The resistance of CVD graphene, specifically its sheet resistance, is typically around 350 Ω/sq when grown on a copper substrate, with a transparency of 90%.
This value represents a significant improvement in the transparency/sheet resistance ratio compared to undoped graphene, which has a sheet resistance of approximately 6 kΩ with 98% transparency.
4 Key Insights
1. Sheet Resistance of CVD Graphene
The sheet resistance of graphene produced by chemical vapor deposition (CVD) on a copper substrate is reported to be 350 Ω/sq.
This measurement is taken under conditions where the graphene maintains a high level of transparency, specifically 90%.
The sheet resistance is a critical parameter for applications such as transparent conductive films, where a balance between conductivity and transparency is essential.
2. Comparison with Undoped Graphene
Undoped graphene, which is a one-atom thick, two-dimensional crystalline allotrope, exhibits a sheet resistance of approximately 6 kΩ with 98% transparency.
This higher resistance compared to CVD graphene on copper indicates that the CVD process can enhance the conductivity of graphene without significantly compromising its transparency.
3. Impact of Layer Thickness
The sheet resistance of graphene decreases with the addition of more layers.
Hypothetically, if the layers behave independently, the sheet resistance should remain constant and be related to that of a multilayer film.
This suggests that the CVD process can be optimized to control the number of layers, thereby adjusting the sheet resistance to meet specific application requirements.
4. Applications and Future Prospects
CVD graphene is used in various applications such as sensors, touch screens, and heating elements.
The development of better methods for handling and reducing the cost of CVD graphene production is expected to expand its applications further.
The ability to produce graphene with a large surface area and good electrical properties makes CVD an attractive method for industrial applications.
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