Sputtering is a method used to create thin films on a surface.
This technique is important in many industries, like electronics and optics.
The process has several main steps that ensure the film is made correctly.
What are the 6 Key Steps in the Sputtering Process?
1. Creating a Vacuum
First, the chamber where the process happens is emptied of air.
This is done to a very low pressure, about 10^-6 torr.
This step is important because it keeps the environment clean.
2. Introducing Sputtering Gas
Next, a gas like argon is let into the chamber.
The type of gas used depends on what material is being made.
3. Generating Plasma
A voltage is applied to create a glow discharge.
This discharge is a type of plasma, which is needed for the next step.
4. Ionizing the Gas
In the plasma, electrons hit the gas atoms.
This makes the atoms lose electrons and become positively charged ions.
5. Accelerating Ions Towards the Target
The positive ions are then pushed towards the target material.
These ions hit the target with a lot of energy.
6. Depositing the Ejected Material
The high-energy hits cause material from the target to come off.
This material then goes onto the surface, forming a thin film.
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