Thermal evaporation systems are widely used in various industries, but they come with a significant drawback.
3 Key Points on the Major Disadvantage of Thermal Evaporation Systems
1. High Impurity Levels
Thermal evaporation systems often result in high impurity levels.
This is mainly because the process involves heating the source material to very high temperatures in a vacuum chamber.
During this heating, any impurities or contaminants in the source material can also evaporate and become part of the deposited film.
This can lead to films with poor quality, which is problematic for applications requiring high purity.
2. Low-Density Films
The films produced by thermal evaporation often have low density.
This means they might not adhere well to the substrate and can be porous.
The porosity can affect the mechanical and electrical properties of the film.
Low density also contributes to high impurity levels, as pores can trap impurities or allow them to migrate through the film.
3. Mitigation with Ion-Assist
While thermal evaporation inherently produces films with these disadvantages, the use of ion-assist sources can help improve the situation.
Ion-assist involves bombarding the depositing film with ions, which can increase the density and reduce the porosity of the film.
This process can also help in removing or reducing impurities, thereby improving the overall quality of the film.
However, the addition of ion-assist sources increases the complexity and cost of the system, which might not be feasible for all applications.
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