The most common method used for the synthesis of nanomaterials is the chemical vapor deposition (CVD) method. CVD is a trusted chemical technique used to produce 2D nanomaterials and thin films on various substrates. In this method, precursor materials in vapor form react or decompose on a substrate, with or without catalysts, in an evacuated chamber under elevated temperature.
CVD has several variants, including low-pressure CVD, atmospheric pressure CVD, hot-wall CVD, cold-wall CVD, plasma-enhanced CVD, photo-assisted CVD, and laser-assisted CVD. These variants offer flexibility in terms of operating conditions and can be tailored to suit specific nanomaterial synthesis requirements.
The CVD method has been extensively employed for the synthesis of various carbon-based nanomaterials, such as fullerenes, carbon nanotubes (CNTs), carbon nanofibers (CNFs), graphene, and more. These nanomaterials possess unique thermal, electrical, and mechanical properties that make them suitable for a wide range of applications.
While other methods like physical vapor deposition, sol-gels, electro deposition, and ball milling are also used for the synthesis of nanomaterials, CVD is considered the most successful method for low-cost scalable preparation. However, it should be noted that traditional CVD methods have some drawbacks, including high operating temperatures, probable usage of metal catalysts, contamination, defects, and interstices introduced by post-growth transfer.
To address these drawbacks, plasma-enhanced CVD (PECVD) has been developed. PECVD enables catalyst-free in situ preparation at low temperatures, making it an imperative method for practical applications of nanomaterial synthesis.
In summary, the CVD method, including its variants like PECVD, is the most common and widely used technique for the synthesis of nanomaterials. It offers scalability, versatility, and the ability to produce various carbon-based nanomaterials with unique properties.
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