The catalysts used in the PVD (Physical Vapor Deposition) and CVD (Chemical Vapor Deposition) techniques are cobalt, iron, nickel, and their alloys. These catalysts are commonly used in the production of carbon nanotubes through CVD methods [10, 11]. In CVD, different activation routes can be used, such as plasma torch CVD, hot filament chemical vapor deposition (HFCVD), and microwave plasma chemical vapor deposition (MPCVD) [10]. These methods can be employed to grow diamond films of different qualities on various substrates, depending on the desired application [10].
In PVD, the technique is different from CVD as it involves bombarding solid source materials into atoms and depositing these atoms on substrates, rather than using gas molecules to deposit solid coatings [29]. Therefore, PVD does not typically use catalysts in the same way as CVD.
In summary, the catalysts used in the CVD technique, including PVD and CVD methods, are cobalt, iron, nickel, and their alloys. These catalysts play a crucial role in the growth of carbon nanotubes and the deposition of high-quality diamond films.
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