The chemical method for thin film deposition is called chemical vapor deposition (CVD). In CVD, a substrate is placed into a vacuum chamber, and two chemical precursors are heated, causing them to vaporize. When these vaporized precursors meet on the substrate surface, a chemical reaction occurs, resulting in the formation of a thin film coating. CVD is a widely used technique for creating high-performance thin films with specific material properties. It is commonly used in semiconductor manufacturing and other industries where precise control over film composition and thickness is required.
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