Physical Vapor Deposition (PVD) is a process used to coat a metal surface with a thin film of another material.
This process enhances the surface properties of the metal, making it harder and more durable.
PVD involves the vaporization of a solid material in a vacuum environment.
The vaporized material is then deposited onto a substrate.
The coating is not a thick layer but rather a minute buildup that bonds at the micron level.
This bonding alters the physical properties of the metal surface.
PVD is widely used in various industries and products, including computer chips, optical devices, solar panels, and medical devices.
It improves performance attributes by creating smoother surfaces and reducing roughness.
4 Key Points to Understand Physical Vapor Deposition
1. Enhanced Surface Properties
PVD makes the metal surface harder and more durable.
2. Vacuum Environment
The process involves vaporizing a solid material in a vacuum.
3. Thin Film Deposition
The vaporized material is deposited onto a substrate in a thin, micron-level layer.
4. Wide Industry Application
PVD is used in computer chips, optical devices, solar panels, and medical devices to improve performance.
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