PTFE material
PTFE conductive glass substrate cleaning rack
Item Number : PTFE-03
Price varies based on specs and customizations
- Material
- PTFE
- Specification
- See the form
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Introduction
PTFE flower baskets (Teflon flower baskets) are made of high-purity experimental grade PTFE, with excellent chemical stability, corrosion resistance, sealing and high and low temperature resistance (-180°C to +250°C).
We provide customized services such as PTFE cleaning racks and flower baskets for glass substrates (such as ITO, FTO, silicon wafers, etc.), and provide free design and drawing services based on your description or sketch to ensure that various industry needs are met.
Detail & Parts
Technical specifications
| 10×10×1.1mm | 20×20×1.1mm | 25×25×2.2mm | 30×30×2.2mm |
| 15×15×1.1mm | 25×25×1.1mm | 30×30×1.1mm |
1 inch, 2 inch, 4 inch diameter, etc. (above are glass or silicon wafer sizes), double handles (handle height can be customized) for easy removal of PTFE sheet wash racks from beakers and other containers with glass.
The products we show are available in different sizes and custom sizes are available on request.
Advantages
- Wide Temperature Range: Operates flawlessly from -200°C to +250°C.
- Exceptional Corrosion Resistance: Withstands strong acids, alkalis, aqua regia, and organic solvents without dissolution, adsorption, or precipitation.
- Low Metal Element Blank Value: Minimal risk of pollution.
- Superior Insulation: Unaffected by environmental factors and frequency, featuring low dielectric loss and high breakdown voltage.
- Resistant to Atmospheric Aging and Radiation.
- Low Permeability: Ensures efficient protection and cleaning.
- Self-Lubricating: Boasts the smallest coefficient of friction among plastics, reducing friction-related issues.
- Non-Adhesive Surface: Solid material with low surface energy, preventing sticking.
- Soft Mechanical Properties: Offers flexibility and versatility.
FAQ
What Is Physical Vapor Deposition (PVD)?
What Is RF PECVD?
What Is Magnetron Sputtering?
How Does RF PECVD Work?
Why Magnetron Sputtering?
What Are The Advantages Of RF PECVD?
What Are The Materials Used In Thin Film Deposition?
Thin film deposition commonly utilizes metals, oxides, and compounds as materials, each with its unique advantages and disadvantages. Metals are preferred for their durability and ease of deposition but are relatively expensive. Oxides are highly durable, can withstand high temperatures, and can be deposited at low temperatures, but can be brittle and challenging to work with. Compounds offer strength and durability, can be deposited at low temperatures and tailored to exhibit specific properties.
The selection of material for a thin film coating is dependent on the application requirements. Metals are ideal for thermal and electrical conduction, while oxides are effective in offering protection. Compounds can be tailored to suit specific needs. Ultimately, the best material for a particular project will depend on the specific needs of the application.
What Are The Methods To Achieve Optimal Thin Film Deposition?
To achieve thin films with desirable properties, high-quality sputtering targets and evaporation materials are essential. The quality of these materials can be influenced by various factors, such as purity, grain size, and surface condition.
The purity of sputtering targets or evaporation materials plays a crucial role, as impurities can cause defects in the resulting thin film. Grain size also affects the quality of the thin film, with larger grains leading to poor film properties. Additionally, the surface condition is crucial, since rough surfaces can result in defects in the film.
To attain the highest quality sputtering targets and evaporation materials, it is crucial to select materials that possess high purity, small grain size, and smooth surfaces.
Uses Of Thin Film Deposition
Zinc Oxide-Based Thin Films
ZnO thin films find applications in several industries such as thermal, optical, magnetic, and electrical, but their primary use is in coatings and semiconductor devices.
Thin-Film Resistors
Thin-film resistors are crucial for modern technology and are used in radio receivers, circuit boards, computers, radiofrequency devices, monitors, wireless routers, Bluetooth modules, and cell phone receivers.
Magnetic Thin Films
Magnetic thin films are used in electronics, data storage, radio-frequency identification, microwave devices, displays, circuit boards, and optoelectronics as key components.
Optical Thin Films
Optical coatings and optoelectronics are standard applications of optical thin films. Molecular beam epitaxy can produce optoelectronic thin-film devices (semiconductors), where epitaxial films are deposited one atom at a time onto the substrate.
Polymer Thin Films
Polymer thin films are used in memory chips, solar cells, and electronic devices. Chemical deposition techniques (CVD) offer precise control of polymer film coatings, including conformance and coating thickness.
Thin-Film Batteries
Thin-film batteries power electronic devices such as implantable medical devices, and the lithium-ion battery has advanced significantly thanks to the use of thin films.
Thin-Film Coatings
Thin-film coatings enhance the chemical and mechanical characteristics of target materials in various industries and technological fields. Anti-reflective coatings, anti-ultraviolet or anti-infrared coatings, anti-scratch coatings, and lens polarization are some common examples.
Thin-Film Solar Cells
Thin-film solar cells are essential to the solar energy industry, enabling the production of relatively cheap and clean electricity. Photovoltaic systems and thermal energy are the two main applicable technologies.
Factors And Parameters That Influence Deposition Of Thin Films
Deposition Rate:
The rate at which the film is produced, typically measured in thickness divided by time, is crucial for selecting a technology suitable for the application. Moderate deposition rates are sufficient for thin films, while quick deposition rates are necessary for thick films. It is important to strike a balance between speed and precise film thickness control.
Uniformity:
The consistency of the film across the substrate is known as uniformity, which usually refers to film thickness but can also relate to other properties such as the index of refraction. It is important to have a good understanding of the application to avoid under- or over-specifying uniformity.
Fill Capability:
Fill capability or step coverage refers to how well the deposition process covers the substrate's topography. The deposition method used (e.g., CVD, PVD, IBD, or ALD) has a significant impact on step coverage and fill.
Film Characteristics:
The characteristics of the film depend on the application's requirements, which can be categorized as photonic, optical, electronic, mechanical, or chemical. Most films must meet requirements in more than one category.
Process Temperature:
Film characteristics are significantly affected by process temperature, which may be limited by the application.
Damage:
Each deposition technology has the potential to damage the material being deposited upon, with smaller features being more susceptible to process damage. Pollution, UV radiation, and ion bombardment are among the potential sources of damage. It is crucial to understand the limitations of the materials and tools.
4.8
out of
5
Fast delivery and excellent packaging. The rack is made of high-quality PTFE, which is resistant to corrosion and heat.
4.9
out of
5
The rack is very easy to use and clean. It holds the substrates securely and prevents them from moving around during the cleaning process.
4.7
out of
5
The rack is very durable and has been able to withstand the harsh chemicals used in the cleaning process.
4.6
out of
5
The rack is very affordable and is a great value for the price.
4.9
out of
5
The rack is very technologically advanced and has helped us to improve the quality of our products.
4.8
out of
5
The rack is very easy to use and has helped us to save time in the cleaning process.
4.7
out of
5
The rack is very durable and has been able to withstand the harsh conditions of the cleaning process.
4.6
out of
5
The rack is very affordable and is a great value for the price.
4.9
out of
5
The rack is very technologically advanced and has helped us to improve the quality of our products.
4.8
out of
5
The rack is very easy to use and has helped us to save time in the cleaning process.
4.7
out of
5
The rack is very durable and has been able to withstand the harsh conditions of the cleaning process.
4.6
out of
5
The rack is very affordable and is a great value for the price.
4.9
out of
5
The rack is very technologically advanced and has helped us to improve the quality of our products.
4.8
out of
5
The rack is very easy to use and has helped us to save time in the cleaning process.
4.7
out of
5
The rack is very durable and has been able to withstand the harsh conditions of the cleaning process.
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