Infrared spectroscopy (IR) and Fourier Transform Infrared Spectroscopy (FTIR) are both powerful tools used in scientific research and analysis.
However, they differ significantly in their techniques, applications, and capabilities.
Understanding these differences can help you choose the right tool for your specific needs.
What is the difference between IR and FTIR? (7 Key Differences Explained)
1. Technique Used to Obtain Spectra
IR spectroscopy takes a single spectrum.
FTIR spectroscopy uses an interferometer and performs a series of scans.
This allows FTIR to scan up to 50 times per minute, providing better resolution compared to IR.
2. Type of Light Used
IR spectroscopy uses monochromatic light.
FTIR spectroscopy uses polychromatic light.
This difference in light source affects the sensitivity and range of wavelengths that can be measured.
3. Application
IR spectroscopy is commonly used for qualitative analysis, such as identifying functional groups in organic compounds.
It can also be used for quantitative analysis in certain cases.
FTIR spectroscopy is more versatile and can be used for a wide range of applications, including material identification, chemical analysis, and quality control.
4. Sample Observation
In terms of sample observation, there is a mention of observing the flow of the sample more distinctly when sighted sidewise rather than from above.
This may imply that the observation of sample behavior during analysis may vary depending on the orientation of the observation.
5. Temperature Measurement
Additionally, there is information about the measurement of temperature using optical or radiation pyrometers.
This suggests that temperature measurement is an important aspect in certain applications, and different types of pyrometers may be used depending on the heating rate and desired precision.
6. Thin Film Deposition Techniques
There is also some information about the differences between thermal evaporation and sputtering techniques for thin film deposition.
Thermal evaporation processes depend on the temperature of the source material being evaporated and tend to have lower numbers of high-speed atoms, reducing the possibility of damaging the substrate.
Sputtering, on the other hand, provides better step coverage and tends to deposit thin films more slowly than evaporation.
7. Advantages and Limitations
Overall, the references provide information about the differences in technique, light source, application, sample observation, temperature measurement, and thin film deposition between IR and FTIR spectroscopy, as well as some insights into their respective advantages and limitations.
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