Lab Materials

High Purity Titanium (Ti) Sputtering Target / Powder / Wire / Block / Granule

Name: High Purity Titanium (Ti) Sputtering Target / Powder / Wire / Block / Granule
Brand: Kintek Solution
SKU: LM-TI
Rating: 4.8 (18 reviews)

Item Number : LM-TI

Price varies based on specs and customizations

Chemical Formula: Ti
Purity: 3N-5N
Shape: discs / wire / block / powder / plates / column targets / step target / custom-made

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At reasonable prices, we offer Titanium (Ti) materials for laboratory use. Our expertise lies in producing and tailoring Titanium (Ti) materials of different purities, shapes, and sizes to suit your unique requirements.

We provide a wide range of specifications and sizes for various Titanium (Ti) products, such as sputtering targets (circular, square, tubular, irregular), coating materials, cylinders, cones, particles, foils, powders, 3D printing powders, nanometer powders, wire rods, ingots, and blocks, among others.

Details

titanium sponge block — Titanium sponge block

About Titanium (Ti)

Titanium is a versatile metal that possesses unique properties, including high strength, low density, and exceptional resistance to corrosion. Due to these attributes, it has found widespread use in various applications, particularly in the aerospace and military industries.

Titanium dioxide, one of the most common compounds of titanium, is used extensively to produce a white pigment for various applications. Additionally, titanium forms the basis of numerous commercially essential compound groups, including titanates used in electronic and dielectric formulations, as well as in crystal growth for ruby and sapphire lasers.

Titanium is available in several forms, including elemental or metallic forms such as pellets, rods, wires, and granules that are used for evaporation source materials. Furthermore, titanium nanoparticles and nanopowders provide ultra-high surface area for specialized applications.

Titanium oxides are also available in powder and dense pellet forms for uses such as optical coatings and thin film applications. However, they tend to be insoluble. Titanium fluorides, another insoluble form of titanium, are used in applications where oxygen is undesirable, such as metallurgy, chemical and physical vapor deposition, and some optical coatings.

Lastly, titanium is available in soluble forms, including chlorides, nitrates, and acetates, which can be manufactured as solutions at specified stoichiometries. Overall, titanium and its various forms and compounds offer a wide range of possibilities for material scientists and other professionals working in diverse fields.

Ingredient Quality Control

Raw material composition analysis: Through the use of equipment such as ICP and GDMS, the content of metal impurities is detected and analyzed to ensure that it meets the purity standard;

Non-metallic impurities are detected by equipment such as carbon and sulfur analyzers, nitrogen and oxygen analyzers.
Metallographic flaw detection analysis: The target material is inspected using flaw detection equipment to ensure that there are no defects or shrinkage holes inside the product;

Through metallographic testing, the internal grain structure of the target material is analyzed to ensure that the grains are fine and dense.
Appearance and dimension inspection: Product dimensions are measured using micrometers and precision calipers to ensure compliance with drawings;

The surface finish and cleanliness of the product are measured using a surface cleanliness meter.

Conventional Sputtering Target Sizes

Preparation process: hot isostatic pressing, vacuum melting, etc.
Sputtering target shape: plane sputtering target, multi-arc sputtering target, step sputtering target, special-shaped sputtering target
Round sputtering target size: Diameter: 25.4mm / 50mm / 50.8mm / 60mm / 76.2mm / 80mm / 100mm / 101.6mm / 152.4mm
Thickness: 3mm / 4mm / 5mm / 6mm / 6.35mm
Size can be customized.
Square sputtering target size: 50×50×3mm / 100×100×4mm / 300×300×5mm, size can be customized

Available Metal Forms

Metal Forms Details

We manufacture almost all the metals listed on the periodic table in a wide range of forms and purities, as well as standard sizes and dimensions. We can also produce custom-made products to meet specific customer requirements, such as size, shape, surface area, composition, and more. The following list provides a sample of the forms we offer, but it is not exhaustive. If you need laboratory consumables, please contact us directly to request a quote.

Flat/Planar Forms: Board, Film, Foil, Microfoil, Microleaf, Paper, Plate, Ribbon, Sheet, Strip, Tape, Wafer
Preformed Shapes: Anodes, Balls, Bands, Bars, Boats, Bolts, Briquettes, Cathodes, Circles, Coils, Crucibles, Crystals, Cubes, Cups, Cylinders, Discs, Electrodes, Fibers, Filaments, Flanges, Grids, Lenses, Mandrels, Nuts, Parts, Prisms, Pucks, Rings, Rods, Shapes, Shields, Sleeves, Springs, Squares, Sputtering Targets, Sticks, Tubes, Washers, Windows, Wires
Microsizes: Beads, Bits, Capsules, Chips, Coins, Dust, Flakes, Grains, Granules, Micropowder, Needles, Particles, Pebbles, Pellets, Pins, Pills, Powder, Shavings, Shot, Slugs, Spheres, Tablets
Macrosizes: Billets, Chunks, Cuttings, Fragments, Ingots, Lumps, Nuggets, Pieces, Punchings, Rocks, Scraps, Segments, Turnings
Porous and Semi-Porous: Fabric, Foam, Gauze, Honeycomb, Mesh, Sponge, Wool
Nanoscale: Nanoparticles, Nanopowders, Nanofoils, Nanotubes, Nanorods, Nanoprisms
Others: Concentrate, Ink, Paste, Precipitate, Residue, Samples, Specimens

KinTek specializes in the manufacturing of high-purity and ultra-high-purity materials with a purity range of 99.999% (5N), 99.9999% (6N), 99.99995% (6N5), and in some cases, up to 99.99999% (7N). Our materials are available in specific grades, including UP/UHP, semiconductor, electronic, deposition, fiber optic, and MBE grades. Our high-purity metals, oxides, and compounds are specifically crafted to meet the rigorous demands of high-technology applications and are ideal for use as dopants and precursor materials for thin film deposition, crystal growth of semiconductors, and synthesis of nanomaterials. These materials find use in advanced microelectronics, solar cells, fuel cells, optical materials, and other cutting-edge applications.

Packaging

We use vacuum packaging for our high-purity materials, and each material has specific packaging tailored to its unique characteristics. For instance, our Hf sputter target is externally tagged and labeled to facilitate efficient identification and quality control. We take great care to prevent any damage that could occur during storage or transportation.

FAQ

What is sputtering target?

A sputtering target is a material used in the process of sputter deposition, which involves breaking up the target material into tiny particles that form a spray and coat a substrate, such as a silicon wafer. Sputtering targets are typically metallic elements or alloys, although some ceramic targets are available. They come in a variety of sizes and shapes, with some manufacturers creating segmented targets for larger sputtering equipment. Sputtering targets have a wide range of applications in fields such as microelectronics, thin film solar cells, optoelectronics, and decorative coatings due to their ability to deposit thin films with high precision and uniformity.

What are high purity materials?

High purity materials refer to substances that are free from impurities and possess a high level of chemical homogeneity. These materials are essential in various industries, particularly in the field of advanced electronics, where impurities can significantly affect the performance of devices. High purity materials are obtained through various methods, including chemical purification, vapor-phase deposition, and zone refining. In the preparation of electronic grade single crystal diamond, for example, a high-purity raw material gas and an efficient vacuum system are necessary to achieve the desired level of purity and homogeneity.

What is vacuum arc melting process?

Vacuum arc melting (VAR) is a secondary melting process used to produce metal ingots with high chemical and mechanical homogeneity for critical applications in industries like aerospace, energy, and nuclear. The process involves refining liquid metal under vacuum and controlling its solidification rate. It is used for the purification of reactive titanium or zirconium alloys, without any contact with casting refractories, as well as for improving inclusion cleanliness in steels and superalloys. The remelted cylindrical ingots can weigh several tons, and VAR has revolutionized the specialty metallurgical techniques industry.

What are high purity metals?

High purity metals are single element materials with minimal impurities, making them ideal for use in research, development, and production of advanced technologies. These metals are used in the creation of advanced ceramics, electronic sensors, high-precision lenses and optics, LEDs, lasers, thermal barrier coatings, plasma screens, and more. KINTEK offers a diverse range of high-purity metals and binary and ternary metal compounds in various forms, compositions, dispersions, particle sizes, and weights for research and commercial applications. Strategic special metals are used in high-tech applications and can be expensive due to their elaborate processing.

How are sputtering targets made?

Sputtering targets are made using a variety of manufacturing processes depending on the properties of the target material and its application. These include vacuum melting and rolling, hot-pressed, special press-sintered process, vacuum hot-pressed, and forged methods. Most sputtering target materials can be fabricated into a wide range of shapes and sizes, with circular or rectangular shapes being the most common. Targets are usually made from metallic elements or alloys, but ceramic targets can also be used. Compound sputtering targets are also available, made from a variety of compounds including oxides, nitrides, borides, sulphides, selenides, tellurides, carbides, crystalline, and composite mixtures.

What is VAR Vacuum Arc Remelting (VAR)Furnace?

VAR or Vacuum Arc Remelting is a process used to refine and improve the cleanliness of ingots made from standard air-melted, vacuum induction melted, or ESR remelted alloys. It is used for steels, superalloys, titanium, zirconium, and their alloys in industries such as aerospace, power generation, defense, medical, and nuclear. VAR is a continuous remelting process of a consumable electrode under vacuum, with DC power used to strike an arc between the electrode and a copper mold. The process removes dissolved gases, reduces undesired trace elements, improves oxide cleanliness, and achieves directional solidification of the ingot from bottom to top.

What are high purity metals used for?

High purity metals are used in various advanced technologies that require specific properties, performance and quality. They are used to create fluorescent lighting, plasma screens, LEDs, high-precision lenses and optics, electronic sensors, advanced ceramics, thermal barrier coatings, lasers, and more. These metals are also used in the production of high-quality magnetic, thermoelectric, phosphor and semiconducting materials. KINTEK offers a diverse portfolio of high-purity metals, binary and ternary metal compounds, magnetic alloys, metal oxides, nanomaterials, and organometallic precursors in various forms, compositions, dispersions, particle sizes and weights for all research and commercial applications.

What is sputtering target used for?

Sputtering targets are used in a process called sputtering to deposit thin films of a material onto a substrate using ions to bombard the target. These targets have a wide range of applications in various fields, including microelectronics, thin film solar cells, optoelectronics, and decorative coatings. They allow for the deposition of thin films of materials onto a variety of substrates with high precision and uniformity, making them an ideal tool for producing precision products. Sputtering targets come in various shapes and sizes and can be specialized to meet the specific requirements of the application.

How does vacuum arc melting furnace work?

A vacuum arc melting furnace works by melting materials under a vacuum or low-pressure atmosphere using electric arcs. The furnace uses two electrodes, one of which is the material to be melted. The electrodes are brought close together and an electric arc is struck between them, causing the material to melt. The furnace is then evacuated to remove any impurities and the molten material is cast into a desired shape. This process is used for the production of high-purity metals, alloys, and intermetallics used in industries such as aerospace, electronics, and biomedical engineering.

What are the benefits of using high-purity metals?

Using high-purity metals offers several benefits. First, they provide consistent and reliable performance due to the absence of impurities that can cause variations in material properties. Second, high-purity metals enable the production of high-quality and high-performance products, ensuring better functionality and durability. Third, their low impurity levels reduce the risk of contamination in sensitive applications. High-purity metals also exhibit improved electrical conductivity, thermal conductivity, and corrosion resistance. Additionally, they are often preferred for their enhanced adhesion properties, making them suitable for various coating and thin film deposition processes.

What are sputtering targets for electronics?

Sputtering targets for electronics are thin discs or sheets of materials such as aluminum, copper, and titanium that are used to deposit thin films onto silicon wafers to create electronic devices like transistors, diodes, and integrated circuits. These targets are used in a process called sputtering, in which atoms of the target material are physically ejected from the surface and deposited onto a substrate by bombarding the target with ions. Sputtering targets for electronics are essential in the production of microelectronics and typically require high precision and uniformity to ensure quality devices.

What are the applications of vacuum arc melting furnaces?

Vacuum arc melting furnaces are commonly used in the production of high-performance materials, such as superalloys, special steels, and reactive metals. These materials often require high-purity and controlled composition, which can be achieved through vacuum arc melting. The process is particularly suited for the production of critical components in aerospace, automotive, and energy industries, where high strength, corrosion resistance, and temperature stability are vital. Vacuum arc melting is also used in research and development settings to produce small quantities of specialized alloys for testing and characterization purposes.

Which industries commonly use high-purity metals?

High-purity metals find application in a wide range of industries. The semiconductor and electronics industries extensively use high-purity metals for integrated circuits, microprocessors, and other electronic components. The aerospace industry relies on high-purity metals for their lightweight and high-strength properties. Optics and photovoltaic industries utilize high-purity metals for precision optics and solar cells. High-purity metals also play a significant role in medical devices, automotive components, research laboratories, and advanced manufacturing processes.

What is the lifetime of a sputtering target?

The lifetime of a sputtering target depends on factors such as the material composition, purity, and the specific application it is being used for. Generally, targets can last for several hundred to a few thousand hours of sputtering, but this can vary widely depending on the specific conditions of each run. Proper handling and maintenance can also extend the lifetime of a target. In addition, the use of rotary sputtering targets can increase runtimes and reduce the occurrence of defects, making them a more cost-effective option for high volume processes.

What are the advantages of using vacuum arc melting furnaces?

Vacuum arc melting furnaces offer several advantages. Firstly, the high vacuum environment prevents oxidation and contamination, resulting in high-purity melted metals. This is especially important for producing materials with stringent quality requirements. Secondly, the electric arc generates intense heat, allowing for rapid and efficient melting of the metal. The process can be precisely controlled to achieve specific melting parameters, such as temperature, pressure, and cooling rate, facilitating the production of alloys with desired properties. Vacuum arc melting furnaces also offer flexibility in terms of the size and shape of the melted metal, as the consumable electrode can be easily replaced or modified. Additionally, the process allows for the selective removal of impurities, such as gases and non-metallic inclusions, further enhancing the purity and quality of the final melted metal.

What safety precautions should be followed when using a vacuum arc melting furnace?

When using a vacuum arc melting furnace, several safety precautions should be followed to ensure safe operation. Firstly, the furnace should be operated by trained personnel who are familiar with the equipment, its operation, and safety protocols. Adequate personal protective equipment, such as heat-resistant gloves, safety goggles, and fire-resistant clothing, should be worn when handling hot materials or operating the furnace. The vacuum system should be regularly inspected and maintained to ensure proper functionality and prevent safety risks. It is important to follow the manufacturer's guidelines and instructions for safe operation and maintenance of the vacuum arc melting furnace. Additionally, proper handling and disposal of consumable electrodes and melted materials should be carried out according to established safety guidelines and regulations. Regular inspections and maintenance of the furnace, including electrical systems, cooling systems, and gas handling components, should be performed to ensure safe and reliable operation.

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4.9

out of

5

KINTEK's Titanium (Ti) products are top-notch. They've consistently delivered high-quality materials that meet our stringent requirements.

Aisha Sharma

4.8

out of

5

The Titanium (Ti) sputtering targets we received from KINTEK were of exceptional quality. The purity and grain size were excellent, leading to superb thin film properties.

Marcel Blum

4.7

out of

5

KINTEK's Titanium (Ti) powders are highly pure and consistent. They've enabled us to produce high-performance components with remarkable strength and corrosion resistance.

Elena Popova

4.9

out of

5

We've been using KINTEK's Titanium (Ti) wires for years. They're incredibly durable and have significantly reduced our downtime due to breakage.

Liam Harrison

4.8

out of

5

KINTEK's Titanium (Ti) blocks are perfect for our high-temperature applications. They provide exceptional thermal conductivity and withstand extreme conditions.

Aaliyah Khan

4.7

out of

5

The Titanium (Ti) granules from KINTEK are consistently uniform in size and shape. They've improved the efficiency of our manufacturing process significantly.

Lucas Martinez

4.9

out of

5

KINTEK's Titanium (Ti) sputtering targets have enabled us to produce thin films with superior properties. The purity and uniformity of their materials are truly impressive.

Isabella Garcia

4.8

out of

5

We've been using KINTEK's Titanium (Ti) powders for our 3D printing applications. They provide excellent flowability and produce high-quality parts with intricate details.

Alexander Jensen

4.7

out of

5

The Titanium (Ti) nanometer powders from KINTEK have been instrumental in our research on advanced materials. Their ultra-high surface area has enabled us to achieve remarkable results.

Emma Watson

4.9

out of

5

KINTEK's Titanium (Ti) wire rods are incredibly strong and flexible. They've been a game-changer for our welding operations, reducing downtime and improving productivity.

Oliver Smith

4.8

out of

5

We've been using KINTEK's Titanium (Ti) ingots for our casting processes. They're highly pure and provide excellent yields of high-quality castings.

Ava Johnson

4.7

out of

5

KINTEK's Titanium (Ti) blocks are perfect for our high-pressure applications. They exhibit exceptional strength and durability, ensuring reliable performance under extreme conditions.

Muhammad Ali

4.9

out of

5

KINTEK's Titanium (Ti) sputtering targets have been a revelation for our thin film deposition processes. The purity and uniformity of their materials have resulted in outstanding film properties.

Sophia Patel

4.8

out of

5

We've been using KINTEK's Titanium (Ti) powders for our additive manufacturing applications. They're highly consistent and produce parts with exceptional mechanical properties.

Liam Brown

4.7

out of

5

The Titanium (Ti) nanometer powders from KINTEK have been a valuable addition to our research on energy storage materials. Their ultra-high surface area has facilitated the development of high-performance electrodes.

Isabella Garcia

4.9

out of

5

KINTEK's Titanium (Ti) wire rods are incredibly versatile. We've used them for various applications, including welding, brazing, and electrical connections, with excellent results.

Alexander Jensen

4.8

out of

5

We've been using KINTEK's Titanium (Ti) ingots for our forging operations. They're highly pure and produce forged components with exceptional strength and toughness.

Emma Watson

4.7

out of

5

KINTEK's Titanium (Ti) blocks are perfect for our machining applications. They're easy to work with and produce parts with excellent dimensional accuracy and surface finish.

Oliver Smith

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sputtering targets high purity materials vacuum arc melting furnace high pure metals

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High Purity Titanium (Ti) Sputtering Target / Powder / Wire / Block / Granule

Shipping:

Details

About Titanium (Ti)

Ingredient Quality Control

Conventional Sputtering Target Sizes

Available Metal Forms

Metal Forms Details

Packaging

FAQ

What is sputtering target?

What are high purity materials?

What is vacuum arc melting process?

What are high purity metals?

How are sputtering targets made?

What is VAR Vacuum Arc Remelting (VAR)Furnace?

What are high purity metals used for?

What is sputtering target used for?

How does vacuum arc melting furnace work?

What are the benefits of using high-purity metals?

What are sputtering targets for electronics?

What are the applications of vacuum arc melting furnaces?

Which industries commonly use high-purity metals?

What is the lifetime of a sputtering target?

What are the advantages of using vacuum arc melting furnaces?

What safety precautions should be followed when using a vacuum arc melting furnace?

PDF - High Purity Titanium (Ti) Sputtering Target / Powder / Wire / Block / Granule

Catalog of Lab Materials

Catalog of Sputtering Targets

Catalog of High Purity Materials

Catalog of Vacuum Arc Melting Furnace

Catalog of High Pure Metals

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Hot Isostatic Pressing Achieving Optimal Microstructure Uniformity

Cold Isostatic Pressing: An Overview and its Industrial Applications

PVD Sputtering Targets and Hot Isostatic Pressing: Part 1

PVD Sputtering Targets and Hot Isostatic Pressing: Part 2

Understanding Sputtering Deposition Technology

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