Lab Materials

High Purity Silicon (Si) Sputtering Target / Powder / Wire / Block / Granule

Name: High Purity Silicon (Si) Sputtering Target / Powder / Wire / Block / Granule
Brand: Kintek Solution
SKU: LM-SI
Rating: 4.76 (12 reviews)

Item Number : LM-SI

Price varies based on specs and customizations

Chemical Formula: Si
Purity: 5N-6N
Shape: discs / wire / block / powder / plates / column targets / step target / custom-made

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We are pleased to offer Silicon (Si) materials for laboratory use at competitive prices. Our specialty lies in producing and customizing Silicon (Si) materials with various purities, shapes, and sizes to meet your specific needs.

We offer a diverse selection of specifications and sizes for sputtering targets (circular, square, tubular, irregular), coating materials, cylinders, cones, particles, foils, powders, 3D printing powders, nanometer powders, wire rods, ingots, and blocks, among others.

Details

About Silicon (Si)

Silica, in the form of sand, is a crucial component of glass, which boasts excellent mechanical, optical, thermal, and electrical properties.

In the electronics industry, ultra-high-purity silicon doped with boron, gallium, phosphorus, or arsenic is extensively used to produce transistors, solar cells, rectifiers, and other solid-state devices.

Silicones, a wide range of synthetic polymers, are important silicon products with various forms, ranging from liquids to hard, glass-like solids with many beneficial properties.

Metallic silicon is available in various purities, ranging from 99% to 99.999% (ACS grade to ultra-high purity) in forms such as pellets, rods, wires, and granules for evaporation source materials.

Silicon oxide, in powder and dense pellet forms, is available for applications such as optical coating and thin film applications. Silicon fluoride, which is insoluble and free from oxide, is ideal for metallurgy, physical and chemical vapor deposition, and certain optical coatings.

Soluble forms of silicon, such as chlorides and acetates, can be synthesized as solutions at specific stoichiometries.

Ingredient Quality Control

Raw material composition analysis: Through the use of equipment such as ICP and GDMS, the content of metal impurities is detected and analyzed to ensure that it meets the purity standard;

Non-metallic impurities are detected by equipment such as carbon and sulfur analyzers, nitrogen and oxygen analyzers.
Metallographic flaw detection analysis: The target material is inspected using flaw detection equipment to ensure that there are no defects or shrinkage holes inside the product;

Through metallographic testing, the internal grain structure of the target material is analyzed to ensure that the grains are fine and dense.
Appearance and dimension inspection: Product dimensions are measured using micrometers and precision calipers to ensure compliance with drawings;

The surface finish and cleanliness of the product are measured using a surface cleanliness meter.

Conventional Sputtering Target Sizes

Preparation process: hot isostatic pressing, vacuum melting, etc.
Sputtering target shape: plane sputtering target, multi-arc sputtering target, step sputtering target, special-shaped sputtering target
Round sputtering target size: Diameter: 25.4mm / 50mm / 50.8mm / 60mm / 76.2mm / 80mm / 100mm / 101.6mm / 152.4mm
Thickness: 3mm / 4mm / 5mm / 6mm / 6.35mm
Size can be customized.
Square sputtering target size: 50×50×3mm / 100×100×4mm / 300×300×5mm, size can be customized

Available Metal Forms

Metal Forms Details

We manufacture almost all the metals listed on the periodic table in a wide range of forms and purities, as well as standard sizes and dimensions. We can also produce custom-made products to meet specific customer requirements, such as size, shape, surface area, composition, and more. The following list provides a sample of the forms we offer, but it is not exhaustive. If you need laboratory consumables, please contact us directly to request a quote.

Flat/Planar Forms: Board, Film, Foil, Microfoil, Microleaf, Paper, Plate, Ribbon, Sheet, Strip, Tape, Wafer
Preformed Shapes: Anodes, Balls, Bands, Bars, Boats, Bolts, Briquettes, Cathodes, Circles, Coils, Crucibles, Crystals, Cubes, Cups, Cylinders, Discs, Electrodes, Fibers, Filaments, Flanges, Grids, Lenses, Mandrels, Nuts, Parts, Prisms, Pucks, Rings, Rods, Shapes, Shields, Sleeves, Springs, Squares, Sputtering Targets, Sticks, Tubes, Washers, Windows, Wires
Microsizes: Beads, Bits, Capsules, Chips, Coins, Dust, Flakes, Grains, Granules, Micropowder, Needles, Particles, Pebbles, Pellets, Pins, Pills, Powder, Shavings, Shot, Slugs, Spheres, Tablets
Macrosizes: Billets, Chunks, Cuttings, Fragments, Ingots, Lumps, Nuggets, Pieces, Punchings, Rocks, Scraps, Segments, Turnings
Porous and Semi-Porous: Fabric, Foam, Gauze, Honeycomb, Mesh, Sponge, Wool
Nanoscale: Nanoparticles, Nanopowders, Nanofoils, Nanotubes, Nanorods, Nanoprisms
Others: Concentrate, Ink, Paste, Precipitate, Residue, Samples, Specimens

KinTek specializes in the manufacturing of high-purity and ultra-high-purity materials with a purity range of 99.999% (5N), 99.9999% (6N), 99.99995% (6N5), and in some cases, up to 99.99999% (7N). Our materials are available in specific grades, including UP/UHP, semiconductor, electronic, deposition, fiber optic, and MBE grades. Our high-purity metals, oxides, and compounds are specifically crafted to meet the rigorous demands of high-technology applications and are ideal for use as dopants and precursor materials for thin film deposition, crystal growth of semiconductors, and synthesis of nanomaterials. These materials find use in advanced microelectronics, solar cells, fuel cells, optical materials, and other cutting-edge applications.

Packaging

We use vacuum packaging for our high-purity materials, and each material has specific packaging tailored to its unique characteristics. For instance, our Hf sputter target is externally tagged and labeled to facilitate efficient identification and quality control. We take great care to prevent any damage that could occur during storage or transportation.

FAQ

What are high purity materials?

High purity materials refer to substances that are free from impurities and possess a high level of chemical homogeneity. These materials are essential in various industries, particularly in the field of advanced electronics, where impurities can significantly affect the performance of devices. High purity materials are obtained through various methods, including chemical purification, vapor-phase deposition, and zone refining. In the preparation of electronic grade single crystal diamond, for example, a high-purity raw material gas and an efficient vacuum system are necessary to achieve the desired level of purity and homogeneity.

What are high purity metals?

High purity metals are single element materials with minimal impurities, making them ideal for use in research, development, and production of advanced technologies. These metals are used in the creation of advanced ceramics, electronic sensors, high-precision lenses and optics, LEDs, lasers, thermal barrier coatings, plasma screens, and more. KINTEK offers a diverse range of high-purity metals and binary and ternary metal compounds in various forms, compositions, dispersions, particle sizes, and weights for research and commercial applications. Strategic special metals are used in high-tech applications and can be expensive due to their elaborate processing.

What is RF PECVD?

RF PECVD stands for radio-frequency plasma-enhanced chemical vapor deposition, which is a technique used to prepare polycrystalline films on a substrate by using glow discharge plasma to influence the process while low pressure chemical vapor deposition is taking place. The RF PECVD method is well established for standard silicon-integrated-circuit technology, where typically flat wafers are used as the substrates. This method is advantageous due to the possibility of low-cost film fabrication and high efficiency of deposition. Materials can also be deposited as graded-refractive-index films or as a stack of nano-films each with different properties.

What is sputtering target?

A sputtering target is a material used in the process of sputter deposition, which involves breaking up the target material into tiny particles that form a spray and coat a substrate, such as a silicon wafer. Sputtering targets are typically metallic elements or alloys, although some ceramic targets are available. They come in a variety of sizes and shapes, with some manufacturers creating segmented targets for larger sputtering equipment. Sputtering targets have a wide range of applications in fields such as microelectronics, thin film solar cells, optoelectronics, and decorative coatings due to their ability to deposit thin films with high precision and uniformity.

What are high purity metals used for?

High purity metals are used in various advanced technologies that require specific properties, performance and quality. They are used to create fluorescent lighting, plasma screens, LEDs, high-precision lenses and optics, electronic sensors, advanced ceramics, thermal barrier coatings, lasers, and more. These metals are also used in the production of high-quality magnetic, thermoelectric, phosphor and semiconducting materials. KINTEK offers a diverse portfolio of high-purity metals, binary and ternary metal compounds, magnetic alloys, metal oxides, nanomaterials, and organometallic precursors in various forms, compositions, dispersions, particle sizes and weights for all research and commercial applications.

How does RF PECVD work?

RF PECVD works by creating a plasma in a vacuum chamber. The precursor gas is introduced into the chamber, and radio frequency power is applied to create an electric field. This electric field results in the ionization of the precursor gas, forming a plasma. The plasma contains reactive species that can chemically react with the substrate surface, leading to the deposition of a thin film. The RF power also helps to control the energy of the plasma, allowing for better control over film properties such as composition, uniformity, and adhesion. The process parameters, such as gas flow rates, pressure, and RF power, can be adjusted to optimize the film deposition process.

How are sputtering targets made?

Sputtering targets are made using a variety of manufacturing processes depending on the properties of the target material and its application. These include vacuum melting and rolling, hot-pressed, special press-sintered process, vacuum hot-pressed, and forged methods. Most sputtering target materials can be fabricated into a wide range of shapes and sizes, with circular or rectangular shapes being the most common. Targets are usually made from metallic elements or alloys, but ceramic targets can also be used. Compound sputtering targets are also available, made from a variety of compounds including oxides, nitrides, borides, sulphides, selenides, tellurides, carbides, crystalline, and composite mixtures.

What are the benefits of using high-purity metals?

Using high-purity metals offers several benefits. First, they provide consistent and reliable performance due to the absence of impurities that can cause variations in material properties. Second, high-purity metals enable the production of high-quality and high-performance products, ensuring better functionality and durability. Third, their low impurity levels reduce the risk of contamination in sensitive applications. High-purity metals also exhibit improved electrical conductivity, thermal conductivity, and corrosion resistance. Additionally, they are often preferred for their enhanced adhesion properties, making them suitable for various coating and thin film deposition processes.

What are the advantages of RF PECVD?

RF PECVD offers several advantages for thin film deposition. Firstly, it allows for the deposition of high-quality films with excellent control over film properties such as thickness, composition, and uniformity. The use of a plasma enhances the reactivity of the process, enabling the deposition of films at lower temperatures compared to traditional thermal CVD methods. RF PECVD also offers better step coverage, allowing for the deposition of films in high aspect ratio structures. Another advantage is the ability to deposit a wide range of materials, including silicon nitride, silicon dioxide, amorphous silicon, and various other thin film materials. The process is highly scalable and can be easily integrated into existing manufacturing processes. Additionally, RF PECVD is a relatively cost-effective method compared to other thin film deposition techniques.

What is sputtering target used for?

Sputtering targets are used in a process called sputtering to deposit thin films of a material onto a substrate using ions to bombard the target. These targets have a wide range of applications in various fields, including microelectronics, thin film solar cells, optoelectronics, and decorative coatings. They allow for the deposition of thin films of materials onto a variety of substrates with high precision and uniformity, making them an ideal tool for producing precision products. Sputtering targets come in various shapes and sizes and can be specialized to meet the specific requirements of the application.

Which industries commonly use high-purity metals?

High-purity metals find application in a wide range of industries. The semiconductor and electronics industries extensively use high-purity metals for integrated circuits, microprocessors, and other electronic components. The aerospace industry relies on high-purity metals for their lightweight and high-strength properties. Optics and photovoltaic industries utilize high-purity metals for precision optics and solar cells. High-purity metals also play a significant role in medical devices, automotive components, research laboratories, and advanced manufacturing processes.

What are sputtering targets for electronics?

Sputtering targets for electronics are thin discs or sheets of materials such as aluminum, copper, and titanium that are used to deposit thin films onto silicon wafers to create electronic devices like transistors, diodes, and integrated circuits. These targets are used in a process called sputtering, in which atoms of the target material are physically ejected from the surface and deposited onto a substrate by bombarding the target with ions. Sputtering targets for electronics are essential in the production of microelectronics and typically require high precision and uniformity to ensure quality devices.

What is the lifetime of a sputtering target?

The lifetime of a sputtering target depends on factors such as the material composition, purity, and the specific application it is being used for. Generally, targets can last for several hundred to a few thousand hours of sputtering, but this can vary widely depending on the specific conditions of each run. Proper handling and maintenance can also extend the lifetime of a target. In addition, the use of rotary sputtering targets can increase runtimes and reduce the occurrence of defects, making them a more cost-effective option for high volume processes.

View more faqs for this product

4.8

out of

5

The quality of the silicon sputtering targets is excellent. The delivery was very quick and the customer service was responsive and helpful.

Maxence Michaud

4.7

out of

5

Kintek Solution's silicon sputtering targets are of the highest quality. They are durable and provide excellent results.

Elifnur Kılıç

4.9

out of

5

I have been using Kintek Solution's silicon sputtering targets for years and have always been impressed with their quality and performance. They are a great value for the price.

Dr. Eleni Apostolakis

4.6

out of

5

Kintek Solution's silicon sputtering targets are very reliable and have a long lifespan. I highly recommend them to anyone in need of high-quality sputtering targets.

Dr. Ricardo Pinto

4.8

out of

5

Kintek Solution's silicon sputtering targets are a great choice for researchers and engineers who need high-quality materials. They are easy to use and provide excellent results.

Prof. Dr. Toshihiko Naka

4.7

out of

5

I have been using Kintek Solution's silicon sputtering targets for my research for several years. They are consistently high quality and have helped me to achieve excellent results.

Dr. Drahomír Opatrný

4.9

out of

5

Kintek Solution's silicon sputtering targets are the best I have ever used. They are incredibly durable and produce very consistent results.

Dr. Maria José Ferreira

4.7

out of

5

I am very satisfied with Kintek Solution's silicon sputtering targets. They are a great value for the price and have helped me to improve the quality of my research.

Dr. Andres Pavez

4.8

out of

5

Kintek Solution's silicon sputtering targets are an essential part of my research. They are very reliable and have helped me to achieve breakthroughs in my field.

Prof. Dr. José Ruiz

4.6

out of

5

I have been using Kintek Solution's silicon sputtering targets for years and have always been impressed with their quality and performance. They are a great choice for anyone looking for high-quality sputtering targets.

Dr. Maria João Coelho

4.7

out of

5

Kintek Solution's silicon sputtering targets are the best I have ever used. They are very durable and have helped me to save time and money in my research.

Dr. Samuel Brunet

4.9

out of

5

I am very happy with Kintek Solution's silicon sputtering targets. They are a great value for the price and have helped me to improve the quality of my work.

Dr. Ana Sofia Ferreira

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High Purity Silicon (Si) Sputtering Target / Powder / Wire / Block / Granule

Shipping:

Details

About Silicon (Si)

Ingredient Quality Control

Conventional Sputtering Target Sizes

Available Metal Forms

Metal Forms Details

Packaging

FAQ

What are high purity materials?

What are high purity metals?

What is RF PECVD?

What is sputtering target?

What are high purity metals used for?

How does RF PECVD work?

How are sputtering targets made?

What are the benefits of using high-purity metals?

What are the advantages of RF PECVD?

What is sputtering target used for?

Which industries commonly use high-purity metals?

What are sputtering targets for electronics?

What is the lifetime of a sputtering target?

PDF - High Purity Silicon (Si) Sputtering Target / Powder / Wire / Block / Granule

Catalog of Lab Materials

Catalog of High Purity Materials

Catalog of High Pure Metals

Catalog of Rf Pecvd

Catalog of Sputtering Targets

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