Lab Materials
Nickel Silicon Alloy (NiSi) Sputtering Target / Powder / Wire / Block / Granule
Item Number : LM-NiSi
Price varies based on specs and customizations
- Chemical Formula
- NiSi
- Purity
- 2N5
- Commonly Used Ratio
- Si:Ni=1:1 at%
- Shape
- discs / wire / block / powder / plates / column targets / step target / custom-made
Shipping:
Contact us to get shipping details Enjoy On-time Dispatch Guarantee.
We provide Nickel Silicon Alloy materials for laboratory use at reasonable prices. Our expertise lies in producing and tailoring these materials of different purities, shapes, and sizes to suit your unique requirements.
We offer a diverse range of specifications and sizes for sputtering targets (circular, square, tubular, irregular shapes), coating materials, cylinders, cones, particles, foils, powders, 3D printing powders, nanometer powders, wire rods, ingots, blocks, and more.
Details
About Nickel Silicon Alloy (NiSi)
Nickel-Silicon available in various forms to suit your needs. These forms include powder, bar, ingot, ribbon, wire, shot, sheet, and foil.
Moreover, there are ultra-high purity and high purity forms of Nickel-Silicon available, such as metal powder, submicron powder, and nanoscale particles. These forms are ideal for applications requiring precise thin film deposition, and you can obtain them as sputtering targets or pellets for CVD and PVD applications.
Ingredient Quality Control
- Raw material composition analysis
- Through the use of equipment such as ICP and GDMS, the content of metal impurities is detected and analyzed to ensure that it meets the purity standard;
Non-metallic impurities are detected by equipment such as carbon and sulfur analyzers, nitrogen and oxygen analyzers. - Metallographic flaw detection analysis
- The target material is inspected using flaw detection equipment to ensure that there are no defects or shrinkage holes inside the product;
Through metallographic testing, the internal grain structure of the target material is analyzed to ensure that the grains are fine and dense. - Appearance and dimension inspection
- Product dimensions are measured using micrometers and precision calipers to ensure compliance with drawings;
The surface finish and cleanliness of the product are measured using a surface cleanliness meter.
Conventional Sputtering Target Sizes
- Preparation process
- hot isostatic pressing, vacuum melting, etc.
- Sputtering target shape
- plane sputtering target, multi-arc sputtering target, step sputtering target, special-shaped sputtering target
- Round sputtering target size
- Diameter: 25.4mm / 50mm / 50.8mm / 60mm / 76.2mm / 80mm / 100mm / 101.6mm / 152.4mm
Thickness: 3mm / 4mm / 5mm / 6mm / 6.35mm
Size can be customized. - Square sputtering target size
- 50×50×3mm / 100×100×4mm / 300×300×5mm, size can be customized
Available Metal Forms
Metal Forms Details
We manufacture almost all the metals listed on the periodic table in a wide range of forms and purities, as well as standard sizes and dimensions. We can also produce custom-made products to meet specific customer requirements, such as size, shape, surface area, composition, and more. The following list provides a sample of the forms we offer, but it is not exhaustive. If you need laboratory consumables, please contact us directly to request a quote.
- Flat/Planar Forms: Board, Film, Foil, Microfoil, Microleaf, Paper, Plate, Ribbon, Sheet, Strip, Tape, Wafer
- Preformed Shapes: Anodes, Balls, Bands, Bars, Boats, Bolts, Briquettes, Cathodes, Circles, Coils, Crucibles, Crystals, Cubes, Cups, Cylinders, Discs, Electrodes, Fibers, Filaments, Flanges, Grids, Lenses, Mandrels, Nuts, Parts, Prisms, Pucks, Rings, Rods, Shapes, Shields, Sleeves, Springs, Squares, Sputtering Targets, Sticks, Tubes, Washers, Windows, Wires
- Microsizes: Beads, Bits, Capsules, Chips, Coins, Dust, Flakes, Grains, Granules, Micropowder, Needles, Particles, Pebbles, Pellets, Pins, Pills, Powder, Shavings, Shot, Slugs, Spheres, Tablets
- Macrosizes: Billets, Chunks, Cuttings, Fragments, Ingots, Lumps, Nuggets, Pieces, Punchings, Rocks, Scraps, Segments, Turnings
- Porous and Semi-Porous: Fabric, Foam, Gauze, Honeycomb, Mesh, Sponge, Wool
- Nanoscale: Nanoparticles, Nanopowders, Nanofoils, Nanotubes, Nanorods, Nanoprisms
- Others: Concentrate, Ink, Paste, Precipitate, Residue, Samples, Specimens
KinTek specializes in the manufacturing of high-purity and ultra-high-purity materials with a purity range of 99.999% (5N), 99.9999% (6N), 99.99995% (6N5), and in some cases, up to 99.99999% (7N). Our materials are available in specific grades, including UP/UHP, semiconductor, electronic, deposition, fiber optic, and MBE grades. Our high-purity metals, oxides, and compounds are specifically crafted to meet the rigorous demands of high-technology applications and are ideal for use as dopants and precursor materials for thin film deposition, crystal growth of semiconductors, and synthesis of nanomaterials. These materials find use in advanced microelectronics, solar cells, fuel cells, optical materials, and other cutting-edge applications.
Packaging
We use vacuum packaging for our high-purity materials, and each material has specific packaging tailored to its unique characteristics. For instance, our Hf sputter target is externally tagged and labeled to facilitate efficient identification and quality control. We take great care to prevent any damage that could occur during storage or transportation.
FAQ
What is Physical vapor deposition (PVD)?
What is sputtering target?
What are high purity materials?
What is magnetron sputtering?
How are sputtering targets made?
Why magnetron sputtering?
What is sputtering target used for?
What are the materials used in thin film deposition?
Thin film deposition commonly utilizes metals, oxides, and compounds as materials, each with its unique advantages and disadvantages. Metals are preferred for their durability and ease of deposition but are relatively expensive. Oxides are highly durable, can withstand high temperatures, and can be deposited at low temperatures, but can be brittle and challenging to work with. Compounds offer strength and durability, can be deposited at low temperatures and tailored to exhibit specific properties.
The selection of material for a thin film coating is dependent on the application requirements. Metals are ideal for thermal and electrical conduction, while oxides are effective in offering protection. Compounds can be tailored to suit specific needs. Ultimately, the best material for a particular project will depend on the specific needs of the application.
What are sputtering targets for electronics?
What are the methods to achieve optimal thin film deposition?
To achieve thin films with desirable properties, high-quality sputtering targets and evaporation materials are essential. The quality of these materials can be influenced by various factors, such as purity, grain size, and surface condition.
The purity of sputtering targets or evaporation materials plays a crucial role, as impurities can cause defects in the resulting thin film. Grain size also affects the quality of the thin film, with larger grains leading to poor film properties. Additionally, the surface condition is crucial, since rough surfaces can result in defects in the film.
To attain the highest quality sputtering targets and evaporation materials, it is crucial to select materials that possess high purity, small grain size, and smooth surfaces.
Uses of Thin Film Deposition
Zinc Oxide-Based Thin Films
ZnO thin films find applications in several industries such as thermal, optical, magnetic, and electrical, but their primary use is in coatings and semiconductor devices.
Thin-Film Resistors
Thin-film resistors are crucial for modern technology and are used in radio receivers, circuit boards, computers, radiofrequency devices, monitors, wireless routers, Bluetooth modules, and cell phone receivers.
Magnetic Thin Films
Magnetic thin films are used in electronics, data storage, radio-frequency identification, microwave devices, displays, circuit boards, and optoelectronics as key components.
Optical Thin Films
Optical coatings and optoelectronics are standard applications of optical thin films. Molecular beam epitaxy can produce optoelectronic thin-film devices (semiconductors), where epitaxial films are deposited one atom at a time onto the substrate.
Polymer Thin Films
Polymer thin films are used in memory chips, solar cells, and electronic devices. Chemical deposition techniques (CVD) offer precise control of polymer film coatings, including conformance and coating thickness.
Thin-Film Batteries
Thin-film batteries power electronic devices such as implantable medical devices, and the lithium-ion battery has advanced significantly thanks to the use of thin films.
Thin-Film Coatings
Thin-film coatings enhance the chemical and mechanical characteristics of target materials in various industries and technological fields. Anti-reflective coatings, anti-ultraviolet or anti-infrared coatings, anti-scratch coatings, and lens polarization are some common examples.
Thin-Film Solar Cells
Thin-film solar cells are essential to the solar energy industry, enabling the production of relatively cheap and clean electricity. Photovoltaic systems and thermal energy are the two main applicable technologies.
What is the lifetime of a sputtering target?
Factors and Parameters that Influence Deposition of Thin Films
Deposition Rate:
The rate at which the film is produced, typically measured in thickness divided by time, is crucial for selecting a technology suitable for the application. Moderate deposition rates are sufficient for thin films, while quick deposition rates are necessary for thick films. It is important to strike a balance between speed and precise film thickness control.
Uniformity:
The consistency of the film across the substrate is known as uniformity, which usually refers to film thickness but can also relate to other properties such as the index of refraction. It is important to have a good understanding of the application to avoid under- or over-specifying uniformity.
Fill Capability:
Fill capability or step coverage refers to how well the deposition process covers the substrate's topography. The deposition method used (e.g., CVD, PVD, IBD, or ALD) has a significant impact on step coverage and fill.
Film Characteristics:
The characteristics of the film depend on the application's requirements, which can be categorized as photonic, optical, electronic, mechanical, or chemical. Most films must meet requirements in more than one category.
Process Temperature:
Film characteristics are significantly affected by process temperature, which may be limited by the application.
Damage:
Each deposition technology has the potential to damage the material being deposited upon, with smaller features being more susceptible to process damage. Pollution, UV radiation, and ion bombardment are among the potential sources of damage. It is crucial to understand the limitations of the materials and tools.
4.8
out of
5
The nickel silicon alloy sputtering targets are of exceptional quality, ensuring precise thin film deposition.
4.9
out of
5
I highly recommend KINTEK SOLUTION for their prompt delivery and outstanding customer service. Their nickel silicon alloy sputtering targets are top-notch.
4.7
out of
5
KINTEK SOLUTION provides nickel silicon alloy sputtering targets that are not only durable but also cost-effective. They are a reliable supplier.
4.6
out of
5
The nickel silicon alloy sputtering targets from KINTEK SOLUTION have consistently met our laboratory's demands for high-quality thin film deposition.
4.8
out of
5
KINTEK SOLUTION's nickel silicon alloy sputtering targets are a testament to their commitment to innovation and technological advancement.
4.9
out of
5
The purity and consistency of KINTEK SOLUTION's nickel silicon alloy sputtering targets are remarkable. They are a valuable asset to our laboratory.
4.7
out of
5
KINTEK SOLUTION's nickel silicon alloy sputtering targets have proven to be durable and reliable in our laboratory's demanding environment.
4.6
out of
5
The nickel silicon alloy sputtering targets from KINTEK SOLUTION offer excellent value for money. They are a cost-effective solution for our laboratory.
4.8
out of
5
KINTEK SOLUTION's nickel silicon alloy sputtering targets have enabled us to achieve precise and consistent thin film deposition results.
4.9
out of
5
We have been consistently impressed with the quality and performance of KINTEK SOLUTION's nickel silicon alloy sputtering targets.
4.7
out of
5
KINTEK SOLUTION's nickel silicon alloy sputtering targets are a testament to their commitment to customer satisfaction. They are a reliable supplier.
4.6
out of
5
The nickel silicon alloy sputtering targets from KINTEK SOLUTION have met all our expectations for quality and reliability.
4.8
out of
5
KINTEK SOLUTION's nickel silicon alloy sputtering targets have enabled us to push the boundaries of thin film deposition technology.
4.9
out of
5
The nickel silicon alloy sputtering targets from KINTEK SOLUTION are a valuable addition to our laboratory. They have helped us achieve remarkable results.
REQUEST A QUOTE
Our professional team will reply to you within one business day. Please feel free to contact us!
Related Products
Nickel Niobium Alloy (NiNb) Sputtering Target / Powder / Wire / Block / Granule
Find high-quality Nickel Niobium Alloy (NiNb) materials for your laboratory needs. We offer tailored purities, shapes, and sizes, plus sputtering targets, coatings, powders, and more. Explore our range now!
Titanium Nickel Silver Alloy (TiNiAg) Sputtering Target / Powder / Wire / Block / Granule
Looking for customizable TiNiAg materials? We offer a wide range of sizes and purities at competitive prices, including sputtering targets, coating materials, powders, and more. Contact us today!
Nickel Aluminum Alloy (NiAl) Sputtering Target / Powder / Wire / Block / Granule
Looking for high-quality Nickel Aluminum Alloy materials for your lab? Our experts produce and customize NiAl materials to suit your specific needs. Find a wide range of sizes and specifications for sputtering targets, coating materials, and more at affordable prices.
Silicon Nitride (Si3N4) Sputtering Target / Powder / Wire / Block / Granule
Get affordable Silicon Nitride (Si3N4) materials for your lab needs. We produce and customize various shapes, sizes, and purities to fit your requirements. Browse our range of sputtering targets, powders, and more.
Carbon paper/cloth Diaphragm Copper/aluminum foil and other professional cutting tools
Professional tools for cutting lithium sheets, carbon paper, carbon cloth, separators, copper foil, aluminum foil, etc., with round and square shapes and different sizes of blades.
Iron Nickel Alloy (FeNi) Sputtering Target / Powder / Wire / Block / Granule
Discover affordable Iron Nickel Alloy materials tailored to your lab's needs. Our FeNi products come in various sizes and shapes, from sputtering targets to powders and ingots. Order now!
High Purity Carbon (C) Sputtering Target / Powder / Wire / Block / Granule
Looking for affordable Carbon (C) materials for your laboratory needs? Look no further! Our expertly produced and tailored materials come in a variety of shapes, sizes, and purities. Choose from sputtering targets, coating materials, powders, and more.
High Purity Nickel (Ni) Sputtering Target / Powder / Wire / Block / Granule
Looking for high-quality Nickel (Ni) materials for laboratory use? Look no further than our customizable selection! With competitive prices and a range of sizes and shapes to choose from, we have everything you need to meet your unique requirements.
High Purity Silicon (Si) Sputtering Target / Powder / Wire / Block / Granule
Looking for high-quality Silicon (Si) materials for your laboratory? Look no further! Our custom-produced Silicon (Si) materials come in various purities, shapes, and sizes to suit your unique requirements. Browse our selection of sputtering targets, powders, foils, and more. Order now!
Copper Nickel Alloy (CuNi) Sputtering Target / Powder / Wire / Block / Granule
Get high-quality Copper Nickel Alloy (CuNi) materials at affordable prices for your laboratory needs. Our customized offerings include sputtering targets, coatings, powders, and more. Order now!
Alumina (Al2O3) Crucible With Lid Cylindrical Laboratory Crucible
Cylindrical Crucibles Cylindrical crucibles are one of the most common crucible shapes, suitable for melting and processing a wide variety of materials, and are easy to handle and clean.
Nickel Chromium Alloy (NiCr) Sputtering Target / Powder / Wire / Block / Granule
Get high-quality Nickel Chromium Alloy (NiCr) materials for your lab needs at affordable prices. Choose from a wide range of shapes and sizes, including sputtering targets, coatings, powders, and more. Tailored to suit your unique requirements.
Create uniform samples easily with Square Lab Press Mold - available in various sizes. Ideal for battery, cement, ceramics, and more. Custom sizes available.
Copper Nickel Indium Alloy (CuNiIn) Sputtering Target / Powder / Wire / Block / Granule
Looking for Copper Nickel Indium materials for your lab? Our affordable products come in different purities, shapes, and sizes to fit your needs. Browse our sputtering targets, powders, foils, and more!
High Purity Niobium (Nb) Sputtering Target / Powder / Wire / Block / Granule
Looking for customized Niobium materials for laboratory use? Our experts offer tailored solutions with different purities, shapes, and sizes at reasonable prices. Discover our wide range of Niobium products.
Titanium Silicon Alloy (TiSi) Sputtering Target / Powder / Wire / Block / Granule
Discover our affordable Titanium Silicon Alloy (TiSi) materials for laboratory use. Our custom production offers various purities, shapes, and sizes for sputtering targets, coatings, powders, and more. Find the perfect match for your unique needs.
High Purity Iridium (Ir) Sputtering Target / Powder / Wire / Block / Granule
Looking for high-quality Iridium (Ir) materials for laboratory use? Look no further! Our expertly produced and tailored materials come in various purities, shapes, and sizes to suit your unique needs. Check out our range of sputtering targets, coatings, powders, and more. Get a quote today!
Chromium Nickel Alloy (CrNi) Sputtering Target / Powder / Wire / Block / Granule
Looking for high-quality Chromium Nickel Alloy (CrNi) materials for your lab? Look no further than our expertly crafted and tailored options. Explore our wide range of sizes and specifications, including sputtering targets, coatings, powders, and more. Shop now!
Zirconia Ceramic Rod - Stabilized Yttrium Precision Machining
Zirconia ceramic rods are prepared by isostatic pressing, and a uniform, dense and smooth ceramic layer and transition layer are formed at high temperature and high speed.
CVD Diamond wire drawing die blanks
CVD diamond wire drawing die blanks: superior hardness, abrasion resistance, and applicability in wire drawing various materials. Ideal for abrasive wear machining applications like graphite processing.
High Purity Scandium (Sc) Sputtering Target / Powder / Wire / Block / Granule
Looking for Scandium (Sc) materials for laboratory use? Our affordable prices and expertise in producing and customizing materials to your needs make us the perfect choice! Choose from a diverse range of shapes, sizes, and specifications.
High Purity Nickel Oxide (Ni2O3) Sputtering Target / Powder / Wire / Block / Granule
Find high-quality Nickel Oxide materials for your laboratory needs at affordable prices. Our tailored solutions fit your specific requirements. Discover a range of shapes, sizes, and specifications for sputtering targets, coatings, powders, and more.
High Purity Iron (Fe) Sputtering Target / Powder / Wire / Block / Granule
Looking for affordable Iron (Fe) materials for laboratory use? Our range of products includes sputtering targets, coating materials, powders, and more in various specifications and sizes, tailored to meet your specific needs. Contact us today!
High Purity Niobium Oxide (Nb2O5) Sputtering Target / Powder / Wire / Block / Granule
Get high-quality Niobium Oxide (Nb2O5) materials for your lab needs at reasonable prices. We produce and customize materials to fit your unique requirements, with a range of shapes and sizes available.
High Purity Silicon Dioxide (SiO2) Sputtering Target / Powder / Wire / Block / Granule
Looking for Silicon Dioxide materials for your lab? Our expertly tailored SiO2 materials come in various purities, shapes, and sizes. Browse our wide range of specifications today!
Efficiently form and test most samples with Cylindrical Press Molds in a range of sizes. Made of Japanese high-speed steel, with long service life and customizable sizes.
Silicon Nitride (SiC) Ceramic Sheet Precision Machining Ceramic
Silicon nitride plate is a commonly used ceramic material in the metallurgical industry due to its uniform performance at high temperatures.