Vacuum Furnace
Vacuum Arc Induction Melting Furnace
Item Number : KT-VA
Price varies based on specs and customizations
- Capacity
- 1-200 kg
- Working voltage
- 20-40 V
- Vacuum pressure
- 1.3-1.3x10-2
Shipping:
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Applications
Vacuum arc furnace is mainly used to melt active metals such as titanium, niobium, zirconium and refractory metals such as tungsten and molybdenum. In addition, it is also used to melt iron base, nickel base, cobalt base and other alloy materials.
Vacuum arc furnace is characterized by high temperature, high speed melting, remarkable degassing effect, free of refractory contamination of molten metal, and able to reduce non-metallic inclusions in metal.
Vacuum arc furnace is widely used in the smelting and purification of ultra-high temperature metal materials, high entropy alloy materials, parent alloy materials, refractory metal materials, rare and precious metal materials in schools, research institutes and institutions. It can effectively remove oxygen and impurities.
Detail & Parts
Feature
- The furnace body is all stainless steel, with beautiful appearance and no rust.
- Adopt vertical cylindrical vacuum chamber
- Equipped with a large diameter observation window, the smelting situation in the furnace can be observed in real time
- The smelting temperature is high, the temperature can be above 3500 degrees,
- A special melting power supply for arc melting is adopted.
- Equipped with an operation simulation screen, the control data is intuitively displayed, and the operation is intuitive and simple
- High vacuum design, the vacuum degree can reach 5x10E-4Pa and above
- Use over-temperature protection and add filter glass to protect eyes
- The water-cooled copper electrode can be moved 360 degrees, and the operation is flexible. At the same time, the water-cooled crucible is small and replaceable, and can be customized.
- With material turning device, to overcome the situation of uneven melting on one side of the material
- Casting station with vacuum suction casting
- Efficiency of equipment: Most metal materials are heated and remelted for one minute or less.
Technical specifications
Model | KT-VA1 | KT-VA5 | KT-VA25 | KT-VA200 |
Capacity (Kg) | 1 | 5-15 | 25 | 200 |
Working voltage (V) | 20-40 | |||
Working current (A) | 1000A | 3000A | 6000A | 12000A |
Vacuum pressure (Pa) | 1.3-1.3x10-2 | |||
Electrode size (mm) | Φ25-40 x 400 | Φ10-45x1200 | Φ30-60x1350 | Φ56-150x1745 |
Ingot size (mm) | Φ60x100 | Φ80x135 | Φ100x400mm | Φ200x670mm |
Dimensions (m) | 0.8x0.35x1.8 | 3.81x3.0x5.21 | 4.43x3.33x4.93 | 7.4x3.4x6.72 |
Warnings
Operator safety is the top important issue! Please operate the equipment with cautions. Working with inflammable& explosive or toxic gases is very dangerous, operators must take all necessary precautions before starting the equipment. Working with positive pressure inside the reactors or chambers is dangerous, operator must fellow the safety procedures strictly. Extra caution must also be taken when operating with air-reactive materials, especially under vacuum. A leak can draw air into the apparatus and cause a violent reaction to occur.
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FAQ
What Is A Vacuum Induction Furnace And How Does It Work?
What Is A Vacuum Furnace Used For?
What Is CVD Furnace?
Chemical vapor deposition (CVD) is a technology that uses various energy sources such as heating, plasma excitation or light radiation to chemically react gaseous or vapor chemical substances on the gas phase or gas-solid interface to form solid deposits in the reactor by means of chemical reaction.To put it simply, two or more gaseous raw materials are introduced into a reaction chamber, and then they react with each other to form a new material and deposit it on the substrate surface.
CVD furnace is one combined furnace system with high temperature tube furnace unit,gases control unit, and vacuum unit, it is widely used for experiment and production of composite material preparation, microelectronics process, semiconductor optoelectronic, solar energy utilization, optical fiber communication, superconductor technology, protective coating field.
What Are The Main Applications Of Vacuum Induction Furnaces?
How Does A Vacuum Induction Melting Furnace Work?
What Is Vacuum Arc Melting Process?
What Is The Process Of A Vacuum Furnace?
How Does CVD Furnace Work?
CVD furnace system consists of high temperature tube furnace unit, reacting gas source precise control unit, vacuum pump station and corresponding assembling parts.
Vacuum pump is to remove the air from the reacting tube,and make sure there is no unwanted gases inside the reaction tube, after that the tube furnace will heat the reaction tube to a target temperature, then reacting gas source precise control unit can introduce different gases with a set ratio into the furnace tube for the chemical reaction, the chemical vapor deposition will be formed in the CVD furnace.
What Are The Advantages Of Using A Vacuum Induction Furnace?
What Are The Advantages Of Vacuum Induction Melting?
What Is VAR Vacuum Arc Remelting (VAR)Furnace?
What Gas Is Used In A Vacuum Furnace?
Which Gas Is Used In CVD Process?
There are tremendous gas sources can be used in the CVD process, the common chemical reactions of CVD includes Pyrolysis, photolysis, reduction, oxidation, redox,so the gases involved in these chemical reactions can be used in the CVD process.
We take CVD Graphene growth for an example, the gases used in the CVD process will be CH4,H2,O2 and N2.
What Types Of Materials Can Be Processed In A Vacuum Induction Furnace?
How Does Vacuum Help In Induction Melting Furnace?
How Does Vacuum Arc Melting Furnace Work?
What Is The Heating Element Used In A Vacuum Furnace?
What Is The Advantage Of CVD System?
- Wide range of films can be produced, metal film, nonmetal film and multi-component alloy film as required. At the same time, it can prepare high-quality crystals that are difficult to obtain by other methods, such as GaN, BP, etc.
- The film forming speed is fast, usually several microns per minute or even hundreds of microns per minute. It is possible to simultaneously deposit large quantities of coatings with uniform composition, which is incomparable to other film preparation methods, such as liquid phase epitaxy (LPE) and molecular beam epitaxy (MBE).
- The working conditions are carried out under normal pressure or low vacuum conditions, so the coating has good diffraction, and the workpieces with complex shapes can be uniformly coated, which is much superior to PVD.
- Due to the mutual diffusion of reaction gas, reaction product and substrate, a coating with good adhesion strength can be obtained, which is crucial for preparing surface strengthened films such as wear-resistant and anti-corrosion films.
- Some films grow at a temperature far lower than the melting point of the film material. Under the condition of low temperature growth, the reaction gas and reactor wall and impurities contained in them almost do not react, so a film with high purity and good crystallinity can be obtained.
- Chemical vapor deposition can obtain a smooth deposition surface. This is because compared with LPE, chemical vapor deposition (CVD) is carried out under high saturation, with high nucleation rate, high nucleation density, and uniform distribution on the whole plane, resulting in a macroscopic smooth surface. At the same time, in chemical vapor deposition, the average free path of molecules (atoms) is much larger than LPE, so the spatial distribution of molecules is more uniform, which is conducive to the formation of a smooth deposition surface.
- Low radiation damage, which is a necessary condition for manufacturing metal oxide semiconductors (MOS) and other devices
How Does The Vacuum Environment In A Vacuum Induction Furnace Improve Material Properties?
What Is Vacuum Induction Melting Furnace?
What Are The Applications Of Vacuum Arc Melting Furnaces?
What Does PECVD Stand For?
PECVD is a technology that uses plasma to activate reaction gas, promote chemical reaction on the surface of substrate or near surface space, and generate solid film. The basic principle of plasma chemical vapor deposition technology is that under the action of RF or DC electric field, the source gas is ionized to form a plasma, the low-temperature plasma is used as the energy source, an appropriate amount of reaction gas is introduced, and the plasma discharge is used to activate the reaction gas and realize chemical vapor deposition.
According to the method of generating plasma, it can be divided into RF plasma, DC plasma and microwave plasma CVD, etc...
What Are The Advantages Of Using Vacuum Arc Melting Furnaces?
What Is The Difference Between CVD And PECVD?
The difference between PECVD and traditional CVD technology is that the plasma contains a large number of high-energy electrons, which can provide the activation energy required in the chemical vapor deposition process, thus changing the energy supply mode of the reaction system. Since the electron temperature in the plasma is as high as 10000K, the collision between electrons and gas molecules can promote the chemical bond breaking and recombination of the reaction gas molecules to generate more active chemical groups, while the whole reaction system maintains a lower temperature.
So compared to the CVD process, PECVD can carry out the same chemical vapor deposition process with a lower temperature.
What Safety Precautions Should Be Followed When Using A Vacuum Arc Melting Furnace?
4.8
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Vacuum arc furnace is a great tool for melting active metals and preparing bulk amorphous materials by vacuum suction casting.
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The vacuum induction furnace allows for the smelting of refractory metals and the production of special corrosion-resistant and heat-resistant alloys.
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Vacuum induction melting furnace has the advantages of no air and vacuum induction furnace slag pollution, pure alloy, and low gas content.
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The vacuum induction furnace is widely used in the smelting and purification of various metal materials in schools, research institutes, and institutions.
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Vacuum arc furnace is characterized by high temperature, high speed melting, remarkable degassing effect, and free of refractory contamination of molten metal.
4.7
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The vacuum induction melting furnace is mainly composed of a furnace shell, inductor, crucible, furnace tilting mechanism, mold mechanism, power supply device, and a water cooling system.
4.8
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The vacuum arc furnace is mainly used to melt active metals such as titanium, niobium, zirconium and refractory metals such as tungsten and molybdenum.
4.9
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Vacuum induction melting technology and induction smelting technology have been applied in different occasions.
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The development and progress of vacuum induction furnace are mainly reflected in the gradual improvement of the overall structure of the equipment, the increasingly obvious trend of modularization and the more intelligent control system.
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Vacuum arc furnace is suitable for scientific research and small batch preparation of new vacuum metallurgy materials in universities and scientific research institutes.
4.9
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The vacuum induction furnace is widely used in the smelting and purification of ultra-high temperature metal materials, high entropy alloy materials, parent alloy materials, refractory metal materials, rare and precious metal materials.
4.7
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The vacuum arc furnace can effectively remove oxygen and impurities.
4.8
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The vacuum induction furnace is mainly used to melt active metals, such as titanium alloy, etc.
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The vacuum induction furnace can prevent melting of metals and alloys, and react with non-metallic inclusions.
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The vacuum induction furnace can remove the harmful dissolved gases and pollutants in molten metals.
4.8
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The vacuum induction furnace has the advantages of no air and vacuum induction furnace slag pollution, pure alloy, and low gas content.
4.9
out of
5
The vacuum arc furnace is widely used in the smelting and purification of various metal materials in schools, research institutes, and institutions.
4.7
out of
5
The vacuum induction melting furnace is mainly composed of a furnace shell, inductor, crucible, furnace tilting mechanism, mold mechanism, power supply device, and a water cooling system.
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