Chemical vapor deposition (CVD) is a process used to deposit thin films and coatings of high quality onto a substrate.
This process is carried out in a vacuumed environment using gaseous or vapor precursors.
The CVD process involves three main stages.
First, the reaction gas diffuses onto the substrate surface.
Second, the reaction gas is adsorbed onto the substrate surface.
Third, a chemical reaction occurs on the substrate surface to form a solid deposit.
The resulting vapor phase by-products are then released from the substrate surface.
The deposition material, which can vary depending on the project, mixes with a precursor substance.
This precursor substance is often a halide or hydride.
The combination of the deposition material and precursor enters a vacuum chamber.
In the vacuum chamber, the deposition material forms a uniform layer on the substrate.
The precursor breaks down and exits via diffusion.
CVD is advantageous because it can deposit a wide variety of materials.
These materials include metal films, non-metal films, multi-component alloy films, and ceramic or compound layers.
The process can be carried out at atmospheric pressure or low vacuum.
This allows for good wrap-around properties and uniform coating of complex shaped surfaces or deep or fine holes in the workpiece.
Additionally, CVD produces coatings with high purity, good denseness, low residual stress, and good crystallization.
5 Key Points to Understand
1. The Three Main Stages of CVD
The CVD process involves three main stages: diffusion, adsorption, and chemical reaction.
2. The Role of Precursor Substances
The deposition material mixes with a precursor substance, often a halide or hydride, to prepare and transport the material to the substrate.
3. The Vacuum Chamber Process
The combination of deposition material and precursor enters a vacuum chamber where the material forms a uniform layer on the substrate.
4. The Versatility of CVD
CVD can deposit a wide variety of materials, including metal films, non-metal films, multi-component alloy films, and ceramic or compound layers.
5. The Advantages of CVD
CVD produces coatings with high purity, good denseness, low residual stress, and good crystallization, and can be carried out at atmospheric pressure or low vacuum.
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