Vacuum Furnace
Vacuum brazing furnace
Item Number : KT-BF
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- Specifications
- Please refer to the chart below for detailed parameters.
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Introduction
A vacuum brazing furnace is a type of industrial furnace used for brazing, a metalworking process that joins two pieces of metal using a filler metal that melts at a lower temperature than the base metals. Vacuum brazing furnaces are typically used for high-quality applications where a strong, clean joint is required.
Vacuum brazing furnaces operate by creating a vacuum inside the furnace chamber, which removes oxygen and other gases that can interfere with the brazing process. This creates a clean environment that promotes strong, reliable joints. Vacuum brazing furnaces are also capable of achieving very high temperatures, which allows for the brazing of a wide variety of metals, including stainless steel, titanium, and aluminum.
Details & Part
Applications
Vacuum brazing furnaces are widely used in various industries and applications due to their ability to create strong and leak-proof joints. Some of the main application areas include:
- Heating and cooling assemblies
- Micro-channel heat exchangers
- Aircraft components
- Sensors
- Medical devices
- Structural components
- Other thermal products
Features
The vacuum brazing furnace offers numerous benefits that enhance its functionality and value for customers:
- Exceptional temperature uniformity: The furnace's design ensures uniform heating throughout the chamber, resulting in consistent and precise brazing results.
- Efficient heating system: The furnace utilizes a high-performance heating system that rapidly reaches and maintains the desired temperature, reducing cycle times and increasing productivity.
- Advanced vacuum system: The furnace is equipped with a sophisticated vacuum system that effectively removes oxygen and other contaminants from the chamber, ensuring a clean and controlled brazing environment.
- User-friendly interface: The furnace features an intuitive and easy-to-use interface that simplifies operation and monitoring, minimizing the need for extensive training.
- Robust construction: The furnace is constructed from durable materials and components, ensuring longevity and reliability in demanding laboratory environments.
Principle
The vacuum brazing furnace is a horizontal furnace body, composed of a furnace shell, furnace lining, heating element, furnace tank, material tray, vacuum system, and electronic control system. The furnace shell is welded from carbon steel plates and section steel. It is lined with high-quality insulation bricks and refractory bricks and is constructed in three zones. The heating elements are made of iron-chromium-aluminum wire and are arranged in a spiral shape on the wire bricks on both sides and bottom of the furnace. The vacuum system uses a three-stage vacuum pump, which is composed of a vacuum unit, an oil diffusion pump, a Roots pump, a mechanical pump, a pneumatic baffle valve, and a manual butterfly valve.
Advantages
- High-quality joints with minimal voids and excellent mechanical properties
- No need for flux, which eliminates potential contamination and post-brazing cleaning
- Reduced oxidation and scaling, resulting in cleaner joints
- Precise temperature control, which allows for the joining of materials with different melting points
- Suitable for joining complex components and assemblies
- The environmentally friendly process with minimal waste generation
Technical specification
Rated power | 100 Kw |
Rated temperature | 700 ℃ |
Power supply | 380 V, 50 Hz |
Working area size | Φ820×1700㎜ |
Cold ultimate vacuum | 6.67×10-3Pa |
Pressure rise rate | 2pa/h |
Temperature control accuracy | ±1℃ |
FAQ
What Is A Vacuum Furnace Used For?
What Is CVD Furnace?
Chemical vapor deposition (CVD) is a technology that uses various energy sources such as heating, plasma excitation or light radiation to chemically react gaseous or vapor chemical substances on the gas phase or gas-solid interface to form solid deposits in the reactor by means of chemical reaction.To put it simply, two or more gaseous raw materials are introduced into a reaction chamber, and then they react with each other to form a new material and deposit it on the substrate surface.
CVD furnace is one combined furnace system with high temperature tube furnace unit,gases control unit, and vacuum unit, it is widely used for experiment and production of composite material preparation, microelectronics process, semiconductor optoelectronic, solar energy utilization, optical fiber communication, superconductor technology, protective coating field.
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How Does CVD Furnace Work?
CVD furnace system consists of high temperature tube furnace unit, reacting gas source precise control unit, vacuum pump station and corresponding assembling parts.
Vacuum pump is to remove the air from the reacting tube,and make sure there is no unwanted gases inside the reaction tube, after that the tube furnace will heat the reaction tube to a target temperature, then reacting gas source precise control unit can introduce different gases with a set ratio into the furnace tube for the chemical reaction, the chemical vapor deposition will be formed in the CVD furnace.
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Which Gas Is Used In CVD Process?
There are tremendous gas sources can be used in the CVD process, the common chemical reactions of CVD includes Pyrolysis, photolysis, reduction, oxidation, redox,so the gases involved in these chemical reactions can be used in the CVD process.
We take CVD Graphene growth for an example, the gases used in the CVD process will be CH4,H2,O2 and N2.
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What Is The Advantage Of CVD System?
- Wide range of films can be produced, metal film, nonmetal film and multi-component alloy film as required. At the same time, it can prepare high-quality crystals that are difficult to obtain by other methods, such as GaN, BP, etc.
- The film forming speed is fast, usually several microns per minute or even hundreds of microns per minute. It is possible to simultaneously deposit large quantities of coatings with uniform composition, which is incomparable to other film preparation methods, such as liquid phase epitaxy (LPE) and molecular beam epitaxy (MBE).
- The working conditions are carried out under normal pressure or low vacuum conditions, so the coating has good diffraction, and the workpieces with complex shapes can be uniformly coated, which is much superior to PVD.
- Due to the mutual diffusion of reaction gas, reaction product and substrate, a coating with good adhesion strength can be obtained, which is crucial for preparing surface strengthened films such as wear-resistant and anti-corrosion films.
- Some films grow at a temperature far lower than the melting point of the film material. Under the condition of low temperature growth, the reaction gas and reactor wall and impurities contained in them almost do not react, so a film with high purity and good crystallinity can be obtained.
- Chemical vapor deposition can obtain a smooth deposition surface. This is because compared with LPE, chemical vapor deposition (CVD) is carried out under high saturation, with high nucleation rate, high nucleation density, and uniform distribution on the whole plane, resulting in a macroscopic smooth surface. At the same time, in chemical vapor deposition, the average free path of molecules (atoms) is much larger than LPE, so the spatial distribution of molecules is more uniform, which is conducive to the formation of a smooth deposition surface.
- Low radiation damage, which is a necessary condition for manufacturing metal oxide semiconductors (MOS) and other devices
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What Does PECVD Stand For?
PECVD is a technology that uses plasma to activate reaction gas, promote chemical reaction on the surface of substrate or near surface space, and generate solid film. The basic principle of plasma chemical vapor deposition technology is that under the action of RF or DC electric field, the source gas is ionized to form a plasma, the low-temperature plasma is used as the energy source, an appropriate amount of reaction gas is introduced, and the plasma discharge is used to activate the reaction gas and realize chemical vapor deposition.
According to the method of generating plasma, it can be divided into RF plasma, DC plasma and microwave plasma CVD, etc...
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What Is The Difference Between CVD And PECVD?
The difference between PECVD and traditional CVD technology is that the plasma contains a large number of high-energy electrons, which can provide the activation energy required in the chemical vapor deposition process, thus changing the energy supply mode of the reaction system. Since the electron temperature in the plasma is as high as 10000K, the collision between electrons and gas molecules can promote the chemical bond breaking and recombination of the reaction gas molecules to generate more active chemical groups, while the whole reaction system maintains a lower temperature.
So compared to the CVD process, PECVD can carry out the same chemical vapor deposition process with a lower temperature.
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4.9
out of
5
This vacuum brazing furnace is a game-changer for our laboratory. The speed of delivery was exceptional, and the quality of the product is top-notch.
4.8
out of
5
I'm impressed with the value for money I got with this vacuum brazing furnace. It's a durable and technologically advanced piece of equipment that has significantly improved our research capabilities.
4.7
out of
5
The vacuum brazing furnace from KINTEK SOLUTION is a valuable asset to our laboratory. Its user-friendly interface and efficient heating system make it a delight to use.
4.6
out of
5
The vacuum brazing furnace has exceeded our expectations. The exceptional temperature uniformity ensures consistent and precise brazing results.
4.8
out of
5
Thank you, KINTEK SOLUTION, for providing us with such an exceptional vacuum brazing furnace. The advanced vacuum system guarantees a clean and controlled brazing environment, leading to high-quality joints.
4.7
out of
5
The vacuum brazing furnace is a lifesaver for our laboratory. Its ability to join complex components and assemblies has opened up new possibilities for our research.
4.9
out of
5
I highly recommend the vacuum brazing furnace from KINTEK SOLUTION. The precise temperature control allows us to join materials with different melting points with ease.
4.8
out of
5
The vacuum brazing furnace has transformed our laboratory. The reduced oxidation and scaling result in cleaner joints, saving us valuable time and resources.
4.7
out of
5
The environmentally friendly process of the vacuum brazing furnace aligns perfectly with our laboratory's sustainability goals. Minimal waste generation is a major plus.
4.6
out of
5
The vacuum brazing furnace has proven to be a reliable and durable workhorse in our laboratory. Its robust construction ensures longevity and peace of mind.
4.8
out of
5
The vacuum brazing furnace is an indispensable tool for our laboratory. Its exceptional performance and technological advancements have taken our research to the next level.
4.7
out of
5
The vacuum brazing furnace from KINTEK SOLUTION is a valuable investment for any laboratory. Its high-quality joints and minimal voids ensure the integrity of our research.
4.6
out of
5
The vacuum brazing furnace has streamlined our laboratory processes. Its efficient heating system reduces cycle times, allowing us to maximize our productivity.
4.8
out of
5
The vacuum brazing furnace is a testament to KINTEK SOLUTION's commitment to innovation. Its user-friendly interface and robust construction make it an exceptional choice for any laboratory.
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