Vapour deposition is a method used to create thin film coatings on various substrates, typically in a partial vacuum environment.
This technique involves the deposition of material from a vaporized source onto a target surface, resulting in a consistent, high-purity coating.
There are different types of vapour deposition, including physical vapour deposition (PVD), chemical vapour deposition (CVD), and plasma deposition.
5 Key Methods Explained
1. Physical Vapour Deposition (PVD)
Physical vapour deposition (PVD) encompasses several deposition technologies where material is released from a source and transferred to a substrate.
One common method of PVD is thermal evaporation, which involves heating a solid material inside a high-vacuum chamber, causing it to vaporize and form a vapor cloud.
The vapor stream then traverses the chamber and deposits onto the substrate as a thin film coating.
PVD processes, such as resistive evaporation, provide cost-effective tools for creating thin films of metals and nonmetals, with higher deposition rates and thicker coatings compared to sputtering processes.
2. Chemical Vapour Deposition (CVD)
Chemical vapour deposition (CVD) involves placing the substrate in a reaction chamber filled with a gaseous coating material.
The gas reacts with the target material to create the desired coating thickness.
This method is distinct from PVD as it relies on chemical reactions to form the coating.
3. Plasma Deposition
Plasma deposition involves superheating the coating gas into an ionic form that reacts with the atomic surface of the part, typically at elevated pressures.
This process results in the formation of a coating with unique properties.
4. Arc Vapour Deposition
Arc vapour deposition is a specific deposition process that utilizes an electric arc at high current and low voltage to vaporize a cathodic or anodic electrode.
The vaporized material is then deposited on a substrate, with a substantial proportion of the metal atoms becoming ionized.
This method is particularly useful for forming thick coatings and can be employed in hard decorative surface-coating operations.
5. Summary of Vapour Deposition
In summary, vapour deposition is a versatile technique for creating thin film coatings on various substrates, with different methods tailored to specific applications and desired coating properties.
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