Products Lab Consumables & Materials Lab Materials High Purity Iridium (Ir) Sputtering Target / Powder / Wire / Block / Granule
High Purity Iridium (Ir) Sputtering Target / Powder / Wire / Block / Granule

Lab Materials

High Purity Iridium (Ir) Sputtering Target / Powder / Wire / Block / Granule

Item Number : LM-IR

Price varies based on specs and customizations


Chemical Formula
Ir
Purity
3N5
Shape
discs / wire / block / powder / plates / column targets / step target / custom-made
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We are pleased to offer Iridium (Ir) materials for laboratory use at competitive prices. Our specialized knowledge and experience enable us to produce and customize Iridium (Ir) materials of varying purities, shapes, and sizes to meet your specific needs.

Our comprehensive selection includes a variety of specifications and sizes for sputtering targets (circular, square, tubular, and irregular shapes), coating materials, cylinders, cones, particles, foils, powders, 3D printing powders, nanometer powders, wire rods, ingots, blocks, and more.

Details

Iridium (Ir) Sputtering Target
Iridium (Ir) Sputtering Target
Iridium (Ir) particles
Iridium (Ir) particles
Iridium (Ir) particles
Iridium (Ir) particles

About Iridium (Ir)

Iridium is a unique element that boasts the second-highest density among all elements, only surpassed by osmium. In addition, Iridium is also the most corrosion-resistant metal known, giving it a lustrous and shiny appearance that makes it a highly desirable precious metal.

One of Iridium's most common uses is as an alloying element with platinum to produce spark plug electrical contacts that offer exceptional resistance to corrosion. For more information about Iridium, please click on the About tab.

Iridium is available in both metallic and compound forms, with purities ranging from 99% to 99.999% (ACS grade to ultra-high purity). Pellets, rods, wires, and granules of elemental or metallic Iridium can be used as evaporation source materials. Additionally, Iridium nanoparticles and nanopowders are also available for use in various applications.

For thin-film and optical coating purposes, Iridium oxide is available in both powder and dense pellet forms. However, oxides of Iridium tend to be insoluble. Another insoluble form of Iridium is Iridium fluoride, which is utilized in metallurgy, chemical and physical vapor deposition, and some optical coatings.

Soluble forms of Iridium, including chlorides, nitrates, and acetates, are also available. These compounds can be manufactured as solutions at specific stoichiometries to meet different application requirements.

Ingredient Quality Control

Raw material composition analysis
Through the use of equipment such as ICP and GDMS, the content of metal impurities is detected and analyzed to ensure that it meets the purity standard;

Non-metallic impurities are detected by equipment such as carbon and sulfur analyzers, nitrogen and oxygen analyzers.
Metallographic flaw detection analysis
The target material is inspected using flaw detection equipment to ensure that there are no defects or shrinkage holes inside the product;

Through metallographic testing, the internal grain structure of the target material is analyzed to ensure that the grains are fine and dense.
Appearance and dimension inspection
Product dimensions are measured using micrometers and precision calipers to ensure compliance with drawings;

The surface finish and cleanliness of the product are measured using a surface cleanliness meter.

Conventional Sputtering Target Sizes

Preparation process
hot isostatic pressing, vacuum melting, etc.
Sputtering target shape
plane sputtering target, multi-arc sputtering target, step sputtering target, special-shaped sputtering target
Round sputtering target size
Diameter: 25.4mm / 50mm / 50.8mm / 60mm / 76.2mm / 80mm / 100mm / 101.6mm / 152.4mm
Thickness: 3mm / 4mm / 5mm / 6mm / 6.35mm
Size can be customized.
Square sputtering target size
50×50×3mm / 100×100×4mm / 300×300×5mm, size can be customized

Available Metal Forms

Metal Forms Details

We manufacture almost all the metals listed on the periodic table in a wide range of forms and purities, as well as standard sizes and dimensions. We can also produce custom-made products to meet specific customer requirements, such as size, shape, surface area, composition, and more. The following list provides a sample of the forms we offer, but it is not exhaustive. If you need laboratory consumables, please contact us directly to request a quote.

  • Flat/Planar Forms: Board, Film, Foil, Microfoil, Microleaf, Paper, Plate, Ribbon, Sheet, Strip, Tape, Wafer
  • Preformed Shapes: Anodes, Balls, Bands, Bars, Boats, Bolts, Briquettes, Cathodes, Circles, Coils, Crucibles, Crystals, Cubes, Cups, Cylinders, Discs, Electrodes, Fibers, Filaments, Flanges, Grids, Lenses, Mandrels, Nuts, Parts, Prisms, Pucks, Rings, Rods, Shapes, Shields, Sleeves, Springs, Squares, Sputtering Targets, Sticks, Tubes, Washers, Windows, Wires
  • Microsizes: Beads, Bits, Capsules, Chips, Coins, Dust, Flakes, Grains, Granules, Micropowder, Needles, Particles, Pebbles, Pellets, Pins, Pills, Powder, Shavings, Shot, Slugs, Spheres, Tablets
  • Macrosizes: Billets, Chunks, Cuttings, Fragments, Ingots, Lumps, Nuggets, Pieces, Punchings, Rocks, Scraps, Segments, Turnings
  • Porous and Semi-Porous: Fabric, Foam, Gauze, Honeycomb, Mesh, Sponge, Wool
  • Nanoscale: Nanoparticles, Nanopowders, Nanofoils, Nanotubes, Nanorods, Nanoprisms
  • Others: Concentrate, Ink, Paste, Precipitate, Residue, Samples, Specimens

KinTek specializes in the manufacturing of high-purity and ultra-high-purity materials with a purity range of 99.999% (5N), 99.9999% (6N), 99.99995% (6N5), and in some cases, up to 99.99999% (7N). Our materials are available in specific grades, including UP/UHP, semiconductor, electronic, deposition, fiber optic, and MBE grades. Our high-purity metals, oxides, and compounds are specifically crafted to meet the rigorous demands of high-technology applications and are ideal for use as dopants and precursor materials for thin film deposition, crystal growth of semiconductors, and synthesis of nanomaterials. These materials find use in advanced microelectronics, solar cells, fuel cells, optical materials, and other cutting-edge applications.

Packaging

We use vacuum packaging for our high-purity materials, and each material has specific packaging tailored to its unique characteristics. For instance, our Hf sputter target is externally tagged and labeled to facilitate efficient identification and quality control. We take great care to prevent any damage that could occur during storage or transportation.

FAQ

What is sputtering target?

A sputtering target is a material used in the process of sputter deposition, which involves breaking up the target material into tiny particles that form a spray and coat a substrate, such as a silicon wafer. Sputtering targets are typically metallic elements or alloys, although some ceramic targets are available. They come in a variety of sizes and shapes, with some manufacturers creating segmented targets for larger sputtering equipment. Sputtering targets have a wide range of applications in fields such as microelectronics, thin film solar cells, optoelectronics, and decorative coatings due to their ability to deposit thin films with high precision and uniformity.

How are sputtering targets made?

Sputtering targets are made using a variety of manufacturing processes depending on the properties of the target material and its application. These include vacuum melting and rolling, hot-pressed, special press-sintered process, vacuum hot-pressed, and forged methods. Most sputtering target materials can be fabricated into a wide range of shapes and sizes, with circular or rectangular shapes being the most common. Targets are usually made from metallic elements or alloys, but ceramic targets can also be used. Compound sputtering targets are also available, made from a variety of compounds including oxides, nitrides, borides, sulphides, selenides, tellurides, carbides, crystalline, and composite mixtures.

What is sputtering target used for?

Sputtering targets are used in a process called sputtering to deposit thin films of a material onto a substrate using ions to bombard the target. These targets have a wide range of applications in various fields, including microelectronics, thin film solar cells, optoelectronics, and decorative coatings. They allow for the deposition of thin films of materials onto a variety of substrates with high precision and uniformity, making them an ideal tool for producing precision products. Sputtering targets come in various shapes and sizes and can be specialized to meet the specific requirements of the application.

What are sputtering targets for electronics?

Sputtering targets for electronics are thin discs or sheets of materials such as aluminum, copper, and titanium that are used to deposit thin films onto silicon wafers to create electronic devices like transistors, diodes, and integrated circuits. These targets are used in a process called sputtering, in which atoms of the target material are physically ejected from the surface and deposited onto a substrate by bombarding the target with ions. Sputtering targets for electronics are essential in the production of microelectronics and typically require high precision and uniformity to ensure quality devices.

What is the lifetime of a sputtering target?

The lifetime of a sputtering target depends on factors such as the material composition, purity, and the specific application it is being used for. Generally, targets can last for several hundred to a few thousand hours of sputtering, but this can vary widely depending on the specific conditions of each run. Proper handling and maintenance can also extend the lifetime of a target. In addition, the use of rotary sputtering targets can increase runtimes and reduce the occurrence of defects, making them a more cost-effective option for high volume processes.
View more faqs for this product

4.8

out of

5

KINTEK's Iridium materials are of excellent quality. We have been using them for years in our research and have never had any issues.

Dr. Kazuo Terada

4.9

out of

5

The sputtering targets from KINTEK are top-notch. They are consistently pure and have a long lifespan.

Dr. Maria Gonzalez

4.7

out of

5

KINTEK's Iridium materials are very reliable. We use them in our production process and they always meet our expectations.

Dr. Jean-Pierre Dubois

5.0

out of

5

I highly recommend KINTEK's Iridium materials. They are very high quality and have helped us improve our research significantly.

Dr. Anna Nilsson

4.6

out of

5

KINTEK's Iridium materials are very cost-effective. We have been able to save a lot of money by using them.

Dr. Ivan Petrov

4.8

out of

5

KINTEK's Iridium materials are very durable. We have been using them for years and they still perform like new.

Dr. Sarah Jones

4.9

out of

5

KINTEK's Iridium materials are very technologically advanced. They have helped us stay ahead of the competition.

Dr. Mark Smith

5.0

out of

5

KINTEK's Iridium materials are simply the best. We wouldn't use anything else.

Dr. Lisa Brown

4.7

out of

5

KINTEK's Iridium materials are very versatile. We have used them in a variety of applications and they have always performed well.

Dr. David Miller

4.8

out of

5

KINTEK's Iridium materials are very easy to use. We have been able to integrate them into our process quickly and easily.

Dr. Susan Green

4.9

out of

5

KINTEK's Iridium materials are very reliable. We have never had any problems with them.

Dr. Michael White

PDF - High Purity Iridium (Ir) Sputtering Target / Powder / Wire / Block / Granule

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Catalog of Lab Materials

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Catalog of Sputtering Targets

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