Two common ways to heat the source material in evaporation are resistive heating and electron beam heating.
1. Resistive heating: This method involves using a heating element or filament to heat the source material. The filament, made of materials like tungsten, molybdenum, quartz, or graphite, is heated to its melting point by passing a large current through a resistive wire or foil that contains the metal material. As the filament heats up, the source material also heats up and eventually evaporates or sublimates into a vapor.
2. Electron beam heating: In this method, an electron beam is used to heat the source material. The electron beam, generated by an electron gun, is aimed at the source material, causing it to heat up and evaporate or sublimate. Electron beam evaporation provides precise control over the heating process and allows for high deposition rates.
These two heating mechanisms are commonly used in evaporation processes to heat the source material to high temperatures, causing it to vaporize and condense onto the substrate. Each method has its advantages and is selected based on factors such as the coating material, deposition rate, coating quality, and film thickness control.
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