Lab Materials
Nickel Silicon Alloy (NiSi) Sputtering Target / Powder / Wire / Block / Granule
Item Number : LM-NiSi
Price varies based on specs and customizations
- Chemical Formula
- NiSi
- Purity
- 2N5
- Commonly Used Ratio
- Si:Ni=1:1 at%
- Shape
- discs / wire / block / powder / plates / column targets / step target / custom-made
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We provide Nickel Silicon Alloy materials for laboratory use at reasonable prices. Our expertise lies in producing and tailoring these materials of different purities, shapes, and sizes to suit your unique requirements.
We offer a diverse range of specifications and sizes for sputtering targets (circular, square, tubular, irregular shapes), coating materials, cylinders, cones, particles, foils, powders, 3D printing powders, nanometer powders, wire rods, ingots, blocks, and more.
Details
About Nickel Silicon Alloy (NiSi)
Nickel-Silicon available in various forms to suit your needs. These forms include powder, bar, ingot, ribbon, wire, shot, sheet, and foil.
Moreover, there are ultra-high purity and high purity forms of Nickel-Silicon available, such as metal powder, submicron powder, and nanoscale particles. These forms are ideal for applications requiring precise thin film deposition, and you can obtain them as sputtering targets or pellets for CVD and PVD applications.
Ingredient Quality Control
- Raw material composition analysis
- Through the use of equipment such as ICP and GDMS, the content of metal impurities is detected and analyzed to ensure that it meets the purity standard;
Non-metallic impurities are detected by equipment such as carbon and sulfur analyzers, nitrogen and oxygen analyzers. - Metallographic flaw detection analysis
- The target material is inspected using flaw detection equipment to ensure that there are no defects or shrinkage holes inside the product;
Through metallographic testing, the internal grain structure of the target material is analyzed to ensure that the grains are fine and dense. - Appearance and dimension inspection
- Product dimensions are measured using micrometers and precision calipers to ensure compliance with drawings;
The surface finish and cleanliness of the product are measured using a surface cleanliness meter.
Conventional Sputtering Target Sizes
- Preparation process
- hot isostatic pressing, vacuum melting, etc.
- Sputtering target shape
- plane sputtering target, multi-arc sputtering target, step sputtering target, special-shaped sputtering target
- Round sputtering target size
- Diameter: 25.4mm / 50mm / 50.8mm / 60mm / 76.2mm / 80mm / 100mm / 101.6mm / 152.4mm
Thickness: 3mm / 4mm / 5mm / 6mm / 6.35mm
Size can be customized. - Square sputtering target size
- 50×50×3mm / 100×100×4mm / 300×300×5mm, size can be customized
Available Metal Forms
Metal Forms Details
We manufacture almost all the metals listed on the periodic table in a wide range of forms and purities, as well as standard sizes and dimensions. We can also produce custom-made products to meet specific customer requirements, such as size, shape, surface area, composition, and more. The following list provides a sample of the forms we offer, but it is not exhaustive. If you need laboratory consumables, please contact us directly to request a quote.
- Flat/Planar Forms: Board, Film, Foil, Microfoil, Microleaf, Paper, Plate, Ribbon, Sheet, Strip, Tape, Wafer
- Preformed Shapes: Anodes, Balls, Bands, Bars, Boats, Bolts, Briquettes, Cathodes, Circles, Coils, Crucibles, Crystals, Cubes, Cups, Cylinders, Discs, Electrodes, Fibers, Filaments, Flanges, Grids, Lenses, Mandrels, Nuts, Parts, Prisms, Pucks, Rings, Rods, Shapes, Shields, Sleeves, Springs, Squares, Sputtering Targets, Sticks, Tubes, Washers, Windows, Wires
- Microsizes: Beads, Bits, Capsules, Chips, Coins, Dust, Flakes, Grains, Granules, Micropowder, Needles, Particles, Pebbles, Pellets, Pins, Pills, Powder, Shavings, Shot, Slugs, Spheres, Tablets
- Macrosizes: Billets, Chunks, Cuttings, Fragments, Ingots, Lumps, Nuggets, Pieces, Punchings, Rocks, Scraps, Segments, Turnings
- Porous and Semi-Porous: Fabric, Foam, Gauze, Honeycomb, Mesh, Sponge, Wool
- Nanoscale: Nanoparticles, Nanopowders, Nanofoils, Nanotubes, Nanorods, Nanoprisms
- Others: Concentrate, Ink, Paste, Precipitate, Residue, Samples, Specimens
KinTek specializes in the manufacturing of high-purity and ultra-high-purity materials with a purity range of 99.999% (5N), 99.9999% (6N), 99.99995% (6N5), and in some cases, up to 99.99999% (7N). Our materials are available in specific grades, including UP/UHP, semiconductor, electronic, deposition, fiber optic, and MBE grades. Our high-purity metals, oxides, and compounds are specifically crafted to meet the rigorous demands of high-technology applications and are ideal for use as dopants and precursor materials for thin film deposition, crystal growth of semiconductors, and synthesis of nanomaterials. These materials find use in advanced microelectronics, solar cells, fuel cells, optical materials, and other cutting-edge applications.
Packaging
We use vacuum packaging for our high-purity materials, and each material has specific packaging tailored to its unique characteristics. For instance, our Hf sputter target is externally tagged and labeled to facilitate efficient identification and quality control. We take great care to prevent any damage that could occur during storage or transportation.
FAQ
What Is Sputtering Target?
How Are Sputtering Targets Made?
What Is Sputtering Target Used For?
What Are Sputtering Targets For Electronics?
What Is The Lifetime Of A Sputtering Target?
4.8
out of
5
The nickel silicon alloy sputtering targets are of exceptional quality, ensuring precise thin film deposition.
4.9
out of
5
I highly recommend KINTEK SOLUTION for their prompt delivery and outstanding customer service. Their nickel silicon alloy sputtering targets are top-notch.
4.7
out of
5
KINTEK SOLUTION provides nickel silicon alloy sputtering targets that are not only durable but also cost-effective. They are a reliable supplier.
4.6
out of
5
The nickel silicon alloy sputtering targets from KINTEK SOLUTION have consistently met our laboratory's demands for high-quality thin film deposition.
4.8
out of
5
KINTEK SOLUTION's nickel silicon alloy sputtering targets are a testament to their commitment to innovation and technological advancement.
4.9
out of
5
The purity and consistency of KINTEK SOLUTION's nickel silicon alloy sputtering targets are remarkable. They are a valuable asset to our laboratory.
4.7
out of
5
KINTEK SOLUTION's nickel silicon alloy sputtering targets have proven to be durable and reliable in our laboratory's demanding environment.
4.6
out of
5
The nickel silicon alloy sputtering targets from KINTEK SOLUTION offer excellent value for money. They are a cost-effective solution for our laboratory.
4.8
out of
5
KINTEK SOLUTION's nickel silicon alloy sputtering targets have enabled us to achieve precise and consistent thin film deposition results.
4.9
out of
5
We have been consistently impressed with the quality and performance of KINTEK SOLUTION's nickel silicon alloy sputtering targets.
4.7
out of
5
KINTEK SOLUTION's nickel silicon alloy sputtering targets are a testament to their commitment to customer satisfaction. They are a reliable supplier.
4.6
out of
5
The nickel silicon alloy sputtering targets from KINTEK SOLUTION have met all our expectations for quality and reliability.
4.8
out of
5
KINTEK SOLUTION's nickel silicon alloy sputtering targets have enabled us to push the boundaries of thin film deposition technology.
4.9
out of
5
The nickel silicon alloy sputtering targets from KINTEK SOLUTION are a valuable addition to our laboratory. They have helped us achieve remarkable results.
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