Knowledge What Chemicals are Used in PVD Coating? (5 Key Materials Explained)
Author avatar

Tech Team · Kintek Solution

Updated 2 months ago

What Chemicals are Used in PVD Coating? (5 Key Materials Explained)

PVD coating involves the use of various materials including metals, metal oxides, nitrides, carbides, and other compounds.

Common materials used in PVD coatings include titanium, zirconium, aluminum, silicon oxide, diamond-like carbon, and various sulfur and molybdenum-based compounds.

These materials are selected based on their properties such as hardness, corrosion resistance, and thermal stability, which are enhanced by the PVD process.

What Chemicals are Used in PVD Coating? (5 Key Materials Explained)

What Chemicals are Used in PVD Coating? (5 Key Materials Explained)

1. Metals and Metal Compounds

PVD coatings often utilize metals like titanium, zirconium, and aluminum.

These metals can form compounds such as oxides, nitrides, and carbides during the PVD process.

For example, titanium can form titanium carbide (TiC) or titanium nitride (TiN), which are known for their high hardness and wear resistance.

Zirconium can similarly form zirconium carbide (ZrC) or zirconium nitride (ZrN), which also exhibit excellent corrosion resistance and hardness.

2. Silicon Oxide

This material is used in PVD coatings for its ability to enhance the dielectric properties of surfaces, making them resistant to electrical conduction and useful in electronic applications.

3. Diamond-like Carbon (DLC)

DLC coatings are known for their extreme hardness and low friction coefficients, making them ideal for applications requiring wear resistance and low friction, such as in precision tools and mechanical components.

4. Sulfur and Molybdenum-based Compounds

These materials are often used in PVD coatings to enhance lubricity and reduce friction.

Molybdenum disulfide (MoS2), for instance, is a common choice for its lubricating properties.

5. Reactive Gases

During the PVD process, reactive gases such as nitrogen, oxygen, and methane are introduced to react with the vaporized metal atoms, forming various compounds.

For example, nitrogen reacts with titanium to form titanium nitride, a hard, wear-resistant coating.

The choice of material for PVD coating depends on the specific requirements of the application, including the desired hardness, corrosion resistance, thermal stability, and tribological properties.

The PVD process itself involves evaporation of the coating material, transportation of the vaporized atoms to the substrate, reaction with gases to form compounds, and deposition of the material onto the substrate.

This process occurs under vacuum conditions, ensuring high-quality, dense coatings with excellent adhesion to the substrate.

Continue exploring, consult our experts

Unlock the potential of advanced surface engineering with KINTEK SOLUTION’s cutting-edge PVD coatings.

Harness the power of tailored materials like titanium, zirconium, and diamond-like carbon to achieve unmatched hardness, corrosion resistance, and thermal stability.

Our extensive range of options, from metal oxides to sulfur and molybdenum-based compounds, allows for precise customization for your specific application needs.

Trust KINTEK SOLUTION to elevate your product's performance and lifespan with high-quality, vacuum-deposited coatings.

Discover the KINTEK advantage and take your industrial processes to new heights—contact us today!

Related Products

Plasma enhanced evaporation deposition PECVD coating machine

Plasma enhanced evaporation deposition PECVD coating machine

Upgrade your coating process with PECVD coating equipment. Ideal for LED, power semiconductors, MEMS and more. Deposits high-quality solid films at low temps.

RF PECVD System Radio Frequency Plasma-Enhanced Chemical Vapor Deposition

RF PECVD System Radio Frequency Plasma-Enhanced Chemical Vapor Deposition

RF-PECVD is an acronym for "Radio Frequency Plasma-Enhanced Chemical Vapor Deposition." It deposits DLC (Diamond-like carbon film) on germanium and silicon substrates. It is utilized in the 3-12um infrared wavelength range.

Drawing die nano-diamond coating HFCVD Equipment

Drawing die nano-diamond coating HFCVD Equipment

The nano-diamond composite coating drawing die uses cemented carbide (WC-Co) as the substrate, and uses the chemical vapor phase method ( CVD method for short ) to coat the conventional diamond and nano-diamond composite coating on the surface of the inner hole of the mold.

CVD Diamond coating

CVD Diamond coating

CVD Diamond Coating: Superior Thermal Conductivity, Crystal Quality, and Adhesion for Cutting Tools, Friction, and Acoustic Applications

Inclined rotary plasma enhanced chemical deposition (PECVD) tube furnace machine

Inclined rotary plasma enhanced chemical deposition (PECVD) tube furnace machine

Introducing our inclined rotary PECVD furnace for precise thin film deposition. Enjoy automatic matching source, PID programmable temperature control, and high accuracy MFC mass flowmeter control. Built-in safety features for peace of mind.

Titanium Nitride (TiN) Sputtering Target / Powder / Wire / Block / Granule

Titanium Nitride (TiN) Sputtering Target / Powder / Wire / Block / Granule

Looking for affordable Titanium Nitride (TiN) materials for your lab? Our expertise lies in producing tailored materials of different shapes and sizes to meet your unique needs. We offer a wide range of specifications and sizes for sputtering targets, coatings, and more.

Cylindrical Resonator MPCVD Diamond Machine for lab diamond growth

Cylindrical Resonator MPCVD Diamond Machine for lab diamond growth

Learn about Cylindrical Resonator MPCVD Machine, the microwave plasma chemical vapor deposition method used for growing diamond gemstones and films in the jewelry and semi-conductor industries. Discover its cost-effective advantages over traditional HPHT methods.

High Purity Palladium (Pd) Sputtering Target / Powder / Wire / Block / Granule

High Purity Palladium (Pd) Sputtering Target / Powder / Wire / Block / Granule

Looking for affordable Palladium materials for your lab? We offer custom solutions with varying purities, shapes, and sizes - from sputtering targets to nanometer powders and 3D printing powders. Browse our range now!

High Purity Titanium (Ti) Sputtering Target / Powder / Wire / Block / Granule

High Purity Titanium (Ti) Sputtering Target / Powder / Wire / Block / Granule

Shop for high-quality Titanium (Ti) materials at reasonable prices for laboratory use. Find a wide range of tailored products to suit your unique needs, including sputtering targets, coatings, powders, and more.

High Purity Vanadium (V) Sputtering Target / Powder / Wire / Block / Granule

High Purity Vanadium (V) Sputtering Target / Powder / Wire / Block / Granule

Looking for high-quality Vanadium (V) materials for your laboratory? We offer a wide range of customizable options to fit your unique needs, including sputtering targets, powders, and more. Contact us today for competitive pricing.

Bell-jar Resonator MPCVD Diamond Machine for lab and diamond growth

Bell-jar Resonator MPCVD Diamond Machine for lab and diamond growth

Get high-quality diamond films with our Bell-jar Resonator MPCVD machine designed for lab and diamond growth. Discover how Microwave Plasma Chemical Vapor Deposition works for growing diamonds using carbon gas and plasma.

915MHz MPCVD Diamond Machine

915MHz MPCVD Diamond Machine

915MHz MPCVD Diamond Machine and its multi-crystal effective growth, the maximum area can reach 8 inches, the maximum effective growth area of single crystal can reach 5 inches. This equipment is mainly used for the production of large-size polycrystalline diamond films, the growth of long single crystal diamonds, the low-temperature growth of high-quality graphene, and other materials that require energy provided by microwave plasma for growth.

High Purity Titanium Dioxide (TiO2) Sputtering Target / Powder / Wire / Block / Granule

High Purity Titanium Dioxide (TiO2) Sputtering Target / Powder / Wire / Block / Granule

Looking for high-quality Titanium Dioxide materials? Our tailored products suit any lab's unique requirements. Browse our range of shapes, sizes, and purities today.

Titanium Carbide (TiC) Sputtering Target / Powder / Wire / Block / Granule

Titanium Carbide (TiC) Sputtering Target / Powder / Wire / Block / Granule

Get high-quality Titanium Carbide (TiC) materials for your lab at affordable prices. We offer a wide range of shapes and sizes, including sputtering targets, powders, and more. Tailored to your specific needs.

Cutting Tool Blanks

Cutting Tool Blanks

CVD Diamond Cutting Tools: Superior Wear Resistance, Low Friction, High Thermal Conductivity for Non-Ferrous Materials, Ceramics, Composites Machining

Tantalum Nitride (TaN) Sputtering Target / Powder / Wire / Block / Granule

Tantalum Nitride (TaN) Sputtering Target / Powder / Wire / Block / Granule

Discover affordable Tantalum Nitride materials for your laboratory needs. Our experts produce custom shapes and purities to meet your unique specifications. Choose from a variety of sputtering targets, coatings, powders, and more.


Leave Your Message