Knowledge What are the different types of PVD physical vapor deposition? (7 Key Techniques Explained)
Author avatar

Tech Team · Kintek Solution

Updated 1 month ago

What are the different types of PVD physical vapor deposition? (7 Key Techniques Explained)

Physical vapor deposition (PVD) is a process that transforms materials from a condensed phase to a vapor phase and then back to a condensed thin film on a substrate.

The main types of PVD processes include sputtering and evaporation, each with their own sub-techniques and applications.

7 Key Techniques Explained

What are the different types of PVD physical vapor deposition? (7 Key Techniques Explained)

1. Sputtering

Sputtering is a process where atoms from a solid target material are ejected by energetic particle bombardment into a gaseous phase and then deposited onto a substrate.

1.1 Magnetron Sputtering

Magnetron sputtering uses a magnetic field to trap electrons near the target surface, increasing the ionization of the sputtering gas and enhancing the sputtering rate.

1.2 Ion Beam Sputtering

Ion beam sputtering involves directing a focused ion beam onto the target to eject material.

1.3 Reactive Sputtering

Reactive sputtering combines sputtering with a reactive gas to form compound films, such as oxides or nitrides.

1.4 Ion Assisted Sputtering

Ion assisted sputtering adds an ion beam to the process to improve film properties.

1.5 Gas Flow Sputtering

Gas flow sputtering controls the flow of gas to optimize the deposition process.

2. Evaporation

Evaporation involves heating a source material to cause it to evaporate and then condense on a cooler substrate, forming a thin film.

2.1 Thermal Evaporation

Thermal evaporation directly heats the material using resistive or inductive heating.

2.2 E-beam (Electron Beam) Evaporation

E-beam evaporation uses an electron beam to heat the material, allowing for higher melting materials to be evaporated.

These PVD techniques are used to deposit a variety of materials including metals, alloys, and ceramics, with applications ranging from mechanical and optical to chemical and electronic functions.

The choice of technique depends on the specific requirements of the thin film, such as adhesion, density, and purity.

Continue exploring, consult our experts

Discover the precision and versatility of our PVD technology solutions at KINTEK SOLUTION.

Our comprehensive range of sputtering and evaporation equipment, including state-of-the-art magnetron and ion beam sputtering systems, and thermal and e-beam evaporators, is designed to cater to the intricate demands of your thin film applications.

Elevate your material deposition processes with our cutting-edge PVD equipment – partner with KINTEK SOLUTION for unparalleled performance and industry-leading support.

Consult Now

Related Products

Plasma enhanced evaporation deposition PECVD coating machine

Plasma enhanced evaporation deposition PECVD coating machine

Upgrade your coating process with PECVD coating equipment. Ideal for LED, power semiconductors, MEMS and more. Deposits high-quality solid films at low temps.

RF PECVD System Radio Frequency Plasma-Enhanced Chemical Vapor Deposition

RF PECVD System Radio Frequency Plasma-Enhanced Chemical Vapor Deposition

RF-PECVD is an acronym for "Radio Frequency Plasma-Enhanced Chemical Vapor Deposition." It deposits DLC (Diamond-like carbon film) on germanium and silicon substrates. It is utilized in the 3-12um infrared wavelength range.

Drawing die nano-diamond coating HFCVD Equipment

Drawing die nano-diamond coating HFCVD Equipment

The nano-diamond composite coating drawing die uses cemented carbide (WC-Co) as the substrate, and uses the chemical vapor phase method ( CVD method for short ) to coat the conventional diamond and nano-diamond composite coating on the surface of the inner hole of the mold.

Inclined rotary plasma enhanced chemical deposition (PECVD) tube furnace machine

Inclined rotary plasma enhanced chemical deposition (PECVD) tube furnace machine

Introducing our inclined rotary PECVD furnace for precise thin film deposition. Enjoy automatic matching source, PID programmable temperature control, and high accuracy MFC mass flowmeter control. Built-in safety features for peace of mind.

Cylindrical Resonator MPCVD Diamond Machine for lab diamond growth

Cylindrical Resonator MPCVD Diamond Machine for lab diamond growth

Learn about Cylindrical Resonator MPCVD Machine, the microwave plasma chemical vapor deposition method used for growing diamond gemstones and films in the jewelry and semi-conductor industries. Discover its cost-effective advantages over traditional HPHT methods.

Bell-jar Resonator MPCVD Diamond Machine for lab and diamond growth

Bell-jar Resonator MPCVD Diamond Machine for lab and diamond growth

Get high-quality diamond films with our Bell-jar Resonator MPCVD machine designed for lab and diamond growth. Discover how Microwave Plasma Chemical Vapor Deposition works for growing diamonds using carbon gas and plasma.

915MHz MPCVD Diamond Machine

915MHz MPCVD Diamond Machine

915MHz MPCVD Diamond Machine and its multi-crystal effective growth, the maximum area can reach 8 inches, the maximum effective growth area of single crystal can reach 5 inches. This equipment is mainly used for the production of large-size polycrystalline diamond films, the growth of long single crystal diamonds, the low-temperature growth of high-quality graphene, and other materials that require energy provided by microwave plasma for growth.

CVD Diamond coating

CVD Diamond coating

CVD Diamond Coating: Superior Thermal Conductivity, Crystal Quality, and Adhesion for Cutting Tools, Friction, and Acoustic Applications

Customer made versatile CVD tube furnace CVD machine

Customer made versatile CVD tube furnace CVD machine

Get your exclusive CVD furnace with KT-CTF16 Customer Made Versatile Furnace. Customizable sliding, rotating, and tilting functions for precise reactions. Order now!

Graphite evaporation crucible

Graphite evaporation crucible

Vessels for high temperature applications, where materials are kept at extremely high temperatures to evaporate, allowing thin films to be deposited on substrates.

Ceramic Evaporation Boat Set

Ceramic Evaporation Boat Set

It can be used for vapor deposition of various metals and alloys. Most metals can be evaporated completely without loss. Evaporation baskets are reusable.1

High Purity Palladium (Pd) Sputtering Target / Powder / Wire / Block / Granule

High Purity Palladium (Pd) Sputtering Target / Powder / Wire / Block / Granule

Looking for affordable Palladium materials for your lab? We offer custom solutions with varying purities, shapes, and sizes - from sputtering targets to nanometer powders and 3D printing powders. Browse our range now!

Aluminized ceramic evaporation boat

Aluminized ceramic evaporation boat

Vessel for depositing thin films; has an aluminum-coated ceramic body for improved thermal efficiency and chemical resistance. making it suitable for various applications.


Leave Your Message