Physical Vapor Deposition (PVD) is a method used to create thin films.
It involves turning a solid material into a vapor.
This vapor is then transported across a low-pressure area.
Finally, the vapor condenses onto a substrate to form a thin film.
This process usually takes place under vacuum conditions.
5 Key Points to Know About Physical Vapor Deposition (PVD)
1. Process Steps
The process involves several steps.
First, the source material is gasified.
Next, the vapor is transported.
Finally, it condenses on the substrate.
2. Vacuum Conditions
PVD is typically performed under vacuum conditions.
This helps in maintaining the purity and quality of the thin film.
3. Wide Industry Usage
PVD is used in various industries.
It produces hard, corrosion-resistant coatings.
These coatings have high temperature tolerance and strong adhesion.
4. Common PVD Methods
The most common PVD methods are sputtering and evaporation.
These methods differ from Chemical Vapor Deposition (CVD).
PVD involves physical processes rather than chemical ones.
5. Environmental Friendliness
PVD is considered environmentally friendly.
It does not involve hazardous chemicals.
Continue exploring, consult our experts
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