The main difference between RF (Radio Frequency) and microwave plasma is related to their wavelength and the way energy is transmitted to the treated product.
RF plasma operates at a frequency of approximately 13.56 MHz, while microwave plasma operates at a frequency of around 2.45 GHz. The difference in frequency results in different characteristics and applications for each type of plasma.
Microwave plasma is characterized by high electromagnetic radiation in the GHz range. It is commonly used for synthesizing carbon materials such as diamonds, carbon nanotubes, and graphene. The high frequency of microwave plasma allows for efficient energy transfer and heating of the treated product.
On the other hand, RF plasma operates at a lower frequency compared to microwave plasma. It requires a higher voltage of 1,012 volts or higher to achieve the same deposition rate as DC (Direct Current) plasma. RF plasma involves using radio waves to remove electrons from the outer shells of gas atoms, while DC plasma involves the direct bombardment of gas plasma atoms by electrons. The creation of radio waves in RF plasma requires more power input to achieve the same effect as an electron current in DC plasma.
Additionally, RF plasma can be maintained at a significantly lower chamber pressure of under 15 mTorr, compared to the 100 mTorr required for DC plasma. This lower pressure allows for fewer collisions between the charged plasma particles and the target material, creating a more direct pathway for the particles to sputter onto the substrate material. RF plasma is particularly suitable for target materials that have insulating qualities.
In terms of practical advantages, RF plasma systems, such as radio frequency (RF) systems operating at 13.56 MHz, offer long-time operation without maintenance breaks, as they do not require electrode replacement. They also work with both conducting and insulating target materials.
In summary, the main difference between RF and microwave plasma lies in their frequency, voltage requirements, chamber pressure, and ability to work with different types of target materials. Microwave plasma is characterized by high-frequency electromagnetic radiation and is used for synthesizing carbon materials. RF plasma operates at a lower frequency, requires higher voltage, and can be maintained at lower chamber pressures, making it suitable for sputtering insulating target materials.
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