Knowledge What is Ion Sputtering? 7 Key Points to Understand
Author avatar

Tech Team · Kintek Solution

Updated 1 month ago

What is Ion Sputtering? 7 Key Points to Understand

Ion sputtering is a process where atoms are ejected from a solid surface when it is bombarded by ionized and accelerated atoms or molecules.

This phenomenon is commonly used in various applications such as thin film formation on a solid surface, specimen coating, and ion etching.

What is Ion Sputtering? 7 Key Points to Understand

What is Ion Sputtering? 7 Key Points to Understand

1. The Process of Ion Sputtering

The process involves focusing a beam of ionized atoms or molecules onto a target material, also known as the cathode.

The target material is placed inside a vacuum chamber filled with inert gas atoms.

The target material is negatively charged, converting it into a cathode and causing free electrons to flow from it.

These free electrons collide with the electrons surrounding the gas atoms, driving them off and converting them into positively charged, high-energy ions.

2. The Role of Positively Charged Ions

The positively charged ions are then attracted to the cathode.

When they collide with the target material at high velocity, they detach atomic-sized particles from the surface of the cathode.

These sputtered particles then cross the vacuum chamber and land on a substrate, creating a thin film of the ejected target ions.

3. Advantages of Ion Sputtering

One of the advantages of ion sputtering is that it allows for high film density and quality since the ions possess equal directionality and energy.

This process is commonly used in the production of high-quality thin films for various applications.

4. Sputtering as a Physical Process

Sputtering is a physical process that involves the ejection of atoms from a solid-state target material into the gas phase by bombarding the material with energetic ions, typically noble gas ions.

It is commonly used as a deposition technique in high-vacuum environments, known as sputter deposition.

Additionally, sputtering is used as a cleaning method for preparing high-purity surfaces and as an analytical technique to analyze the chemical composition of surfaces.

5. The Role of Plasma in Sputtering

The sputtering process involves using the energy of a plasma, which is a partially ionized gas, to bombard the surface of a target material or cathode.

The ions in the plasma are accelerated by an electric field towards the target, causing a series of momentum transfer processes between the ions and the target material.

These processes result in the ejection of atoms from the target material into the gas phase of the coating chamber.

6. The Mechanism of Sputtering

In a low-pressure chamber, the ejected target particles can fly by line of sight or be ionized and accelerated by electrical forces towards a substrate.

Once they reach the substrate, they are adsorbed and become part of the growing thin film.

Sputtering is largely driven by momentum exchange between the ions and atoms in the target material due to collisions.

When an ion collides with a cluster of atoms in the target material, subsequent collisions between the atoms can result in some of the surface atoms being ejected away from the cluster.

The sputter yield, which is the number of atoms ejected from the surface per incident ion, is an important measure of the efficiency of the sputtering process.

7. Types of Sputtering Processes

There are different types of sputtering processes, including ion beam, diode, and magnetron sputtering.

In magnetron sputtering, a high voltage is applied across a low-pressure gas, typically argon, to create a high-energy plasma.

The plasma consists of electrons and gas ions.

The energized ions in the plasma strike a target composed of the desired coating material, causing atoms to be ejected from the target and bond with those of the substrate.

Continue exploring, consult our experts

Looking for high-quality ion sputtering equipment for your laboratory? Look no further than KINTEK!

We offer a wide range of ion beam sputtering systems that are perfect for thin film formation, specimen coating, and ion etching applications.

Our equipment is designed with precision and reliability in mind, ensuring accurate and efficient results every time.

Don't compromise on quality when it comes to your research. Choose KINTEK for all your ion sputtering needs.

Contact us today to learn more!

Related Products

Spark plasma sintering furnace SPS furnace

Spark plasma sintering furnace SPS furnace

Discover the benefits of Spark Plasma Sintering Furnaces for rapid, low-temperature material preparation. Uniform heating, low cost & eco-friendly.

High Purity Iridium (Ir) Sputtering Target / Powder / Wire / Block / Granule

High Purity Iridium (Ir) Sputtering Target / Powder / Wire / Block / Granule

Looking for high-quality Iridium (Ir) materials for laboratory use? Look no further! Our expertly produced and tailored materials come in various purities, shapes, and sizes to suit your unique needs. Check out our range of sputtering targets, coatings, powders, and more. Get a quote today!

High Purity Indium Tin Oxide (ITO) Sputtering Target / Powder / Wire / Block / Granule

High Purity Indium Tin Oxide (ITO) Sputtering Target / Powder / Wire / Block / Granule

Get high-quality Indium Tin Oxide (ITO) Sputtering Targets for your lab needs at reasonable prices. Our customized options of different shapes and sizes cater to your unique requirements. Browse our range today.

Iithium titanate (LiTiO3) Sputtering Target / Powder / Wire / Block / Granule

Iithium titanate (LiTiO3) Sputtering Target / Powder / Wire / Block / Granule

Get high-quality Iithium Titanate (LiTiO3) materials for your laboratory at reasonable prices. Our tailored solutions cater to different purities, shapes, and sizes, including sputtering targets, coating materials, powders, and more. Order now!

High Purity Iron (Fe) Sputtering Target / Powder / Wire / Block / Granule

High Purity Iron (Fe) Sputtering Target / Powder / Wire / Block / Granule

Looking for affordable Iron (Fe) materials for laboratory use? Our range of products includes sputtering targets, coating materials, powders, and more in various specifications and sizes, tailored to meet your specific needs. Contact us today!

High Purity Tin (Sn) Sputtering Target / Powder / Wire / Block / Granule

High Purity Tin (Sn) Sputtering Target / Powder / Wire / Block / Granule

Looking for high-quality Tin (Sn) materials for laboratory use? Our experts offer customizable Tin (Sn) materials at reasonable prices. Check out our range of specifications and sizes today!

High Purity Iron Oxide (Fe3O4) Sputtering Target / Powder / Wire / Block / Granule

High Purity Iron Oxide (Fe3O4) Sputtering Target / Powder / Wire / Block / Granule

Get Iron Oxide (Fe3O4) materials of different purities, shapes & sizes for laboratory use. Our range includes sputtering targets, coating materials, powders, wire rods, & more. Contact us now.

Tin Sulfide (SnS2) Sputtering Target / Powder / Wire / Block / Granule

Tin Sulfide (SnS2) Sputtering Target / Powder / Wire / Block / Granule

Find high-quality Tin Sulfide (SnS2) materials for your laboratory at affordable prices. Our experts produce and customize materials to meet your specific needs. Check out our range of sputtering targets, coating materials, powders, and more.

Lithium Titanate (Li2TiO3) Sputtering Target / Powder / Wire / Block / Granule

Lithium Titanate (Li2TiO3) Sputtering Target / Powder / Wire / Block / Granule

Get high-quality Lithium Titanate materials for your lab needs at affordable prices. We offer tailored solutions with different shapes, sizes, and purities. Find sputtering targets, powders, and more in various specifications.

Indium(II) Selenide (InSe) Sputtering Target / Powder / Wire / Block / Granule

Indium(II) Selenide (InSe) Sputtering Target / Powder / Wire / Block / Granule

Looking for high-quality Indium(II) Selenide materials for your lab at reasonable prices? Our tailored and customizable InSe products come in various purities, shapes, and sizes to suit your unique needs. Choose from a range of sputtering targets, coating materials, powders, and more.

Electron Gun Beam Crucible

Electron Gun Beam Crucible

In the context of electron gun beam evaporation, a crucible is a container or source holder used to contain and evaporate the material to be deposited onto a substrate.

Boron Carbide (BC) Sputtering Target / Powder / Wire / Block / Granule

Boron Carbide (BC) Sputtering Target / Powder / Wire / Block / Granule

Get high-quality Boron Carbide materials at reasonable prices for your lab needs. We customize BC materials of different purities, shapes, and sizes, including sputtering targets, coatings, powders, and more.

Electron Beam Evaporation Coating Oxygen-Free Copper Crucible

Electron Beam Evaporation Coating Oxygen-Free Copper Crucible

Electron Beam Evaporation Coating Oxygen-Free Copper Crucible enables precise co-deposition of various materials. Its controlled temperature and water-cooled design ensure pure and efficient thin film deposition.

Plasma enhanced evaporation deposition PECVD coating machine

Plasma enhanced evaporation deposition PECVD coating machine

Upgrade your coating process with PECVD coating equipment. Ideal for LED, power semiconductors, MEMS and more. Deposits high-quality solid films at low temps.

Electron Beam Evaporation Graphite Crucible

Electron Beam Evaporation Graphite Crucible

A technology mainly used in the field of power electronics. It is a graphite film made of carbon source material by material deposition using electron beam technology.

RF PECVD System Radio Frequency Plasma-Enhanced Chemical Vapor Deposition

RF PECVD System Radio Frequency Plasma-Enhanced Chemical Vapor Deposition

RF-PECVD is an acronym for "Radio Frequency Plasma-Enhanced Chemical Vapor Deposition." It deposits DLC (Diamond-like carbon film) on germanium and silicon substrates. It is utilized in the 3-12um infrared wavelength range.

Vacuum induction melting furnace Arc Melting Furnace

Vacuum induction melting furnace Arc Melting Furnace

Get precise alloy composition with our Vacuum Induction Melting Furnace. Ideal for aerospace, nuclear energy, and electronic industries. Order now for effective smelting and casting of metals and alloys.

Drawing die nano-diamond coating HFCVD Equipment

Drawing die nano-diamond coating HFCVD Equipment

The nano-diamond composite coating drawing die uses cemented carbide (WC-Co) as the substrate, and uses the chemical vapor phase method ( CVD method for short ) to coat the conventional diamond and nano-diamond composite coating on the surface of the inner hole of the mold.

Graphite evaporation crucible

Graphite evaporation crucible

Vessels for high temperature applications, where materials are kept at extremely high temperatures to evaporate, allowing thin films to be deposited on substrates.

Vacuum pressure sintering furnace

Vacuum pressure sintering furnace

Vacuum pressure sintering furnaces are designed for high temperature hot pressing applications in metal and ceramic sintering. Its advanced features ensure precise temperature control, reliable pressure maintenance, and a robust design for seamless operation.

CVD Diamond coating

CVD Diamond coating

CVD Diamond Coating: Superior Thermal Conductivity, Crystal Quality, and Adhesion for Cutting Tools, Friction, and Acoustic Applications

Electron Beam Evaporation Coating Tungsten Crucible / Molybdenum Crucible

Electron Beam Evaporation Coating Tungsten Crucible / Molybdenum Crucible

Tungsten and molybdenum crucibles are commonly used in electron beam evaporation processes due to their excellent thermal and mechanical properties.

Thin-layer spectral electrolysis cell

Thin-layer spectral electrolysis cell

Discover the benefits of our thin-layer spectral electrolysis cell. Corrosion-resistant, complete specifications, and customizable for your needs.

Cylindrical Resonator MPCVD Diamond Machine for lab diamond growth

Cylindrical Resonator MPCVD Diamond Machine for lab diamond growth

Learn about Cylindrical Resonator MPCVD Machine, the microwave plasma chemical vapor deposition method used for growing diamond gemstones and films in the jewelry and semi-conductor industries. Discover its cost-effective advantages over traditional HPHT methods.


Leave Your Message