The current of e-beam evaporation refers to the electron beam current used in the process of evaporating materials in a vacuum environment. This current is typically measured in amperes (A) and is a critical parameter that determines the power delivered to the material being evaporated. In the context of the provided references, the electron beam is described as being magnetically directed into a crucible containing the material to be evaporated. The beam operates at a high voltage, commonly around 10 kV, and even a small current of 0.1 A can deliver a substantial power of 1 kilowatt, effectively heating the material.
The electron beam current is crucial because it directly influences the deposition rate and the quality of the film produced. Higher currents can lead to higher deposition rates, which range from 0.1 nm per minute to 100 nm per minute, depending on the specific setup and materials involved. This high deposition rate is beneficial for achieving high-density film coatings with increased adhesion to the substrate.
Moreover, the electron beam evaporation process is designed to concentrate the energy on the target material, rather than heating the entire crucible or vacuum chamber. This localized heating not only enhances the efficiency of material utilization but also reduces the risk of contamination and heat damage to the substrate. The process is particularly effective for materials with high melting points, such as tungsten and tantalum, which require significant energy to vaporize.
In summary, the current of e-beam evaporation is a key operational parameter that dictates the power and efficiency of the evaporation process. By controlling the electron beam current, manufacturers can optimize the deposition rates and ensure the production of high-quality, pure films with minimal contamination.
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