Products Lab Consumables & Materials Lab Materials Titanium Silicon Alloy (TiSi) Sputtering Target / Powder / Wire / Block / Granule
Titanium Silicon Alloy (TiSi) Sputtering Target / Powder / Wire / Block / Granule

Lab Materials

Titanium Silicon Alloy (TiSi) Sputtering Target / Powder / Wire / Block / Granule

Item Number : LM-TiSi

Price varies based on specs and customizations


Chemical Formula
TiSi
Purity
3N
Commonly used ratio
Ti:Si= 1:2 at%
Shape
discs / wire / block / powder / plates / column targets / step target / custom-made
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Ingredient Quality Control

Raw material composition analysis
Through the use of equipment such as ICP and GDMS, the content of metal impurities is detected and analyzed to ensure that it meets the purity standard;

Non-metallic impurities are detected by equipment such as carbon and sulfur analyzers, nitrogen and oxygen analyzers.
Metallographic flaw detection analysis
The target material is inspected using flaw detection equipment to ensure that there are no defects or shrinkage holes inside the product;

Through metallographic testing, the internal grain structure of the target material is analyzed to ensure that the grains are fine and dense.
Appearance and dimension inspection
Product dimensions are measured using micrometers and precision calipers to ensure compliance with drawings;

The surface finish and cleanliness of the product are measured using a surface cleanliness meter.

Conventional Sputtering Target Sizes

Preparation process
hot isostatic pressing, vacuum melting, etc.
Sputtering target shape
plane sputtering target, multi-arc sputtering target, step sputtering target, special-shaped sputtering target
Round sputtering target size
Diameter: 25.4mm / 50mm / 50.8mm / 60mm / 76.2mm / 80mm / 100mm / 101.6mm / 152.4mm
Thickness: 3mm / 4mm / 5mm / 6mm / 6.35mm
Size can be customized.
Square sputtering target size
50×50×3mm / 100×100×4mm / 300×300×5mm, size can be customized

Available Metal Forms

Metal Forms Details

We manufacture almost all the metals listed on the periodic table in a wide range of forms and purities, as well as standard sizes and dimensions. We can also produce custom-made products to meet specific customer requirements, such as size, shape, surface area, composition, and more. The following list provides a sample of the forms we offer, but it is not exhaustive. If you need laboratory consumables, please contact us directly to request a quote.

  • Flat/Planar Forms: Board, Film, Foil, Microfoil, Microleaf, Paper, Plate, Ribbon, Sheet, Strip, Tape, Wafer
  • Preformed Shapes: Anodes, Balls, Bands, Bars, Boats, Bolts, Briquettes, Cathodes, Circles, Coils, Crucibles, Crystals, Cubes, Cups, Cylinders, Discs, Electrodes, Fibers, Filaments, Flanges, Grids, Lenses, Mandrels, Nuts, Parts, Prisms, Pucks, Rings, Rods, Shapes, Shields, Sleeves, Springs, Squares, Sputtering Targets, Sticks, Tubes, Washers, Windows, Wires
  • Microsizes: Beads, Bits, Capsules, Chips, Coins, Dust, Flakes, Grains, Granules, Micropowder, Needles, Particles, Pebbles, Pellets, Pins, Pills, Powder, Shavings, Shot, Slugs, Spheres, Tablets
  • Macrosizes: Billets, Chunks, Cuttings, Fragments, Ingots, Lumps, Nuggets, Pieces, Punchings, Rocks, Scraps, Segments, Turnings
  • Porous and Semi-Porous: Fabric, Foam, Gauze, Honeycomb, Mesh, Sponge, Wool
  • Nanoscale: Nanoparticles, Nanopowders, Nanofoils, Nanotubes, Nanorods, Nanoprisms
  • Others: Concentrate, Ink, Paste, Precipitate, Residue, Samples, Specimens

KinTek specializes in the manufacturing of high-purity and ultra-high-purity materials with a purity range of 99.999% (5N), 99.9999% (6N), 99.99995% (6N5), and in some cases, up to 99.99999% (7N). Our materials are available in specific grades, including UP/UHP, semiconductor, electronic, deposition, fiber optic, and MBE grades. Our high-purity metals, oxides, and compounds are specifically crafted to meet the rigorous demands of high-technology applications and are ideal for use as dopants and precursor materials for thin film deposition, crystal growth of semiconductors, and synthesis of nanomaterials. These materials find use in advanced microelectronics, solar cells, fuel cells, optical materials, and other cutting-edge applications.

Packaging

We use vacuum packaging for our high-purity materials, and each material has specific packaging tailored to its unique characteristics. For instance, our Hf sputter target is externally tagged and labeled to facilitate efficient identification and quality control. We take great care to prevent any damage that could occur during storage or transportation.

FAQ

What Is Sputtering Target?

A sputtering target is a material used in the process of sputter deposition, which involves breaking up the target material into tiny particles that form a spray and coat a substrate, such as a silicon wafer. Sputtering targets are typically metallic elements or alloys, although some ceramic targets are available. They come in a variety of sizes and shapes, with some manufacturers creating segmented targets for larger sputtering equipment. Sputtering targets have a wide range of applications in fields such as microelectronics, thin film solar cells, optoelectronics, and decorative coatings due to their ability to deposit thin films with high precision and uniformity.

What Are High Purity Materials?

High purity materials refer to substances that are free from impurities and possess a high level of chemical homogeneity. These materials are essential in various industries, particularly in the field of advanced electronics, where impurities can significantly affect the performance of devices. High purity materials are obtained through various methods, including chemical purification, vapor-phase deposition, and zone refining. In the preparation of electronic grade single crystal diamond, for example, a high-purity raw material gas and an efficient vacuum system are necessary to achieve the desired level of purity and homogeneity.

How Are Sputtering Targets Made?

Sputtering targets are made using a variety of manufacturing processes depending on the properties of the target material and its application. These include vacuum melting and rolling, hot-pressed, special press-sintered process, vacuum hot-pressed, and forged methods. Most sputtering target materials can be fabricated into a wide range of shapes and sizes, with circular or rectangular shapes being the most common. Targets are usually made from metallic elements or alloys, but ceramic targets can also be used. Compound sputtering targets are also available, made from a variety of compounds including oxides, nitrides, borides, sulphides, selenides, tellurides, carbides, crystalline, and composite mixtures.

What Is Sputtering Target Used For?

Sputtering targets are used in a process called sputtering to deposit thin films of a material onto a substrate using ions to bombard the target. These targets have a wide range of applications in various fields, including microelectronics, thin film solar cells, optoelectronics, and decorative coatings. They allow for the deposition of thin films of materials onto a variety of substrates with high precision and uniformity, making them an ideal tool for producing precision products. Sputtering targets come in various shapes and sizes and can be specialized to meet the specific requirements of the application.

What Are Sputtering Targets For Electronics?

Sputtering targets for electronics are thin discs or sheets of materials such as aluminum, copper, and titanium that are used to deposit thin films onto silicon wafers to create electronic devices like transistors, diodes, and integrated circuits. These targets are used in a process called sputtering, in which atoms of the target material are physically ejected from the surface and deposited onto a substrate by bombarding the target with ions. Sputtering targets for electronics are essential in the production of microelectronics and typically require high precision and uniformity to ensure quality devices.

What Is The Lifetime Of A Sputtering Target?

The lifetime of a sputtering target depends on factors such as the material composition, purity, and the specific application it is being used for. Generally, targets can last for several hundred to a few thousand hours of sputtering, but this can vary widely depending on the specific conditions of each run. Proper handling and maintenance can also extend the lifetime of a target. In addition, the use of rotary sputtering targets can increase runtimes and reduce the occurrence of defects, making them a more cost-effective option for high volume processes.
View more faqs for this product

4.8

out of

5

KINTEK SOLUTION's TiSi Sputtering Target offers exceptional quality at a competitive price. The customizable options for purity, shape, and size make it an excellent choice for various applications.

Antonina Tkachenko

4.9

out of

5

I'm impressed with the purity and consistency of KINTEK SOLUTION's TiSi materials. They have consistently met our strict quality standards, making them a reliable partner for our research.

Yusuf Tunc

4.7

out of

5

The Titanium Silicon Alloy from KINTEK SOLUTION has proven to be a valuable addition to our lab. Its versatility and availability in various forms have made it a go-to material for multiple projects.

Carla Goncalves

4.9

out of

5

Working with KINTEK SOLUTION has been a pleasure. Their expertise in tailoring TiSi materials to our specific requirements has enabled us to achieve exceptional results in our research.

Damien Dubois

4.6

out of

5

KINTEK SOLUTION's TiSi Sputtering Target has significantly improved the quality of our thin films. The low particle counts have resulted in smoother and more uniform coatings.

Elisa Russo

4.8

out of

5

The customizable packaging options offered by KINTEK SOLUTION are a lifesaver. We can easily receive TiSi in forms that perfectly suit our experimental setups, saving us time and resources.

Javier Hernandez

4.7

out of

5

The Titanium Silicon Alloy from KINTEK SOLUTION has proven to be a reliable material for our CVD and PVD applications. Its consistent quality ensures repeatable and successful experiments.

Anna Kowalska

4.9

out of

5

KINTEK SOLUTION's TiSi Sputtering Target has enabled us to achieve exceptional results in our research. The high purity and fine grain structure have contributed to the superior performance of our devices.

Peter Schmidt

4.6

out of

5

The technical support provided by KINTEK SOLUTION is outstanding. Their experts have guided us through every step of the process, ensuring successful implementation of TiSi materials in our laboratory.

Maria Rodriguez

4.8

out of

5

KINTEK SOLUTION's TiSi materials have met all our expectations. The fast delivery and responsive customer service have made working with them a seamless and enjoyable experience.

Ahmed Ali

4.7

out of

5

The Titanium Silicon Alloy from KINTEK SOLUTION has proven to be a cost-effective option for our research. Its durability and longevity have reduced our material consumption and saved us money.

Olivia Dubois

4.9

out of

5

The technological advancements incorporated into KINTEK SOLUTION's TiSi materials have enabled us to explore new possibilities in our research. Their commitment to innovation is truly commendable.

Lucas Silva

4.6

out of

5

I highly recommend KINTEK SOLUTION for their reliable and high-quality TiSi materials. Their products have consistently met our stringent requirements, making them an invaluable asset to our laboratory.

Elena Petrova

PDF - Titanium Silicon Alloy (TiSi) Sputtering Target / Powder / Wire / Block / Granule

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Catalog of Lab Materials

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Catalog of Sputtering Targets

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Catalog of High Purity Materials

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