MOCVD equipment is a specialized tool used for the deposition of thin single-crystal materials.
It is primarily used in the manufacturing of compound semiconductors.
The process operates through vapor phase epitaxy using metal-organic compounds and hydrides as source materials.
What is MOCVD Equipment? 4 Key Points to Understand
1. Source Materials and Process
MOCVD utilizes organic compounds of group III and II elements.
It also uses hydrides of group V and VI elements.
These materials are introduced into the reaction chamber where they undergo thermal decomposition.
The decomposition results in the deposition of various Ⅲ-V and Ⅱ-VI compound semiconductors and their multilayered solid solutions as thin single-crystal materials on the substrate.
2. Methodology and Functionality
The MOCVD process involves the use of metal-organic compounds as precursors.
These precursors are introduced into the reaction chamber.
They are either thermally decomposed or activated by other means such as plasma or light.
The metal center reacts with other precursor molecules or the substrate to form the desired material.
The organic ligands are released as byproducts.
This method allows for precise control over the composition and doping levels in the deposited films.
It is particularly useful for applications requiring high precision and quality.
3. Application and Control
MOCVD is widely used in the production of devices such as High Brightness LEDs (HBLEDs) and other compound semiconductor devices.
The process is controlled through advanced instruments that monitor and adjust parameters like wafer carrier/slot temperature, film thickness, film stress/wafer curvature, and surface measurements.
This real-time feedback ensures high throughput and reproducibility, critical for industrial applications.
4. Technical Features
Unlike other CVD techniques, MOCVD introduces reactants via a bubbler.
The bubbler passes carrier gas through a heated metalorganic liquid.
This method ensures that the concentration of the MO source is controlled and reproducible.
It enhances the efficiency and reliability of the deposition process.
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