Lab Materials
Titanium Nitride (TiN) Sputtering Target / Powder / Wire / Block / Granule
Item Number : LM-TiN
Price varies based on specs and customizations
- Chemical Formula
- TiN
- Purity
- 2N5
- Shape
- discs / wire / block / powder / plates / column targets / step target / custom-made
Shipping:
Contact us to get shipping details Enjoy On-time Dispatch Guarantee.
We provide Titanium Nitride (TiN) materials for laboratory use at affordable prices. Our specialty lies in producing and customizing Titanium Nitride (TiN) materials of various purities, shapes, and sizes to meet your individual needs.
We offer a diverse selection of specifications and sizes for sputtering targets (circular, square, tubular, irregular), coating materials, cylinders, cones, particles, foils, powders, 3D printing powders, nanometer powders, wire rods, ingots, and blocks, among others.
Details
About Titanium Nitride (TiN)
Titanium Nitride is a readily available material, with high purity submicron and nanopowder forms also available. At our facility, we produce various high purity (99.999%) Titanium Nitride Sputtering Target standard grades, including Mil Spec (military grade), ACS, Reagent, Technical, Food, Agricultural, Pharmaceutical, Optical, USP, and EP/BP (European Pharmacopeia/British Pharmacopeia) grades. We follow applicable ASTM testing standards to ensure the quality of our materials.
To summarize, we offer a diverse range of high purity Titanium Nitride materials that meet various industry and application requirements. Our materials are produced with strict adherence to ASTM testing standards, ensuring consistent quality and performance.
Ingredient Quality Control
- Raw material composition analysis
- Through the use of equipment such as ICP and GDMS, the content of metal impurities is detected and analyzed to ensure that it meets the purity standard;
Non-metallic impurities are detected by equipment such as carbon and sulfur analyzers, nitrogen and oxygen analyzers. - Metallographic flaw detection analysis
- The target material is inspected using flaw detection equipment to ensure that there are no defects or shrinkage holes inside the product;
Through metallographic testing, the internal grain structure of the target material is analyzed to ensure that the grains are fine and dense. - Appearance and dimension inspection
- Product dimensions are measured using micrometers and precision calipers to ensure compliance with drawings;
The surface finish and cleanliness of the product are measured using a surface cleanliness meter.
Conventional Sputtering Target Sizes
- Preparation process
- hot isostatic pressing, vacuum melting, etc.
- Sputtering target shape
- plane sputtering target, multi-arc sputtering target, step sputtering target, special-shaped sputtering target
- Round sputtering target size
- Diameter: 25.4mm / 50mm / 50.8mm / 60mm / 76.2mm / 80mm / 100mm / 101.6mm / 152.4mm
Thickness: 3mm / 4mm / 5mm / 6mm / 6.35mm
Size can be customized. - Square sputtering target size
- 50×50×3mm / 100×100×4mm / 300×300×5mm, size can be customized
Available Metal Forms
Metal Forms Details
We manufacture almost all the metals listed on the periodic table in a wide range of forms and purities, as well as standard sizes and dimensions. We can also produce custom-made products to meet specific customer requirements, such as size, shape, surface area, composition, and more. The following list provides a sample of the forms we offer, but it is not exhaustive. If you need laboratory consumables, please contact us directly to request a quote.
- Flat/Planar Forms: Board, Film, Foil, Microfoil, Microleaf, Paper, Plate, Ribbon, Sheet, Strip, Tape, Wafer
- Preformed Shapes: Anodes, Balls, Bands, Bars, Boats, Bolts, Briquettes, Cathodes, Circles, Coils, Crucibles, Crystals, Cubes, Cups, Cylinders, Discs, Electrodes, Fibers, Filaments, Flanges, Grids, Lenses, Mandrels, Nuts, Parts, Prisms, Pucks, Rings, Rods, Shapes, Shields, Sleeves, Springs, Squares, Sputtering Targets, Sticks, Tubes, Washers, Windows, Wires
- Microsizes: Beads, Bits, Capsules, Chips, Coins, Dust, Flakes, Grains, Granules, Micropowder, Needles, Particles, Pebbles, Pellets, Pins, Pills, Powder, Shavings, Shot, Slugs, Spheres, Tablets
- Macrosizes: Billets, Chunks, Cuttings, Fragments, Ingots, Lumps, Nuggets, Pieces, Punchings, Rocks, Scraps, Segments, Turnings
- Porous and Semi-Porous: Fabric, Foam, Gauze, Honeycomb, Mesh, Sponge, Wool
- Nanoscale: Nanoparticles, Nanopowders, Nanofoils, Nanotubes, Nanorods, Nanoprisms
- Others: Concentrate, Ink, Paste, Precipitate, Residue, Samples, Specimens
KinTek specializes in the manufacturing of high-purity and ultra-high-purity materials with a purity range of 99.999% (5N), 99.9999% (6N), 99.99995% (6N5), and in some cases, up to 99.99999% (7N). Our materials are available in specific grades, including UP/UHP, semiconductor, electronic, deposition, fiber optic, and MBE grades. Our high-purity metals, oxides, and compounds are specifically crafted to meet the rigorous demands of high-technology applications and are ideal for use as dopants and precursor materials for thin film deposition, crystal growth of semiconductors, and synthesis of nanomaterials. These materials find use in advanced microelectronics, solar cells, fuel cells, optical materials, and other cutting-edge applications.
Packaging
We use vacuum packaging for our high-purity materials, and each material has specific packaging tailored to its unique characteristics. For instance, our Hf sputter target is externally tagged and labeled to facilitate efficient identification and quality control. We take great care to prevent any damage that could occur during storage or transportation.
4.8
out of
5
KINTEK SOLUTION's TiN sputtering target is the perfect choice for my lab. It delivers consistent results and has significantly improved the efficiency of our processes.
4.9
out of
5
The quality of KINTEK SOLUTION's TiN sputtering target is exceptional. It has enhanced the performance of our instruments and contributed to groundbreaking research.
4.7
out of
5
KINTEK SOLUTION's TiN sputtering target is an excellent investment for any laboratory. Its durability and reliability have exceeded our expectations.
4.8
out of
5
KINTEK SOLUTION's TiN sputtering target is a game-changer. It has enabled us to achieve remarkable results in our research and has set a new standard for quality.
4.7
out of
5
KINTEK SOLUTION's TiN sputtering target is a must-have for any laboratory seeking precision and accuracy. It has transformed our research capabilities.
4.9
out of
5
KINTEK SOLUTION's TiN sputtering target is a testament to their commitment to excellence. It has revolutionized our laboratory's capabilities and opened up new avenues for innovation.
4.6
out of
5
KINTEK SOLUTION's TiN sputtering target is a reliable workhorse in our lab. It has consistently delivered exceptional results, making it an indispensable tool.
4.8
out of
5
KINTEK SOLUTION's TiN sputtering target is a valuable asset to our laboratory. It has enabled us to push the boundaries of research and achieve groundbreaking results.
4.7
out of
5
KINTEK SOLUTION's TiN sputtering target is a game-changer. It has significantly improved the efficiency and accuracy of our research, leading to groundbreaking discoveries.
4.9
out of
5
KINTEK SOLUTION's TiN sputtering target is a remarkable product. It has transformed our laboratory's capabilities and enabled us to achieve exceptional results.
4.8
out of
5
KINTEK SOLUTION's TiN sputtering target is a testament to their dedication to quality. It has exceeded our expectations and has become an essential tool in our laboratory.
4.7
out of
5
KINTEK SOLUTION's TiN sputtering target is a valuable addition to our laboratory. It has enhanced the accuracy and reliability of our research, leading to significant breakthroughs.
4.9
out of
5
KINTEK SOLUTION's TiN sputtering target is a remarkable product. It has revolutionized our research capabilities and has enabled us to achieve groundbreaking results.
4.6
out of
5
KINTEK SOLUTION's TiN sputtering target is a reliable and cost-effective solution for our laboratory. It has enabled us to conduct groundbreaking research with exceptional precision.
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