Knowledge What Materials are Used in Physical Vapor Deposition? (3 Key Materials Explained)
Author avatar

Tech Team · Kintek Solution

Updated 1 month ago

What Materials are Used in Physical Vapor Deposition? (3 Key Materials Explained)

Physical vapor deposition (PVD) is a process that uses a variety of materials to create thin, durable coatings.

These materials include metals, semiconductors, and composite materials.

The process involves transforming a solid precursor material into a vapor state and then depositing it onto a substrate.

What Materials are Used in Physical Vapor Deposition? (3 Key Materials Explained)

What Materials are Used in Physical Vapor Deposition? (3 Key Materials Explained)

1. Metals

PVD commonly uses metals as the primary material for deposition.

These metals can include a wide range of elements from the periodic table, such as aluminum, titanium, and copper.

The use of metals is prevalent due to their conductivity and durability, making them suitable for various industrial applications.

2. Semiconductors

Materials like silicon and germanium are also deposited using PVD techniques.

These materials are crucial in the electronics industry, particularly in the manufacturing of microchips and other electronic components.

3. Composite Materials and Compounds

In addition to pure elements, PVD can also deposit composite materials and compounds such as oxides and nitrides.

These materials are often used for their specific properties, such as high resistance to wear and corrosion.

For example, titanium nitride is frequently used to coat cutting tools due to its hardness and resistance to wear.

Process Details

Thermal Evaporation

In this method, materials are heated in a vacuum until they vaporize.

The vapor then condenses on the substrate, forming a thin film.

This technique is versatile and can be used with a wide range of materials, including both metals and non-metals.

Electron Beam Evaporation

This is a more controlled method where an electron beam is used to heat and vaporize the source material.

It is particularly useful for depositing materials that require higher temperatures to vaporize, such as certain oxides and semiconductors.

Sputtering

Another common PVD technique involves bombarding a target material with high-energy particles, causing atoms to be ejected and deposited on the substrate.

This method is effective for depositing a wide range of materials, including those that are difficult to evaporate.

Applications and Considerations

PVD coatings are known for their high-temperature tolerance and resistance to separation from the substrate, making them ideal for applications in harsh environments.

The process is considered environmentally friendly as it does not involve hazardous chemicals and produces minimal waste.

The microstructure of the deposited layers can differ from the bulk material due to the low energy of ions impinging on the substrate, necessitating high substrate temperatures (250°C to 350°C) to ensure proper adhesion and structure.

Continue exploring, consult our experts

Unlock the unparalleled benefits of PVD technology with KINTEK SOLUTION!

Our cutting-edge range of PVD materials and deposition methods are designed to elevate your coatings' durability, conductivity, and performance.

From metals to semiconductors and composites, trust our advanced PVD solutions to deliver exceptional results.

Embrace the future of coating technology and experience the KINTEK difference today!

Explore our extensive collection and elevate your industrial applications to new heights.

Related Products

Plasma enhanced evaporation deposition PECVD coating machine

Plasma enhanced evaporation deposition PECVD coating machine

Upgrade your coating process with PECVD coating equipment. Ideal for LED, power semiconductors, MEMS and more. Deposits high-quality solid films at low temps.

RF PECVD System Radio Frequency Plasma-Enhanced Chemical Vapor Deposition

RF PECVD System Radio Frequency Plasma-Enhanced Chemical Vapor Deposition

RF-PECVD is an acronym for "Radio Frequency Plasma-Enhanced Chemical Vapor Deposition." It deposits DLC (Diamond-like carbon film) on germanium and silicon substrates. It is utilized in the 3-12um infrared wavelength range.

High Purity Vanadium (V) Sputtering Target / Powder / Wire / Block / Granule

High Purity Vanadium (V) Sputtering Target / Powder / Wire / Block / Granule

Looking for high-quality Vanadium (V) materials for your laboratory? We offer a wide range of customizable options to fit your unique needs, including sputtering targets, powders, and more. Contact us today for competitive pricing.

Graphite evaporation crucible

Graphite evaporation crucible

Vessels for high temperature applications, where materials are kept at extremely high temperatures to evaporate, allowing thin films to be deposited on substrates.

Cylindrical Resonator MPCVD Diamond Machine for lab diamond growth

Cylindrical Resonator MPCVD Diamond Machine for lab diamond growth

Learn about Cylindrical Resonator MPCVD Machine, the microwave plasma chemical vapor deposition method used for growing diamond gemstones and films in the jewelry and semi-conductor industries. Discover its cost-effective advantages over traditional HPHT methods.

High Purity Palladium (Pd) Sputtering Target / Powder / Wire / Block / Granule

High Purity Palladium (Pd) Sputtering Target / Powder / Wire / Block / Granule

Looking for affordable Palladium materials for your lab? We offer custom solutions with varying purities, shapes, and sizes - from sputtering targets to nanometer powders and 3D printing powders. Browse our range now!

Drawing die nano-diamond coating HFCVD Equipment

Drawing die nano-diamond coating HFCVD Equipment

The nano-diamond composite coating drawing die uses cemented carbide (WC-Co) as the substrate, and uses the chemical vapor phase method ( CVD method for short ) to coat the conventional diamond and nano-diamond composite coating on the surface of the inner hole of the mold.

High Purity Vanadium Oxide (V2O3) Sputtering Target / Powder / Wire / Block / Granule

High Purity Vanadium Oxide (V2O3) Sputtering Target / Powder / Wire / Block / Granule

Buy Vanadium Oxide (V2O3) materials for your lab at reasonable prices. We offer tailored solutions of different purities, shapes, and sizes to meet your unique requirements. Browse our selection of sputtering targets, powders, foils, and more.

Bell-jar Resonator MPCVD Diamond Machine for lab and diamond growth

Bell-jar Resonator MPCVD Diamond Machine for lab and diamond growth

Get high-quality diamond films with our Bell-jar Resonator MPCVD machine designed for lab and diamond growth. Discover how Microwave Plasma Chemical Vapor Deposition works for growing diamonds using carbon gas and plasma.

Ceramic Evaporation Boat Set

Ceramic Evaporation Boat Set

It can be used for vapor deposition of various metals and alloys. Most metals can be evaporated completely without loss. Evaporation baskets are reusable.1

CVD Diamond coating

CVD Diamond coating

CVD Diamond Coating: Superior Thermal Conductivity, Crystal Quality, and Adhesion for Cutting Tools, Friction, and Acoustic Applications

CVD diamond for thermal management

CVD diamond for thermal management

CVD diamond for thermal management: High-quality diamond with thermal conductivity up to 2000 W/mK, ideal for heat spreaders, laser diodes, and GaN on Diamond (GOD) applications.

CVD boron doped diamond

CVD boron doped diamond

CVD boron-doped diamond: A versatile material enabling tailored electrical conductivity, optical transparency, and exceptional thermal properties for applications in electronics, optics, sensing, and quantum technologies.

Inclined rotary plasma enhanced chemical deposition (PECVD) tube furnace machine

Inclined rotary plasma enhanced chemical deposition (PECVD) tube furnace machine

Introducing our inclined rotary PECVD furnace for precise thin film deposition. Enjoy automatic matching source, PID programmable temperature control, and high accuracy MFC mass flowmeter control. Built-in safety features for peace of mind.

Customer made versatile CVD tube furnace CVD machine

Customer made versatile CVD tube furnace CVD machine

Get your exclusive CVD furnace with KT-CTF16 Customer Made Versatile Furnace. Customizable sliding, rotating, and tilting functions for precise reactions. Order now!

Aluminized ceramic evaporation boat

Aluminized ceramic evaporation boat

Vessel for depositing thin films; has an aluminum-coated ceramic body for improved thermal efficiency and chemical resistance. making it suitable for various applications.

Electron Beam Evaporation Graphite Crucible

Electron Beam Evaporation Graphite Crucible

A technology mainly used in the field of power electronics. It is a graphite film made of carbon source material by material deposition using electron beam technology.

Electron Beam Evaporation Coating Tungsten Crucible / Molybdenum Crucible

Electron Beam Evaporation Coating Tungsten Crucible / Molybdenum Crucible

Tungsten and molybdenum crucibles are commonly used in electron beam evaporation processes due to their excellent thermal and mechanical properties.

Slide PECVD tube furnace with liquid gasifier PECVD machine

Slide PECVD tube furnace with liquid gasifier PECVD machine

KT-PE12 Slide PECVD System: Wide power range, programmable temp control, fast heating/cooling with sliding system, MFC mass flow control & vacuum pump.


Leave Your Message