The frequency commonly used for RF sputter deposition is 13.56 MHz.
This frequency is chosen for several reasons.
4 Key Reasons Why 13.56 MHz is the Standard Frequency for RF Sputter Deposition
1. Regulatory Compliance
The International Telecommunication Union (ITU) has designated 13.56 MHz as a frequency for industrial, scientific, and medical (ISM) instruments.
This allocation prevents interference with telecommunication services.
It ensures that RF sputtering equipment operates within a frequency band specifically reserved for non-communication applications.
2. Efficiency in Ion-Target Interaction
The frequency of 13.56 MHz is low enough to allow sufficient time for the momentum transfer of argon ions to the target material during sputtering.
At this frequency, ions have enough time to reach and interact with the target before the next cycle of the RF field begins.
This interaction is crucial for effective sputtering of the target material.
3. Avoidance of Charge Build-up
In RF sputtering, the alternating electrical potential helps prevent charge build-up on the target, especially when dealing with insulating materials.
During the positive cycle of the RF, electrons are attracted to the target, giving it a negative bias.
During the negative cycle, ion bombardment continues, ensuring the target remains electrically neutral and preventing adverse effects such as droplet formation.
4. Widely Accepted Standard
Given its effectiveness and compliance with international regulations, 13.56 MHz has become the standard frequency for RF sputtering.
This standardization simplifies the design and operation of sputtering equipment.
It also ensures compatibility of different systems and components.
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