Electron beam deposition is a process used to create thin films by evaporating materials in a vacuum.
The process involves using a focused electron beam to heat the material in a crucible, causing it to evaporate and subsequently condense on a substrate.
5 Key Steps Explained
1. Generation of Electron Beam
The electron beam is generated in an electron gun, typically using a tungsten filament heated by an electric current.
This heating causes thermionic emission, releasing electrons that form the beam.
2. Focusing and Deflection of Electron Beam
The electron beam is then focused and directed using magnets through the vacuum chamber to the crucible containing the material to be evaporated.
3. Evaporation of Material
When the electron beam hits the material, its kinetic energy is converted into heat, causing the material to either melt (in the case of metals like aluminum) or sublime (in the case of ceramics).
4. Deposition on Substrate
The evaporated material travels out of the crucible and deposits as a thin film on the substrate placed above the crucible within the vacuum chamber.
5. Control and Enhancement
The process can be precisely controlled using computer systems to manage heating, vacuum levels, substrate location, and rotation.
Additionally, ion beam assistance can be used to enhance the adhesion and density of the deposited film.
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