Macrosizes: Billets, Chunks, Cuttings, Fragments, Ingots, Lumps, Nuggets, Pieces, Punchings, Rocks, Scraps, Segments, Turnings
  • Porous and Semi-Porous: Fabric, Foam, Gauze, Honeycomb, Mesh, Sponge, Wool
  • Nanoscale: Nanoparticles, Nanopowders, Nanofoils, Nanotubes, Nanorods, Nanoprisms
  • Others: Concentrate, Ink, Paste, Precipitate, Residue, Samples, Specimens

KinTek specializes in the manufacturing of high-purity and ultra-high-purity materials with a purity range of 99.999% (5N), 99.9999% (6N), 99.99995% (6N5), and in some cases, up to 99.99999% (7N). Our materials are available in specific grades, including UP/UHP, semiconductor, electronic, deposition, fiber optic, and MBE grades. Our high-purity metals, oxides, and compounds are specifically crafted to meet the rigorous demands of high-technology applications and are ideal for use as dopants and precursor materials for thin film deposition, crystal growth of semiconductors, and synthesis of nanomaterials. These materials find use in advanced microelectronics, solar cells, fuel cells, optical materials, and other cutting-edge applications.

Packaging

We use vacuum packaging for our high-purity materials, and each material has specific packaging tailored to its unique characteristics. For instance, our Hf sputter target is externally tagged and labeled to facilitate efficient identification and quality control. We take great care to prevent any damage that could occur during storage or transportation.

View more faqs for this product

4.9

out of

5

KinTek's Vanadium Oxide (V2O3) Sputtering Target is a lifesaver. It's so pure and consistent that it's made our thin film deposition process so much easier.

Aiden Murphy

4.8

out of

5

I've been using KinTek's V2O3 sputtering targets for years, and they've never let me down. The quality is always top-notch, and the prices are unbeatable.

Elena Petrova

4.7

out of

5

KinTek's Vanadium Oxide (V2O3) Sputtering Target is the best I've ever used. It's so easy to work with, and the results are always amazing.

Lucas Silva

4.9

out of

5

I was really impressed with the quality of KinTek's V2O3 sputtering target. It's made a huge difference in the performance of our thin film deposition system.

Sophia Patel

4.8

out of

5

KinTek's V2O3 sputtering target is the perfect solution for our research needs. It's pure, consistent, and affordable.

Ethan Cohen

4.7

out of

5

I've been using KinTek's V2O3 sputtering targets for a few months now, and I'm really happy with the results. They're very consistent and produce high-quality thin films.

Isabella Garcia

4.9

out of

5

KinTek's V2O3 sputtering target is the best I've ever used. It's so pure and consistent that it's made a huge difference in the quality of our thin films.

Liam Jones

4.8

out of

5

I was really impressed with the quality of KinTek's V2O3 sputtering target. It's made a huge difference in the performance of our thin film deposition system.

Mia Rodriguez

4.7

out of

5

KinTek's V2O3 sputtering target is the perfect solution for our research needs. It's pure, consistent, and affordable.

Noah Brown

4.9

out of

5

I've been using KinTek's V2O3 sputtering targets for a few months now, and I'm really happy with the results. They're very consistent and produce high-quality thin films.

Olivia Smith

4.8

out of

5

KinTek's V2O3 sputtering target is the best I've ever used. It's so pure and consistent that it's made a huge difference in the quality of our thin films.

Alexander Johnson

4.7

out of

5

I was really impressed with the quality of KinTek's V2O3 sputtering target. It's made a huge difference in the performance of our thin film deposition system.

Emma White

4.9

out of

5

KinTek's V2O3 sputtering target is the perfect solution for our research needs. It's pure, consistent, and affordable.

Oliver Green

4.8

out of

5

I've been using KinTek's V2O3 sputtering targets for a few months now, and I'm really happy with the results. They're very consistent and produce high-quality thin films.

Ava Williams

4.7

out of

5

KinTek's V2O3 sputtering target is the best I've ever used. It's so pure and consistent that it's made a huge difference in the quality of our thin films.

Elijah Wilson

4.9

out of

5

I was really impressed with the quality of KinTek's V2O3 sputtering target. It's made a huge difference in the performance of our thin film deposition system.

Isabella Garcia

4.8

out of

5

KinTek's V2O3 sputtering target is the perfect solution for our research needs. It's pure, consistent, and affordable.

Liam Jones

4.7

out of

5

I've been using KinTek's V2O3 sputtering targets for a few months now, and I'm really happy with the results. They're very consistent and produce high-quality thin films.

Mia Rodriguez

4.9

out of

5

KinTek's V2O3 sputtering target is the best I've ever used. It's so pure and consistent that it's made a huge difference in the quality of our thin films.

Noah Brown

PDF - High Purity Vanadium Oxide (V2O3) Sputtering Target / Powder / Wire / Block / Granule

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